公开(公告)号：US07102731B2

公开(公告)日：2006-09-05

申请号：US11336947

申请日：2006-01-23

申请人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

发明人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70625 ,  G03F7/70883

摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

公开(公告)号：US07088426B2

公开(公告)日：2006-08-08

申请号：US10927287

申请日：2004-08-27

申请人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

发明人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70625 ,  G03F7/70883

摘要： When a pattern is transferred via a projection optical system, a size of an image of the pattern varies depending on a defocus amount of a transferring position from the best focus position, and a flucuation curve showing the variation (the so-called CD-focus curve) varies depending on wavefront aberration of the projection optical system. There is a close relation between a linear combination value of a plurality of terms that each have a coefficient (an aberration component) of a plurality of Zernike terms (aberration component terms) into which the wavefront aberration of the projection optical system is decomposed using a Zernike polynomial in series expansion, and the variation of the flucuation curve. Accordingly, by using the above relation, the CD-focus curve related to the pattern via a projection optical system whose aberration state is predetermined exposed under predetermined exposure conditions can be predicted within a short period of time by a simple calculation of obtaining the linear combination value of a plurality of terms that each have an aberration component.

摘要翻译： 当通过投影光学系统传送图案时，图案的尺寸根据从最佳对焦位置的转印位置的散焦量而变化，并且显示变化的流感曲线（所谓的CD焦点 曲线）根据投影光学系统的波前像差而变化。 多个项目的线性组合值之间存在密切关系，每个项目的线性组合值各自具有使用以下方式分解投影光学系统的波前像差的多个泽尼克项（像差分量项）的系数（像差分量） Zernike多项式的串联膨胀，以及流变曲线的变化。 因此，通过使用上述关系，可以通过简单的计算获得线性组合，在短时间内预测通过经过预定曝光条件下曝光的像差状态的投影光学系统与图案相关的CD聚焦曲线 每个具有像差分量的多个项的值。

公开(公告)号：US20050024612A1

公开(公告)日：2005-02-03

申请号：US10927287

申请日：2004-08-27

申请人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

发明人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

IPC分类号： G03F7/20 ,  G03B27/68

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70625 ,  G03F7/70883

摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

摘要翻译： 测量投影光学系统的波前像差，获得关于波前像差的信息（步骤102）。 此外，通过投影光学系统将标线图案转印到晶片上（步骤104至108）。 然后，显影图案的摇动器，对形成在晶片上的抗蚀剂图像进行线宽测量，并且对沿预定方向延伸的第一线图案和第二线图案的图像的线宽差 测量与第一线图案正交的（步骤112至118）。 并且，根据作为波前像差的扩展的线性宽度差的Zernike多项式的第12项的值和线宽差，调整投影光学系统，使得第9项（ 低阶球面像差项）（步骤120至124）。

公开(公告)号：US20060227306A1

公开(公告)日：2006-10-12

申请号：US11447004

申请日：2006-06-06

申请人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

发明人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

IPC分类号： G03B27/68

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70625 ,  G03F7/70883

摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

摘要翻译： 测量投影光学系统的波前像差，获得关于波前像差的信息（步骤102）。 此外，通过投影光学系统将标线图案转印到晶片上（步骤104至108）。 然后，显影图案的摇动器，对形成在晶片上的抗蚀剂图像进行线宽测量，并且对沿预定方向延伸的第一线图案和第二线图案的图像的线宽差 测量与第一线图案正交的（步骤112至118）。 并且，根据作为波前像差的扩展的线性宽度差的Zernike多项式的第12条项的值和线宽差，调整投影光学系统，使得9 （低阶球面像差项）被控制（步骤120至124）。

公开(公告)号：US20060119823A1

公开(公告)日：2006-06-08

申请号：US11336947

申请日：2006-01-23

申请人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

发明人： Shigeru Hirukawa ,  Toshiharu Nakashima ,  Kenji Higashi

IPC分类号： G03B27/52

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70625 ,  G03F7/70883

摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).

