公开(公告)号：US08507883B2

公开(公告)日：2013-08-13

申请号：US12559977

申请日：2009-09-15

申请人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20080095209A1

公开(公告)日：2008-04-24

申请号：US11903111

申请日：2007-09-19

申请人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

发明人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/005 ,  H01S3/036 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/073 ,  H01S3/08009 ,  H01S3/08045 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2366

摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.

摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。

公开(公告)号：US09265136B2

公开(公告)日：2016-02-16

申请号：US13572484

申请日：2012-08-10

申请人： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： H05G2/00 ,  H01S3/102 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/23 ,  H01S3/00

CPC分类号： H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US08710473B2

公开(公告)日：2014-04-29

申请号：US13283849

申请日：2011-10-28

申请人： Hakaru Mizoguchi ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

发明人： Hakaru Mizoguchi ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

IPC分类号： H05G2/00

CPC分类号： H05G2/006 ,  H05G2/008

摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.

摘要翻译： 液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出 检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。

公开(公告)号：US06810061B2

公开(公告)日：2004-10-26

申请号：US10225286

申请日：2002-08-22

申请人： Tsukasa Hori ,  Akira Sumitani ,  Takayuki Yabu ,  Teiichirou Chiba ,  Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Junichi Fujimoto

发明人： Tsukasa Hori ,  Akira Sumitani ,  Takayuki Yabu ,  Teiichirou Chiba ,  Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Junichi Fujimoto

IPC分类号： H01S3097

CPC分类号： H01S3/038 ,  H01S3/0388 ,  H01S3/225

摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.

摘要翻译： 在主放电电极的放电部分上形成膜。 为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。 此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质 主放电电极用于该膜。 结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

公开(公告)号：US20120228527A1

公开(公告)日：2012-09-13

申请号：US13477940

申请日：2012-05-22

申请人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G21K5/02

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US08212228B2

公开(公告)日：2012-07-03

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20090224181A1

公开(公告)日：2009-09-10

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G01J3/10

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 可以防止残留在室内积聚的碎片的极紫外光源装置污染室，劣化重要的光学部件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20130208742A1

公开(公告)日：2013-08-15

申请号：US13817818

申请日：2012-02-17

申请人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

发明人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

IPC分类号： H01S3/10

CPC分类号： H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

摘要翻译： 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。