公开(公告)号：US20180040458A1

公开(公告)日：2018-02-08

申请号：US15788166

申请日：2017-10-19

Applicant: Semes Co., Ltd

Inventor： Hyungchul MOON ,  Hyung Joon KIM

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32449 ,  H01J37/32477 ,  H01J37/32642 ,  H01J37/32715 ,  H01J37/32862 ,  H01J37/32871 ,  H01L21/3065 ,  H01L21/32136 ,  H01L21/67069

Abstract: Substrate treating systems are disclosed. The system may include a chamber with a processing space, a supporting unit provided in the processing space to support a substrate, a gas supplying unit provided in the processing space to supply gas into the processing space, a plasma source unit generating plasma from the gas, and a liner unit disposed to enclose the supporting unit. The supporting unit may include a supporting plate supporting a substrate. The liner unit may include an inner liner enclosing the supporting plate and an actuator vertically moving the inner liner.

公开(公告)号：US20160093473A1

公开(公告)日：2016-03-31

申请号：US14862748

申请日：2015-09-23

Applicant: Semes Co., Ltd.

Inventor： Hyungchul MOON ,  Hyung Joon KIM

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32009 ,  H01J37/32449 ,  H01J37/32477 ,  H01J37/32642 ,  H01J37/32715 ,  H01J37/32862 ,  H01J37/32871 ,  H01L21/3065 ,  H01L21/32136 ,  H01L21/67069

Abstract: Substrate treating systems are disclosed. The system may include a chamber with a processing space, a supporting unit provided in the processing space to support a substrate, a gas supplying unit provided in the processing space to supply gas into the processing space, a plasma source unit generating plasma from the gas, and a liner unit disposed to enclose the supporting unit. The supporting unit may include a supporting plate supporting a substrate. The liner unit may include an inner liner enclosing the supporting plate and an actuator vertically moving the inner liner.

Abstract translation: 公开了底物处理系统。 该系统可以包括具有处理空间的室，设置在处理空间中以支撑基板的支撑单元，设置在处理空间中以将气体供应到处理空间中的气体供应单元，从气体产生等离子体的等离子体源单元 以及设置成包围支撑单元的衬垫单元。 支撑单元可以包括支撑基板的支撑板。 衬垫单元可以包括封闭支撑板的内衬和垂直移动内衬的致动器。