摘要翻译： 测量投影光学系统的波前像差，获得关于波前像差的信息（步骤102）。 此外，通过投影光学系统将标线图案转印到晶片上（步骤104至108）。 然后，显影图案的摇动器，对形成在晶片上的抗蚀剂图像进行线宽测量，并且对沿预定方向延伸的第一线图案和第二线图案的图像的线宽差 测量与第一线图案正交的（步骤112至118）。 并且，根据作为波前像差的扩展的线性宽度差的Zernike多项式的第12条项的值和线宽差，调整投影光学系统，使得9 （低阶球面像差项）被控制（步骤120至124）。

公开(公告)号：US06208406B1

公开(公告)日：2001-03-27

申请号：US08825398

申请日：1997-03-28

申请人： Toshiharu Nakashima

发明人： Toshiharu Nakashima

IPC分类号： G03B2752

CPC分类号： G03F7/70891 ,  G03F7/70858

摘要： Disclosed is an environmental control apparatus for controlling a working environment in an exposure apparatus for effecting exposure using exposure light having a wavelength range in which oxygen absorbs the exposure light. The apparatus comprises an ozone removing filter for removing ozone in the air supplied to the exposure apparatus. By use of the environmental control apparatus of the present invention, ozone which is present in the air supplied to the exposure apparatus and absorbs the exposure light can be removed, so that a decrease in the amount of exposure light can be suppressed and hence, the amount of exposure light can be stabilized during exposure.

摘要翻译： 公开了一种用于控制曝光装置中的工作环境的环境控制装置，用于利用具有氧吸收曝光光的波长范围的曝光光进行曝光。 该装置包括用于去除供给到曝光装置的空气中的臭氧的臭氧去除过滤器。 通过使用本发明的环境控制装置，可以除去存在于供给曝光装置的空气中并吸收曝光光的臭氧，从而可以抑制曝光光量的减少，因此， 曝光量可以稳定曝光。

公开(公告)号：US09321092B2

公开(公告)日：2016-04-26

申请号：US13810623

申请日：2011-06-21

申请人： Tekkan Takasue ,  Kyousou Ishida ,  Kouji Hironaka ,  Takuya Yamazaki ,  Kenichi Hatakeyama ,  Shinichiro Kurusu ,  Akihiro Nakashima ,  Toshiharu Nakashima

发明人： Tekkan Takasue ,  Kyousou Ishida ,  Kouji Hironaka ,  Takuya Yamazaki ,  Kenichi Hatakeyama ,  Shinichiro Kurusu ,  Akihiro Nakashima ,  Toshiharu Nakashima

IPC分类号： B21D22/02

CPC分类号： B21D22/022 ,  B21D22/02

摘要： Consumed energy is minimized to reduce running cost. Final formed products of uniform quality are successively obtained. High productivity is provided. A primary forming step of obtaining a primary formed product by plastically working a heated steel sheet with a primary forming die set for a predetermined time period, a secondary forming step of machining the primary formed product with the secondary forming die set for a predetermined time period to obtain a secondary formed product, and a hardening step of allowing a cooling die set placed in a hydraulic press controlled by a servomotor to hold the secondary formed product under pressure for a longer time period than the time period of each of the primary and secondary forming steps to obtain a hardened final formed product are successively performed in sequence. The hardening step is performed independently without coordinating with the primary and secondary forming steps.

摘要翻译： 消耗的能量被最小化以降低运行成本。 连续得到质量均匀的成品。 提供高生产率。 一次成形步骤，通过对预成型模具设定预定时间段的加热钢板进行塑性加工来获得初级成形品;二次成形步骤，用二次成型模具加工预定时间段 以获得二次成形产品，以及硬化步骤，其允许放置在由伺服电动机控制的液压机中的冷却模具设置在第二次成形产品的压力下比主要和次要的时间段更长的时间段 依次进行形成步骤以获得硬化的最终形成的产品。 硬化步骤独立地进行而不与主要和次要的成型步骤协调。

