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公开(公告)号:US08507883B2
公开(公告)日:2013-08-13
申请号:US12559977
申请日:2009-09-15
申请人: Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人: Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号: G21G4/00
摘要: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译: 一种极紫外光源装置,其具有磁场形成单元,该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括:用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元,其包括至少一个磁源和至少一个磁性材料,所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分,其间具有等离子体发射点,并在其之间形成磁场 目标材料和收集镜的轨迹。
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公开(公告)号:US20100090132A1
公开(公告)日:2010-04-15
申请号:US12559977
申请日:2009-09-15
申请人: Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人: Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号: G21K5/00
摘要: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译: 一种极紫外光源装置,其具有磁场形成单元,该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括:用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元,其包括至少一个磁源和至少一个磁性材料,所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分,其间具有等离子体发射点,并在其之间形成磁场 目标材料和收集镜的轨迹。
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公开(公告)号:US20080095209A1
公开(公告)日:2008-04-24
申请号:US11903111
申请日:2007-09-19
申请人: Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
发明人: Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
IPC分类号: H01S3/22
CPC分类号: H01S3/2333 , H01S3/005 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/073 , H01S3/08009 , H01S3/08045 , H01S3/09702 , H01S3/0971 , H01S3/1055 , H01S3/1305 , H01S3/225 , H01S3/2251 , H01S3/2316 , H01S3/2366
摘要: A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.
摘要翻译: 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中,并且连接到用于放电放电电极1a的12kHz电源15,并且多对放电电极2a,2b布置在 放大级激光器20的光稳定谐振器,并且连接到用于对各个电极对2a,2b进行放电的6kHz电源25a,25b。 与注入的光同步地将放电电压交替地施加到两对电极2a,2b,以引起放电。
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公开(公告)号:US20090232171A1
公开(公告)日:2009-09-17
申请号:US12382109
申请日:2009-03-09
申请人: Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人: Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号: H01S3/10
CPC分类号: H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译: 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器,用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器,以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。
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公开(公告)号:US08000361B2
公开(公告)日:2011-08-16
申请号:US12382109
申请日:2009-03-09
申请人: Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人: Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
CPC分类号: H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译: 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器,用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器,以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。
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公开(公告)号:US20110261844A1
公开(公告)日:2011-10-27
申请号:US13176483
申请日:2011-07-05
申请人: Tamotsu ABE , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人: Tamotsu ABE , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号: H01S3/10
CPC分类号: H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译: 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器,用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器,以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。
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公开(公告)号:US20120091893A1
公开(公告)日:2012-04-19
申请号:US13336749
申请日:2011-12-23
申请人: Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人: Tatsuya YANAGIDA , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号: H05H1/46
CPC分类号: H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译: 在EUV光源装置中,集光镜受到保护,不会损坏镜面涂层。 EUV光源装置包括:产生极紫外光的室; 目标供应单元,用于将目标材料供应到所述室中; 等离子体产生激光器单元,用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元,用于用电离激光束照射在等离子体产生时产生的中性粒子,以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。
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公开(公告)号:US08558202B2
公开(公告)日:2013-10-15
申请号:US13336749
申请日:2011-12-23
申请人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
CPC分类号: H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
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公开(公告)号:US20100181503A1
公开(公告)日:2010-07-22
申请号:US12638571
申请日:2009-12-15
申请人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号: G21K5/02
CPC分类号: H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译: 在EUV光源装置中,集光镜受到保护,不会损坏镜面涂层。 EUV光源装置包括:产生极紫外光的室; 目标供应单元,用于将目标材料供应到所述室中; 等离子体产生激光器单元,用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元,用于用电离激光束照射在等离子体产生时产生的中性粒子,以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。
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公开(公告)号:US08436328B2
公开(公告)日:2013-05-07
申请号:US12638571
申请日:2009-12-15
申请人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人: Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
CPC分类号: H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译: 在EUV光源装置中,集光镜受到保护,不会损坏镜面涂层。 EUV光源装置包括:产生极紫外光的室; 目标供应单元,用于将目标材料供应到所述室中; 等离子体产生激光器单元,用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元,用于用电离激光束照射在等离子体产生时产生的中性粒子,以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。
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