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公开(公告)号:US5283800A
公开(公告)日:1994-02-01
申请号:US858375
申请日:1992-03-26
申请人: Setsuo Suzuki , Yasushi Iseki , Ikuo Watanabe , Kazuo Hayashi , Etsuo Noda , Tomoko Ogawa , Hironobu Kimura , Nobutada Aoki
发明人: Setsuo Suzuki , Yasushi Iseki , Ikuo Watanabe , Kazuo Hayashi , Etsuo Noda , Tomoko Ogawa , Hironobu Kimura , Nobutada Aoki
CPC分类号: H01S3/031
摘要: A metal vapor laser apparatus has a gas supply device. The device supplies at least two kinds of gases to a container of the laser apparatus controlled individually. One of the gases is selected from the group of the molecular gas such as hydrogen gas, the other is selected from the group of rare gas such as neon gas. By adjusting the mixture ratio of these gases, the laser beam output is obtained efficiently. The molecular gas should be supplied when a metal lump, such as copper, arranged in the container is melting.
摘要翻译: 金属蒸气激光装置具有气体供给装置。 该装置将至少两种气体供应给单独控制的激光装置的容器。 气体中的一种选自氢气等分子气体,另一方选自氖气等稀有气体。 通过调节这些气体的混合比例,有效地获得激光束输出。 当容器中布置的金属块(如铜)熔化时,应提供分子气体。
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公开(公告)号:US20080304624A1
公开(公告)日:2008-12-11
申请号:US11950167
申请日:2007-12-04
IPC分类号: H01J35/14
CPC分类号: H01J35/08 , H01J35/14 , H01J2235/087 , H01J2235/186
摘要: A transmission target of a vacuum container is operable to have a ground potential and an electro-optical system is floated at a positive potential in the vacuum container. An electron beam, which is converged by means of the electro-optical system, is decelerated immediately before the electron beam is incident to the transmission target. The electron beam has energy that is several times of the final set value until the electron beam passes through the electro-optical system, and a divergence action exerted by a spatial electric charge effect is reduced. Color aberration of the electro-optical system is proportional to energy of the electron beam. Thus, if the electron beam is decelerated after the electron beam has passed through the electro-optical system, aberration is reduced in proportion to the degree of deceleration, making it possible to concurrently reduce a focus size.
摘要翻译: 真空容器的透射目标可操作为具有接地电位,并且电光系统在真空容器中浮动为正电位。 通过电光学系统会聚的电子束在电子束入射到传输目标之前立即减速。 电子束的能量是最终设定值的几倍,直到电子束通过电光系统,并且由空间电荷效应产生的发散作用减小。 电光系统的色差与电子束的能量成比例。 因此,如果在电子束通过电光系统之后电子束减速,则与减速度成比例地减小像差,从而可以同时减小焦点尺寸。
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公开(公告)号:US07809113B2
公开(公告)日:2010-10-05
申请号:US11905911
申请日:2007-10-05
申请人: Nobutada Aoki , Akiko Kakutani
发明人: Nobutada Aoki , Akiko Kakutani
IPC分类号: H01J35/08
CPC分类号: G01N23/223 , G01N2223/076 , G21K1/10 , H01J35/08 , H01J35/24 , H01J35/32 , H01J2235/081 , H01J2235/086 , H01J2235/088 , H01J2235/186
摘要: The present invention relates to an X-ray source for emitting a characteristic X-ray and a fluorescent X-ray analyzing apparatus using the X-ray source. A secondary target is arranged in superposition on a primary target. An electron beam generated by an electron gun enters the primary target, which passes and emits a continuous X-ray. The secondary target transmits and emits a characteristic X-ray excited by the continuous X-ray emitted from the primary target. The primary target and the secondary target are superposed one on the other, so that the continuous X-ray emitted from the primary target efficiently excites the secondary target thereby to efficiently generate the characteristic X-ray.
