公开(公告)号：US20020051700A1

公开(公告)日：2002-05-02

申请号：US09907523

申请日：2001-07-16

Applicant: Semitool Inc.

Inventor： Jeffry Davis

IPC: B65G001/00

CPC classification number: H01L21/67769 ,  H01L21/67754 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/141

Abstract: An automated workpiece processing system has a transfer robot including an end effector having arms which move linearly towards each other to pick up a workpiece. Each arm has two workpiece contactors for engaging the edges of the workpiece. The contactors are positioned equally distant from the workpiece edges. The arms are moved linearly together, while they remain parallel to each other. The contactors contact the edges of the workpiece without causing sliding or displacement of the workpiece. Transfer robot movement or pre-positioning of the end effector is minimized, expediting handling of workpieces within the automated system.

Abstract translation: 自动化工件处理系统具有传送机器人，其包括具有彼此线性移动以拾取工件的臂的末端执行器。 每个臂具有两个用于接合工件边缘的工件接触器。 接触器的位置与工件边缘相等。 臂彼此线性移动，而它们保持彼此平行。 接触器接触工件的边缘而不会导致工件的滑动或移动。 传送机器人移动或端部执行器的预定位最小化，加速了自动化系统内的工件的处理。

公开(公告)号：US20030051972A1

公开(公告)日：2003-03-20

申请号：US10199997

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Jeffry Davis

IPC: B65G015/64 ,  B65G021/22 ,  B65G047/22 ,  B65G047/24

CPC classification number: H01L21/67754 ,  H01L21/67057 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707

Abstract: An automated processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress wafers. Immersion and spin process modules are located in the process bay. A process robot moves between the indexer bay and process bay to carry wafers to and from the process modules. The wafers are processed within a carrier, reducing the potential for physical damage to the wafers. The process robot hands the carrier off to a rotor, in the spin process modules, or to an immersion elevator in the immersion module. Both spin and immersion processing are performed within an automated system.

Abstract translation: 自动处理系统具有与清洁空气封闭体内的处理室垂直对准的分度器托架。 索引器托架中的索引器为进行中的工作晶片提供放样或存储。 浸入和旋转工艺模块位于工艺槽中。 过程机器人在分度器托架和过程间隔之间移动，以将晶片运送到过程模块和从过程模块运送晶片。 晶片在载体内进行处理，减少晶片的物理损坏的可能性。 过程机器人将载体关闭到转子，旋转过程模块中，或者浸入浸入式模块中的浸入式电梯。 旋转和浸没处理均在自动化系统中进行。

公开(公告)号：US20040010930A1

公开(公告)日：2004-01-22

申请号：US10200073

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Kert Dolechek ,  Jeffry Davis

IPC: F26B017/24 ,  F26B017/30 ,  F26B019/00 ,  F26B025/06 ,  F26B005/08

CPC classification number: H01L21/67034 ,  H01L21/67028

Abstract: A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is rotatably disposed within the rotor housing. An intake gate is pivotably mounted to the rotor housing to swing about the rotor into a closed position during a rinse mode and into an open position during a drying mode. The gate has a wedge that is designed to almost contact the rotor when the gate is in the open position for drying. The geometry of the elongated inlet, outlet, and eccentric bowl, in combination with the design of the rotor and that of the intake gate, work together to create a cross flow fan having a flow path across the flat media and one that exposes the flat media to large volumes of incoming air only once.

Abstract translation: 离心处理器包括与具有偏心碗的转子壳体流体连通的细长入口和出口。 具有风扇叶片并且适于保持扁平介质的转子可旋转地设置在转子壳体内。 进气门可枢转地安装到转子壳体上，以在冲洗模式期间围绕转子摆动到关闭位置，并且在干燥模式期间进入打开位置。 闸门具有楔形件，当楔门处于打开位置进行干燥时，该楔形件设计成几乎接触转子。 细长的入口，出口和偏心碗的几何结构与转子的设计和进气门的几何结合在一起，以形成横流式风扇，该横流式风扇具有穿过平面介质的流动路径， 媒体大量进入空气只有一次。

公开(公告)号：US20030051974A1

公开(公告)日：2003-03-20

申请号：US10200075

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Jeffry Davis

IPC: B65G015/64

CPC classification number: H01L21/67769 ,  H01L21/67754 ,  H01L21/67757 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707

Abstract: An automated processing system for processing flat workpieces, such as semiconductor wafers, operates by loading the workpieces into a first carrier. A process robot is adapted to engage external features of the first carrier, for lifting and moving the first carrier within the system. The process robot delivers the first carrier holding the wafers of a first size to a process chamber. The first carrier is secured in the process chamber by one or more of the external features of the first carrier. The first carrier has interior features, such as combs and slots, for holding wafers of a different first size. A second carrier has external features which are the same as the external features of the first carrier. The second carrier has inside features which are dimensioned to hold wafers of a second size, different from the first size. The automated processing system can accordingly handle or operate with both the first and second carriers, and thereby process workpieces having different sizes.

