公开(公告)号：US20040010930A1

公开(公告)日：2004-01-22

申请号：US10200073

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Kert Dolechek ,  Jeffry Davis

IPC: F26B017/24 ,  F26B017/30 ,  F26B019/00 ,  F26B025/06 ,  F26B005/08

CPC classification number: H01L21/67034 ,  H01L21/67028

Abstract: A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is rotatably disposed within the rotor housing. An intake gate is pivotably mounted to the rotor housing to swing about the rotor into a closed position during a rinse mode and into an open position during a drying mode. The gate has a wedge that is designed to almost contact the rotor when the gate is in the open position for drying. The geometry of the elongated inlet, outlet, and eccentric bowl, in combination with the design of the rotor and that of the intake gate, work together to create a cross flow fan having a flow path across the flat media and one that exposes the flat media to large volumes of incoming air only once.

Abstract translation: 离心处理器包括与具有偏心碗的转子壳体流体连通的细长入口和出口。 具有风扇叶片并且适于保持扁平介质的转子可旋转地设置在转子壳体内。 进气门可枢转地安装到转子壳体上，以在冲洗模式期间围绕转子摆动到关闭位置，并且在干燥模式期间进入打开位置。 闸门具有楔形件，当楔门处于打开位置进行干燥时，该楔形件设计成几乎接触转子。 细长的入口，出口和偏心碗的几何结构与转子的设计和进气门的几何结合在一起，以形成横流式风扇，该横流式风扇具有穿过平面介质的流动路径， 媒体大量进入空气只有一次。

公开(公告)号：US20020185549A1

公开(公告)日：2002-12-12

申请号：US10205776

申请日：2002-07-26

Applicant: Semitool, Inc.

Inventor： Kert Dolechek

IPC: A01G027/00 ,  B08B003/04

CPC classification number: H01L21/6708 ,  H01L21/67075 ,  H01L21/67253 ,  Y10S134/902

Abstract: A semiconductor processing system has a liquid chemical metering and delivery system including a process tank and a metering vessel. Fluid level detectors detect the fluid level in the process tank and metering vessel. A two stage fill valve fills the metering vessel from bottom to top. A dispense valve dispenses the metered contents of the vessel into a process tank via gravity, to form a chemical solution in the process tank, with high mixing accuracy. The volumes of the metering vessel and process tank and the inflow and outflow rates are set to provide 100% up time to a process chamber which uses the chemical solution to process semiconductor wafers or other flat media.

Abstract translation: 半导体处理系统具有包括处理罐和计量容器的液体化学计量和输送系统。 液位检测器检测工艺罐和计量容器中的液位。 两级填充阀从底部到顶部填充计量容器。 分配阀通过重力将容器的计量内容物分配到处理罐中，以高混合精度在处理罐中形成化学溶液。 计量容器和处理罐的体积以及流入和流出速率被设定为使用化学溶液处理半导体晶片或其它平坦介质的处理室提供100％的上升时间。

公开(公告)号：US20040084066A1

公开(公告)日：2004-05-06

申请号：US10286317

申请日：2002-11-01

Applicant: Semitool, Inc.

Inventor： Kert Dolechek ,  Jeffry Davis

IPC: B08B009/20

CPC classification number: H01L21/67769 ,  B08B9/0861 ,  B08B9/28 ,  H01L21/67051 ,  H01L21/67379 ,  H01L21/67775

Abstract: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.