摘要翻译: 本发明涉及一种用于发射特征X射线的X射线源和使用该X射线源的荧光X射线分析装置。 辅助目标被叠加在主要目标上。 由电子枪产生的电子束进入主要目标,通过并发射连续的X射线。 二次靶发射并发射由从主要靶发射的连续X射线激发的特征X射线。 主要目标和次要目标彼此叠加,使得从主要目标发射的连续X射线有效地激发二次靶,从而有效地产生特征X射线。
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公开(公告)号:US07649980B2
公开(公告)日:2010-01-19
申请号:US11950167
申请日:2007-12-04
IPC分类号: H01J35/14
CPC分类号: H01J35/08 , H01J35/14 , H01J2235/087 , H01J2235/186
摘要: A transmission target of a vacuum container is operable to have a ground potential and an electro-optical system is floated at a positive potential in the vacuum container. An electron beam, which is converged by means of the electro-optical system, is decelerated immediately before the electron beam is incident to the transmission target. The electron beam has energy that is several times of the final set value until the electron beam passes through the electro-optical system, and a divergence action exerted by a spatial electric charge effect is reduced. Color aberration of the electro-optical system is proportional to energy of the electron beam. Thus, if the electron beam is decelerated after the electron beam has passed through the electro-optical system, aberration is reduced in proportion to the degree of deceleration, making it possible to concurrently reduce a focus size.
摘要翻译: 真空容器的透射目标可操作为具有接地电位,并且电光系统在真空容器中浮动为正电位。 通过电光学系统会聚的电子束在电子束入射到传输目标之前立即减速。 电子束的能量是最终设定值的几倍,直到电子束通过电光系统,并且由空间电荷效应产生的发散作用减小。 电光系统的色差与电子束的能量成比例。 因此,如果在电子束通过电光系统之后电子束减速,则与减速度成比例地减小像差,从而可以同时减小焦点尺寸。
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公开(公告)号:US20080084966A1
公开(公告)日:2008-04-10
申请号:US11905911
申请日:2007-10-05
申请人: Nobutada Aoki , Akiko Kakutani
发明人: Nobutada Aoki , Akiko Kakutani
CPC分类号: G01N23/223 , G01N2223/076 , G21K1/10 , H01J35/08 , H01J35/24 , H01J35/32 , H01J2235/081 , H01J2235/086 , H01J2235/088 , H01J2235/186
摘要: The present invention relates to an X-ray source for emitting a characteristic X-ray and a fluorescent X-ray analyzing apparatus using the X-ray source. A secondary target is arranged in superposition on a primary target. An electron beam generated by an electron gun enters the primary target, which passes and emits a continuous X-ray. The secondary target transmits and emits a characteristic X-ray excited by the continuous X-ray emitted from the primary target. The primary target and the secondary target are superposed one on the other, so that the continuous X-ray emitted from the primary target efficiently excites the secondary target thereby to efficiently generate the characteristic X-ray.
摘要翻译: 本发明涉及一种用于发射特征X射线的X射线源和使用该X射线源的荧光X射线分析装置。 辅助目标被叠加在主要目标上。 由电子枪产生的电子束进入主要目标,通过并发射连续的X射线。 二次靶发射并发射由从主要靶发射的连续X射线激发的特征X射线。 主要目标和次要目标彼此叠加,使得从主要目标发射的连续X射线有效地激发二次靶,从而有效地产生特征X射线。
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公开(公告)号:US6084202A
公开(公告)日:2000-07-04
申请号:US79519
申请日:1998-05-15
申请人: Kouki Okazaki , Arata Ito , Yuji Sano , Naruhiko Mukai , Nobutada Aoki , Chikara Konagai , Muneyoshi Kikunaga
发明人: Kouki Okazaki , Arata Ito , Yuji Sano , Naruhiko Mukai , Nobutada Aoki , Chikara Konagai , Muneyoshi Kikunaga
IPC分类号: B23K26/12 , G21C13/087 , B23K26/00
CPC分类号: B23K26/0608 , B23K26/0069 , B23K26/082 , B23K26/0821 , B23K26/122 , B23K26/142 , G21C13/087 , G21Y2002/10 , G21Y2004/201 , G21Y2004/504 , Y02E30/40
摘要: An underwater laser processing method is carried out by irradiating, through a laser beam irradiation apparatus, a laser beam having a high output, a short pulse and a visible wavelength to a surface of a structure immersed in a water to improve residual stress of a material of the surface of the structure and remove a crack or a CRUD thereof. The laser beam irradiation apparatus comprises a pulse laser device suspended into a water in which a metal material is accommodated from an upper side thereof for irradiating a laser beam having a visible wavelength to a processing position, a beam strength adjusting device for adjusting an output per 1 pulse of a laser beam generated by the pulse laser device and a mechanism for adjusting a spot diameter and a multiplexing ratio of an irradiated beam.
