公开(公告)号：US20150214016A1

公开(公告)日：2015-07-30

申请号：US14607816

申请日：2015-01-28

Applicant: Semes Co., Ltd.

Inventor： Yong-Hyun HAM ,  Hyung Je WOO ,  Hyun Joong KIM ,  Wan-Jae PARK ,  Kyu-Young HAN

IPC: H01J37/32 ,  C23F4/00 ,  H01L21/67 ,  C23C16/513

CPC classification number: H01J37/32862 ,  C23C16/4401 ,  C23C16/4405 ,  H01J37/32935 ,  H01J37/32972 ,  H01L21/00

Abstract: Provided are an apparatus and a method of treating a substrate using process gas. The apparatus may include a chamber configured to provide a treatment space, in which a process of treating a substrate is performed, a detection unit configured to detect an amount of reaction by-products attached on an inner surface of the chamber. The detection unit may include a window member provided on the inner surface of the chamber, and a light source member configured to emit and receive light through the window member.

Abstract translation: 提供了使用处理气体处理基板的装置和方法。 该装置可以包括被配置为提供处理空间的室，其中进行处理基板的处理;检测单元，被配置为检测附着在室的内表面上的反应副产物的量。 检测单元可以包括设置在室的内表面上的窗口部件和被构造成通过窗部件发射和接收光的光源部件。