Method of forming a mask on surface
    1.
    发明申请
    Method of forming a mask on surface 审中-公开
    在表面上形成掩模的方法

    公开(公告)号:US20050090028A1

    公开(公告)日:2005-04-28

    申请号:US10494094

    申请日:2002-10-25

    摘要: A method of forming a mask on a surface utilises the technique of drop on demand ejection to deposit selectively material on said surface. The method comprises the steps of depositing material on said surface to form an outline of the mask on the surface; and subsequently depositing material within said outline to form said mask. Alternatively, the method comprises the steps of depositing material on said surface to form an outline of those parts of the surface on which material is not to be deposited, and subsequently depositing material outside of said outline to form said mask. The formed outline has a greater height than the remainder of the mask so as to provide a barrier for controlling the flow of material subsequently deposited on the surface.

    摘要翻译: 在表面上形成掩模的方法利用按需喷射的技术来选择性地在所述表面上沉积材料。 该方法包括以下步骤:在所述表面上沉积材料以在表面上形成掩模的轮廓; 随后在所述轮廓内沉积材料以形成所述掩模。 或者,该方法包括以下步骤:在所述表面上沉积材料以形成其上不沉积材料的表面的那些部分的轮廓,随后在所述轮廓外部沉积材料以形成所述掩模。 形成的轮廓具有比掩模的其余部分更大的高度,以便提供用于控制随后沉积在表面上的材料的流动的屏障。