摘要翻译: 通过激光束照射装置将具有高输出,短脉冲和可见波长的激光束照射到浸入水中的结构的表面,以提高材料的残余应力来进行水中激光加工方法 的结构的表面,并去除裂纹或其CRUD。 激光束照射装置包括悬挂在水中的脉冲激光装置,其中从其上侧容纳有金属材料,用于将具有可见波长的激光束照射到处理位置;光束强度调节装置,用于调节每个 由脉冲激光装置产生的激光束的1脉冲和用于调整照射光束的光点直径和复用率的机构。
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公开(公告)号:US5937267A
公开(公告)日:1999-08-10
申请号:US886542
申请日:1997-07-01
申请人: Kenji Todori , Shuji Hayase , Katsushi Nishizawa , Nobutada Aoki , Hideki Shimada , Naoki Tajima , Kazuo Unoki
发明人: Kenji Todori , Shuji Hayase , Katsushi Nishizawa , Nobutada Aoki , Hideki Shimada , Naoki Tajima , Kazuo Unoki
CPC分类号: A62D3/176 , G01N21/643 , A62D2101/22 , A62D2203/10 , G01N2021/6417
摘要: The present invention is to clear the difficulty in determining the progress of the decomposition reaction of PCBs carried out by a conventional device for decomposing PCBs, and to provide a system for treating PCBs to render them harmless, capable of continuously determining the progress of the decomposition reaction of PCBs at real time by using a predetermined amount of a reaction solution taken out while the decomposition reaction of the PCBs is proceeding.The quantity of the polychlorobiphenyls existing in a polychlorobiphenyl-containing liquid can be determined by the system for treating polychlorobiphenyls to render them harmless according to the present invention in the following manner: a polychlorobiphenyl-containing liquid is irradiated with exciting light of from 400 nm to shorter than 450 nm, that can excite the polychlorobiphenyls, or with exciting light of from 300 nm to shorter than 400 nm, that can excite the decomposition products of the polychlorobiphenyls, and the intensity of the emitted light is measured at a wavelength between 450 nm and 600 nm, both inclusive; and the quantity of the existing polychlorobiphenyls is determined based on one of the values measured, or based on the ratio between the two values measured. The progress of the decomposition reaction of the polychlorobiphenyls can thus be determined, and the polychlorobiphenyls can be fully and sufficiently decomposed.
摘要翻译: 本发明是为了清楚确定由用于分解PCB的常规装置进行的PCB的分解反应的进展的困难,并且提供一种用于处理PCB以使其无害的系统,能够连续地确定分解的进展 通过使用在PCB的分解反应进行期间取出的预定量的反应溶液来实时地进行PCB的反应。 存在于含聚氯联苯的液体中的多氯联苯的量可以通过根据本发明的用于处理聚氯联苯以使其无害化的系统以下列方式确定:将含有聚氯联苯的液体用400nm的激发光照射到 小于450nm,可以激发聚氯联苯,或者激发300nm至小于400nm的激发光,其可以激发聚氯联苯的分解产物,并且在450nm的波长处测量发射光的强度 和600 nm; 并且基于所测量的一个值或基于所测量的两个值之间的比率来确定现有的聚氯联苯的量。 因此可以确定聚氯联苯的分解反应的进展,并且聚氯联苯可以完全和充分地分解。
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公开(公告)号:US5790620A
公开(公告)日:1998-08-04
申请号:US593970
申请日:1996-01-30
申请人: Kouki Okazaki , Arata Ito , Yuji Sano , Naruhiko Mukai , Nobutada Aoki , Chikara Konagai , Muneyoshi Kikunaga
发明人: Kouki Okazaki , Arata Ito , Yuji Sano , Naruhiko Mukai , Nobutada Aoki , Chikara Konagai , Muneyoshi Kikunaga
IPC分类号: B23K26/12 , G21C13/087 , G21C19/00
CPC分类号: B23K26/0608 , B23K26/0069 , B23K26/082 , B23K26/0821 , B23K26/122 , B23K26/142 , G21C13/087 , G21Y2002/10 , G21Y2004/201 , G21Y2004/504 , Y02E30/40
摘要: An underwater laser processing method is carried out by irradiating, through a laser beam irradiation apparatus, a laser beam having a high output, a short pulse and a visible wavelength to a surface of a structure immersed in a water to improve residual stress of a material of the surface of the structure and remove a crack or a CRUD thereof. The laser beam irradiation apparatus comprises a pulse laser device suspended into a water in which a metal material is accommodated from an upper side thereof for irradiating a laser beam having a visible wavelength to a processing position, a beam strength adjusting device for adjusting an output per 1 pulse of a laser beam generated by the pulse laser device and a mechanism for adjusting a spot diameter and a multiplexing ratio of an irradiated beam.
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