摘要:
A magnetic disk is protected by a bilayer. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A magnetic disk is protected by a bilayer. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要翻译:一种在磁读/写磁头或磁盘上形成保护双层的方法。 双层形成为粘合增强底层和保护性金刚石碳(DLC)覆盖层。 底层由铝或合金化的氮氧化铝形成,其具有通式为Al x Si x N y或Y z O 2, 其中Me z z表示Ti z z,Si z z或Cr z z, SUB>,并且其中x,y和z可以在形成过程中变化。 通过调整x和y的值,粘合剂底层有助于保护层的质量,如应力补偿,化学和机械稳定性以及低导电性。 提供了形成底层的各种方法,包括反应离子溅射,等离子体辅助化学气相沉积,脉冲激光沉积和等离子体浸入离子注入。
摘要:
A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing and corrosion resistant underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of transition metal oxynitride, having the general formula MeOxNy, where Me represents a single element or an alloy formed with two or more of the following transition metal elements: Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, here x can be within the range between 0 and 3 and y is in the range between approximately 0 and 2 By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the adhesion layer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要翻译:一种在磁读/写磁头或磁盘上形成保护双层的方法。 双层形成为粘合增强和耐腐蚀的底层和保护性金刚石碳(DLC)覆盖层。 底层由过渡金属氧氮化物形成,具有通式为M 1 O x N y,其中Me表示单一元素或形成有两个或更多个以下转变的合金 金属元素:Ti,Zr,Hf,V,Nb,Ta,Cr,Mo和W,这里x可以在0和3之间的范围内,y在约0和2之间的范围内通过调整x的值 并且y的粘附底层有助于保护双层的质量,如应力补偿,化学和机械稳定性以及低导电性。 提供形成粘合层的各种方法,包括反应离子溅射,等离子体辅助化学气相沉积,脉冲激光沉积和等离子体浸入离子注入。
摘要:
A method for forming a protective bilayer on a substrate that is a magnetic read/write head or a magnetic recording medium. The bilayer is formed as an adhesion enhancing and corrosion resistant underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of silicon oxynitride, having the general formula SiOxNy, where x can be within the range between 0.02 and 2.0 and y is in the range between approximately 0.01 and 1.5. By adjusting the values of x and y the underlayer contributes to such qualities as strong chemical bonding between the substrate and the DLC, wear and corrosion resistance, chemical and mechanical stability and low electrical conductivity. The underlayer may be formed by various methods such as reactive ion sputtering, plasma assisted chemical vapor deposition, reactive pulsed laser deposition, plasma surface treatment and plasma immersion ion implantation.
摘要翻译:一种在作为磁读/写头或磁记录介质的基片上形成保护性双层的方法。 双层形成为粘合增强和耐腐蚀的底层和保护性金刚石碳(DLC)覆盖层。 底层由氮氧化硅形成,具有通式SiO x N y Y y,其中x可以在0.02和2.0之间的范围内,y在大约 0.01和1.5。 通过调整x和y的值,底层有助于衬底与DLC之间的强化学键合,耐磨损和耐腐蚀性,化学和机械稳定性以及低导电性等特性。 底层可以通过诸如反应离子溅射,等离子体辅助化学气相沉积,反应脉冲激光沉积,等离子体表面处理和等离子体浸入离子注入等各种方法形成。
摘要:
A protective bilayer on a magnetic read/write head or magnetic disk is formed as an adhesion enhancing and corrosion resistant underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is a transition metal oxynitride, having the general formula MeOxNy, where Me represents a single element or an alloy of the following transition metal elements: Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, here x can be within the range between 0 and 3 and y is in the range between approximately 0 and 2. Adjusting the values of x and y contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Methods of forming the adhesion layer, include reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.
摘要:
A system and method for adjusting the flying height of a magnetic head above a magnetic storage medium, such as a disk, is disclosed. A charging surface of the slider, separate from the read/write head, allows a charging electrical interconnect to apply an electrical charge to the slider. By acting as a quasi-parallel capacitor, the amount of spacing in the head-disk interface may be increased or decreased based on the amount of voltage applied. The slider may be electrically isolated from the suspension. Simultaneously, a heating element deforms the slider to further adjust the spacing between the read/write head and the disk surface. A feedback control system may monitor and control the head-disk spacing by measuring a temperature or other environmental conditions surrounding the slider and disk.