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公开(公告)号：US20100108918A1
公开(公告)日：2010-05-06
申请号：US12605725
申请日：2009-10-26
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US20110266468A1
公开(公告)日：2011-11-03
申请号：US13184047
申请日：2011-07-15
申请人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US08003963B2
公开(公告)日：2011-08-23
申请号：US12605725
申请日：2009-10-26
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US08530869B2
公开(公告)日：2013-09-10
申请号：US13184047
申请日：2011-07-15
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Hiroshi Sobukawa , Takeshi Murakami , Masahiro Inoue
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。
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公开(公告)号：US20110266467A1
公开(公告)日：2011-11-03
申请号：US13183217
申请日：2011-07-14
申请人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji NAGAI , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。
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公开(公告)号：US07999241B2
公开(公告)日：2011-08-16
申请号：US12605113
申请日：2009-10-23
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。
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公开(公告)号：US08507883B2
公开(公告)日：2013-08-13
申请号：US12559977
申请日：2009-09-15
申请人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21G4/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
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公开(公告)号：US20100140513A1
公开(公告)日：2010-06-10
申请号：US12605113
申请日：2009-10-23
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。
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公开(公告)号：US08569723B2
公开(公告)日：2013-10-29
申请号：US13183217
申请日：2011-07-14
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。
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公开(公告)号：US20100090132A1
公开(公告)日：2010-04-15
申请号：US12559977
申请日：2009-09-15
申请人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
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