公开(公告)号：US11712189B2

公开(公告)日：2023-08-01

申请号：US17078103

申请日：2020-10-23

申请人： Ryoji Hirano ,  Masayuki Hirata ,  Toshiharu Nakashima ,  Miyako Asai

发明人： Ryoji Hirano ,  Masayuki Hirata ,  Toshiharu Nakashima ,  Miyako Asai

IPC分类号： A61B5/00 ,  G16H30/40 ,  A61B5/245 ,  A61B5/369 ,  A61B5/30 ,  G16H50/30 ,  A61B5/316

CPC分类号： A61B5/30 ,  A61B5/245 ,  A61B5/316 ,  A61B5/369 ,  A61B5/7203 ,  A61B5/743 ,  A61B5/7425 ,  G16H30/40 ,  G16H50/30

摘要： A dipole group quantification method includes quantitating a dipole group that are sources of signals based on positions of dipoles.

公开(公告)号：US06281965B1

公开(公告)日：2001-08-28

申请号：US09357847

申请日：1999-07-21

申请人： Toshiharu Nakashima

发明人： Toshiharu Nakashima

IPC分类号： G03B2742

CPC分类号： G03F7/70433 ,  G03F7/2022 ,  G03F7/70458 ,  G03F9/70 ,  G03F9/7046

摘要： An exposure system comprises a first exposure apparatus having a first exposure field and a second exposure apparatus having a second exposure field larger than the first exposure field. A first shot map forming device is provided in the first exposure apparatus to form a first shot map by dividing an exposure region on a photosensitive substrate in units of first shot areas each corresponding to the first exposure field. A control unit transfers information on the first shot map to the second exposure apparatus. A second shot map forming device is provided in the second exposure apparatus to form a second shot map, based on the information on the first shot map, so that a number of shots becomes minimum when an exposure region including the first shot map on the photosensitive substrate is divided in units of second shot areas each corresponding to the second exposure field. A manufacturing method provides apparatus used in the exposure system.

摘要翻译： 曝光系统包括具有第一曝光场的第一曝光装置和具有大于第一曝光场的第二曝光场的第二曝光装置。 第一曝光映射形成装置设置在第一曝光装置中，以通过以与第一曝光场相对应的第一拍摄区域为单位划分感光基板上的曝光区域来形成第一拍摄地图。 控制单元将关于第一拍摄地图的信息传送到第二曝光装置。 第二拍摄地图形成装置设置在第二曝光装置中，以基于关于第一拍摄地图的信息形成第二拍摄地图，使得当包括感光体上的第一拍摄地图的曝光区域时，拍摄次数变得最小 基板以与第二曝光区域对应的第二拍摄区域为单位分割。 制造方法提供在曝光系统中使用的装置。

公开(公告)号：USRE37309E1

公开(公告)日：2001-08-07

申请号：US09112380

申请日：1998-07-09

申请人： Toshiharu Nakashima ,  Masato Hamatani ,  Ken Ozawa

发明人： Toshiharu Nakashima ,  Masato Hamatani ,  Ken Ozawa

IPC分类号： G02B2700

CPC分类号： G03F7/70075 ,  G03F7/70358 ,  G03F7/70575 ,  G03F7/70583

摘要： A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from the light source and illuminating a local area on the mask with the light beam, and a device for synchronously moving the mask and the photosensitive substrate so as to transfer the pattern on the mask onto the photosensitive substrate. A direction, corresponding to a higher spatial coherence of the light beam, is made to coincide with the direction of relative scanning an illumination area and the mask in the illumination area.

摘要翻译： 用于通过扫描曝光方法将形成在掩模上的图案转印到感光基板上的投影曝光装置包括：用于产生具有预定空间相干性的光束的光源;用于接收来自光源的光束的照明光学系统 以及用光束照射掩模上的局部区域，以及用于同步移动掩模和感光基板以将掩模上的图案转印到感光基板上的装置。 对应于光束的较高空间相干性的方向与照明区域中的照明区域和掩模的相对扫描方向一致。