公开(公告)号：US20240176238A1

公开(公告)日：2024-05-30

申请号：US18490857

申请日：2023-10-20

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Masaki Ohashi ,  Jun Hatakeyama ,  Tatsuya Yamahira ,  Yuki Suda

IPC: G03F7/004 ,  C07C69/74 ,  C07C69/78 ,  C07C69/96 ,  C07D333/76 ,  C08F212/14 ,  C08F220/18 ,  C08F220/22 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C69/74 ,  C07C69/78 ,  C07C69/96 ,  C07D333/76 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/22 ,  G03F7/0382 ,  G03F7/0392 ,  C07C2601/12 ,  C07C2603/74

Abstract: A sulfonium salt of specific structure has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

公开(公告)号：US20240168382A1

公开(公告)日：2024-05-23

申请号：US18370578

申请日：2023-09-20

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Tatsuya Yamahira ,  Yuki Suda

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/22

CPC classification number: G03F7/0392 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/22

Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having formula (1).

公开(公告)号：US20240160101A1

公开(公告)日：2024-05-16

申请号：US18370555

申请日：2023-09-20

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Tatsuya Yamahira ,  Yuki Suda

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/2004

Abstract: A resist composition comprising a sulfonium salt composed of a sulfonate anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having the formula (1) exhibits a high sensitivity and reduced LWR or improved CDU.

公开(公告)号：US20240302740A1

公开(公告)日：2024-09-12

申请号：US18426723

申请日：2024-01-30

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Tatsuya Yamahira ,  Jun Hatakeyama ,  Takayuki Fujiwara ,  Yuki Suda

IPC: G03F7/004 ,  C07C59/115 ,  C07D333/76 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C59/115 ,  C07D333/76 ,  G03F7/2004 ,  G03F7/70025 ,  G03F7/70033 ,  C07C2601/08 ,  C07C2601/10 ,  C07C2601/14 ,  C07C2602/08 ,  C07C2603/74

Abstract: A sulfonium salt consisting of a carboxylate anion having a hydroxy group and fluorine or trifluoromethyl at α- or β-position and a phenyldibenzothiophenium cation having a hydrocarbylcarbonyl or hydrocarbyloxycarbonyl group has a high decomposition efficiency and a high acid diffusion controlling ability upon exposure. A resist composition comprising the sulfonium salt offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

公开(公告)号：US20240176235A1

公开(公告)日：2024-05-30

申请号：US18371016

申请日：2023-09-21

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Tatsuya Yamahira ,  Takayuki Fujiwara ,  Yuki Suda

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/2004

Abstract: A resist composition comprising a quencher containing a sulfonium salt composed of a C5-C20 aromatic carboxylic acid anion substituted with a halogen atom or a halogen atom-containing group and a sulfonium cation having the following formula (1).