Abstract translation: 用于处理诸如半导体晶片的扁平工件的自动化处理系统通过将工件装载到第一载体中来操作。 过程机器人适于接合第一承载件的外部特征，用于提升和移动系统内的第一承载件。 过程机器人将保持第一尺寸的晶片的第一载体传送到处理室。 第一载体通过第一载体的一个或多个外部特征固定在处理室中。 第一载体具有诸如梳子和槽的内部特征，用于保持不同的第一尺寸的晶片。 第二载体具有与第一载体的外部特征相同的外部特征。 第二载体具有内部特征，其尺寸被设计成保持与第一尺寸不同的第二尺寸的晶片。 自动化处理系统可相应地处理或操作第一和第二载体，从而处理具有不同尺寸的工件。

公开(公告)号：US20030051973A1

公开(公告)日：2003-03-20

申请号：US10200074

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Jeffry Davis

IPC: B08B003/00

CPC classification number: H01L21/67754 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/138

Abstract: A workpiece handling and processing system has a interface section for loading wafers from cassettes into carriers. The wafers are lifted out of cassettes by a buffer elevator and moved into a position over an open carrier by a buffer robot. A comb elevator lifts combs entirely through the open cassette, to transfer the wafers from the buffer robot into the carrier. A process robot moves loaded carriers from the interface section to one or more process chambers in a process section. The advantages of processing wafers within a carrier are achieved within a compact space and with high throughput.

Abstract translation: 工件处理和处理系统具有用于将晶片从盒装载到载体中的接口部分。 通过缓冲电梯将晶片从盒中提出并通过缓冲机器人移动到开放载体上的位置。 梳子电梯通过打开的盒子完全提升梳子，将晶片从缓冲机器人传送到载体中。 过程机器人将加载的载体从接口部分移动到处理部分中的一个或多个处理室。 在紧凑的空间内以高产量实现在载体内处理晶片的优点。

公开(公告)号：US20010012481A1

公开(公告)日：2001-08-09

申请号：US09735154

申请日：2000-12-12

Applicant: Semitool, Inc.

Inventor： Jeffry Davis

IPC: B65G001/00

CPC classification number: H01L21/67754 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707

Abstract: A semiconductor wafer processing system has a carrier including wafer slots. A process robot engages the carrier and installs the carrier into a rotor within a process chamber. The rotor has a tapered or stepped inside surface matching a tapered or stepped outside surface of the carrier . Wafer retainers on the carrier pivot to better secure wafers within the carrier.

Abstract translation: 半导体晶片处理系统具有包括晶片槽的载体。 过程机器人接合载体并将载体安装在处理室内的转子中。 转子具有与载体的锥形或阶梯状外表面匹配的锥形或阶梯状内表面。 载体上的晶片固定器枢转以更好地将晶片保护在载体内。

公开(公告)号：US20040084066A1

公开(公告)日：2004-05-06

申请号：US10286317

申请日：2002-11-01

Applicant: Semitool, Inc.

Inventor： Kert Dolechek ,  Jeffry Davis

IPC: B08B009/20

CPC classification number: H01L21/67769 ,  B08B9/0861 ,  B08B9/28 ,  H01L21/67051 ,  H01L21/67379 ,  H01L21/67775

Abstract: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.

公开(公告)号：US20020154976A1

公开(公告)日：2002-10-24

申请号：US10159879

申请日：2002-05-29

Applicant: Semitool, Inc.

Inventor： Randy Harris ,  David Peterson ,  Jeffry Davis

IPC: B65B021/02 ,  B65G065/04 ,  B65G065/34 ,  B65B069/00

CPC classification number: H01L21/67057 ,  Y10S134/902 ,  Y10S414/135 ,  Y10S414/138

Abstract: A process system for processing semiconductor wafers includes a stocker module, and immersion module, and a process module. A process robot moves on a lateral rail to transfer wavers between the modules. The immersion module is separated from the other modules, to avoid transmission of vibration. Immersion tanks are radially positioned within the immersion module, to provide a compact design. An immersion robot moves batches of wafers on an end effector between the immersion tanks. The end effector may be detachable from the immersion robot, so that the immersion robot can move a second batch of wafers, while the first batch of wafers undergoes an immersion process.