公开(公告)号：US20150214016A1

公开(公告)日：2015-07-30

申请号：US14607816

申请日：2015-01-28

Applicant: Semes Co., Ltd.

Inventor： Yong-Hyun HAM ,  Hyung Je WOO ,  Hyun Joong KIM ,  Wan-Jae PARK ,  Kyu-Young HAN

IPC: H01J37/32 ,  C23F4/00 ,  H01L21/67 ,  C23C16/513

CPC classification number: H01J37/32862 ,  C23C16/4401 ,  C23C16/4405 ,  H01J37/32935 ,  H01J37/32972 ,  H01L21/00

Abstract: Provided are an apparatus and a method of treating a substrate using process gas. The apparatus may include a chamber configured to provide a treatment space, in which a process of treating a substrate is performed, a detection unit configured to detect an amount of reaction by-products attached on an inner surface of the chamber. The detection unit may include a window member provided on the inner surface of the chamber, and a light source member configured to emit and receive light through the window member.

Abstract translation: 提供了使用处理气体处理基板的装置和方法。 该装置可以包括被配置为提供处理空间的室，其中进行处理基板的处理;检测单元，被配置为检测附着在室的内表面上的反应副产物的量。 检测单元可以包括设置在室的内表面上的窗口部件和被构造成通过窗部件发射和接收光的光源部件。

公开(公告)号：US20140034240A1

公开(公告)日：2014-02-06

申请号：US13953009

申请日：2013-07-29

Applicant: Semes Co., Ltd.

Inventor： Hyung Joon KIM ,  Seung Pyo LEE ,  Hyung Je WOO

IPC: H01L21/02

CPC classification number: H01L21/02 ,  C23C16/4412 ,  H01J37/32633 ,  H01J37/32834

Abstract: Provided is a substrate treatment apparatus using plasma. The substrate treatment apparatus includes a housing having an inner space in which a substrate is treated, a support member disposed within the housing to support the substrate, a gas supply unit supplying a gas into the housing, a plasma source generating plasma from the gas supplied into the housing, and a baffle unit disposed to surround the support member within the housing, the baffle unit including a baffle in which through holes for exhausting the gas into the inner space of the housing are defined. The baffle is divided into a plurality of areas when viewed from an upper side, and each of portions of the plurality of areas is formed of a metallic material, and each of the other portions of the plurality of areas is formed of a nonmetallic material.

Abstract translation: 提供了使用等离子体的基板处理装置。 基板处理装置包括：具有内部空间的壳体，其中处理基板;支撑构件，其设置在壳体内以支撑基板;气体供应单元，将气体供应到壳体中;等离子体源，从提供的气体产生等离子体 以及设置成围绕壳体内的支撑构件设置的挡板单元，挡板单元包括挡板，其中限定用于将气体排出到壳体的内部空间中的通孔。 当从上侧观察时，挡板被分成多个区域，并且多个区域的每个部分由金属材料形成，并且多个区域中的每个区域由非金属材料形成。