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    Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
    2.
    发明授权
    Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements 有权
    用于通过成形为多个光束元件的带电粒子束曝光物体上的曝光图案的方法和系统

    公开(公告)号：US6118129A

    公开(公告)日：2000-09-12

    申请号：US283974

    申请日：1999-04-01

    申请人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

    发明人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

    IPC分类号： H01J37/147 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/30416 ,  H01J2237/31762 ,  H01L2223/54466

    摘要： A method for exposing an exposure pattern on an object by a charged particle beam, including the steps of: shaping a charged particle beam into a plurality of charged particle beam elements in response to first bitmap data indicative of an exposure pattern, such that the plurality of charged particle beam elements are selectively turned off in response to the first bitmap data; focusing the charged particle beam elements upon a surface of an object; and scanning the surface of the object by the charged particle beam elements; the step of shaping including the steps of: expanding pattern data of said exposure pattern into second bitmap data having a resolution of n times (n.gtoreq.2) as large as, and m times (m.gtoreq.1) as large as, a corresponding resolution of the first bitmap data, respectively in X- and Y-directions; dividing the second bitmap data into cells each having a size of 2n bits in the X-direction and 2m bits in said Y-direction; and creating the first bitmap data from the second bitmap data by selecting four data bits from each of the cells, such that a selection of the data bits is made in each of the cells with a regularity in the X- and Y-directions and such that the number of rows in the X-direction and the number of columns in the Y-direction are both equal to 3 or more.

    摘要翻译： 一种用于通过带电粒子束曝光在物体上的曝光图案的方法，包括以下步骤：响应于指示曝光图案的第一位图数据，将带电粒子束成形为多个带电粒子束元件，使得多个 响应于第一位图数据选择性地关闭带电粒子束元件; 将带电粒子束元件聚焦在物体的表面上; 并通过带电粒子束元件扫描物体的表面; 整形步骤包括以下步骤：将所述曝光图案的图案数据扩展为分辨率为n倍（n> / = 2）分辨率的第二位图数据，并且m倍（m> / = 1） ，分别在X和Y方向上分别对应的第一位图数据的分辨率; 将第二位图数据分割成在X方向上具有2n位大小和在所述Y方向上具有2m位的单元， 以及通过从每个单元中选择四个数据位来从第二位图数据创建第一位图数据，使得在每个单元格中以X方向和Y方向上的规则性进行数据位的选择， X方向上的行数和Y方向上的列数都等于3或更大。