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公开(公告)号:US06487229B2
公开(公告)日:2002-11-26
申请号:US09965492
申请日:2001-09-26
IPC分类号: H01S322
CPC分类号: H01S3/225 , B23K26/12 , B23K26/128 , B23K26/705 , B23K2103/05 , G01J1/4257 , G03F7/70025 , G03F7/70558 , G03F7/70808 , H01S3/0014 , H01S3/134
摘要: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.
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公开(公告)号:US06327290B1
公开(公告)日:2001-12-04
申请号:US09594892
申请日:2000-06-14
IPC分类号: H01G303
CPC分类号: H01S3/225 , B23K26/12 , B23K26/128 , B23K26/705 , B23K2103/05 , G01J1/4257 , G03F7/70025 , G03F7/70558 , G03F7/70808 , H01S3/0014 , H01S3/134
摘要: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.
摘要翻译: 提供了一种系统,用于通过可密封地连接到激光器的密封外壳,优选地将最终导向工件的激光器等激光器(例如F2激光器或ArF激光器)传送波长小于200nm的激光束。 外壳优选被抽空并用惰性气体反填充以充分消耗外壳内的任何空气,水,碳氢化合物或氧气。 之后或者替代地,在激光器的操作期间建立惰性气体流并保持在外壳内。 惰性气体优选具有高纯度,例如超过99.5%,优选大于99.999%,其中惰性气体优选为氮气或惰性气体。 外壳优选由对于200nm以下的辐射透明的窗口密封,以防止在外壳中产生的污染物进入壳体和污染表面。 外壳优选由钢和/或铜制成,并且窗口优选地由CaF 2制成。
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公开(公告)号:US06490305B2
公开(公告)日:2002-12-03
申请号:US09965498
申请日:2001-09-26
IPC分类号: H01S322
CPC分类号: H01S3/225 , B23K26/12 , B23K26/128 , B23K26/705 , B23K2103/05 , G01J1/4257 , G03F7/70025 , G03F7/70558 , G03F7/70808 , H01S3/0014 , H01S3/134
摘要: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.
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公开(公告)号:US20100271704A1
公开(公告)日:2010-10-28
申请号:US12743269
申请日:2008-11-18
申请人: Rainer Pätzel , Ludwig Schwenger
发明人: Rainer Pätzel , Ludwig Schwenger
IPC分类号: G02B27/09
CPC分类号: B23K26/0676 , B23K26/066 , B23K26/067 , G02B27/0927 , G02B27/0961 , G02B27/0994
摘要: Described is a device as well as a method for beam forming a homogenized light beam, particularly a laser beam, with a unit that homogenizes the light beam at least along a cross-sectional axis of the light beam, a mask following downstream in the beam path of the light beam, said mask having mask regions that block the light beam and those that are transparent, and also an optical imaging unit disposed downstream in the beam path.The invention stands out on account of the fact that an optical module is provided in the beam path between the homogenizing unit and the mask, said module imaging the entire cross section of the homogenized light beam largely without losses onto all transparent mask regions with uniform distribution.
摘要翻译: 描述了一种装置以及用于将至少沿着光束的横截面轴使光束均匀化的单元的光束形成均匀化的光束,特别是激光束的方法,在光束的下游之后的掩模 光路的路径,所述掩模具有阻挡光束的掩模区域和透明的掩模区域,以及设置在光束路径下游的光学成像单元。 本发明由于在均匀化单元和掩模之间的光束路径中设置光学模块的事实而突出,所述模块大量成像均匀化光束的整个横截面而不损失到均匀分布的所有透明掩模区域上 。
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