公开(公告)号：US20100108918A1

公开(公告)日：2010-05-06

申请号：US12605725

申请日：2009-10-26

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

公开(公告)号：US08530869B2

公开(公告)日：2013-09-10

申请号：US13184047

申请日：2011-07-15

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： A61N5/06 ,  G01N21/64 ,  G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

公开(公告)号：US20110266468A1

公开(公告)日：2011-11-03

申请号：US13184047

申请日：2011-07-15

申请人： Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

公开(公告)号：US08003963B2

公开(公告)日：2011-08-23

申请号：US12605725

申请日：2009-10-26

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Hiroshi Sobukawa ,  Takeshi Murakami ,  Masahiro Inoue

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.

摘要翻译： 极紫外光源装置包括将目标供给到真空室中的目标供给单元，将激光输出到真空室中的激光振荡器，通过反射从目标发射的极紫外光而向外部输出极紫外光的集光镜 通过在真空室中的等离子体发光点用激光照射等离子体，以及离子碎片去除单元，其至少一部分位于包括等离子体发光点的遮蔽区域中。

公开(公告)号：US08710472B2

公开(公告)日：2014-04-29

申请号：US13192857

申请日：2011-07-28

申请人： Takanobu Ishihara ,  Youichi Sasaki ,  Kouji Kakizaki ,  Masahiro Inoue ,  Takayuki Yabu ,  Hideo Hoshino

发明人： Takanobu Ishihara ,  Youichi Sasaki ,  Kouji Kakizaki ,  Masahiro Inoue ,  Takayuki Yabu ,  Hideo Hoshino

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.

摘要翻译： 目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压 目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

公开(公告)号：US20110284774A1

公开(公告)日：2011-11-24

申请号：US13192857

申请日：2011-07-28

申请人： Takanobu ISHIHARA ,  Youichi Sasaki ,  Kouji Kakizaki ,  Masahiro Inoue ,  Takayuki Yabu ,  Hideo Hoshino

发明人： Takanobu ISHIHARA ,  Youichi Sasaki ,  Kouji Kakizaki ,  Masahiro Inoue ,  Takayuki Yabu ,  Hideo Hoshino

IPC分类号： G21K5/00 ,  H05H1/24

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.

摘要翻译： 目标输出装置可以包括：用于存储目标材料的主体; 喷嘴单元，连接到主体，用于输出目标材料作为目标; 设置成面向喷嘴单元的电极单元; 电压控制单元，其在所述电极单元和所述目标材料之间施加预定电压，以在其间产生静电力，以通过所述喷嘴单元拉出所述目标材料; 压力控制单元，其向所述目标材料施加预定压力; 以及输出控制单元，其通过控制第一定时信号和第二定时信号中的每一个的信号输出定时使所述目标通过所述喷嘴单元输出，所述第一定时信号使所述电压控制单元在所述第一定时信号和所述第二定时信号之间施加所述预定电压 目标材料和电极单元，以及第二定时信号，使得压力控制单元在第二定时将预定压力施加到目标材料。

公开(公告)号：US20120104289A1

公开(公告)日：2012-05-03

申请号：US13283849

申请日：2011-10-28

申请人： Hakaru MIZOGUCHI ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

发明人： Hakaru MIZOGUCHI ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

IPC分类号： G01J3/10

CPC分类号： H05G2/006 ,  H05G2/008

摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.

摘要翻译： 液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出 检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。

公开(公告)号：US08710473B2

公开(公告)日：2014-04-29

申请号：US13283849

申请日：2011-10-28

申请人： Hakaru Mizoguchi ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

发明人： Hakaru Mizoguchi ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Masahiro Inoue

IPC分类号： H05G2/00

CPC分类号： H05G2/006 ,  H05G2/008

摘要： A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.

摘要翻译： 液滴生成和检测装置可以包括：用于输出带电液滴的液滴产生单元; 至少一个液滴传感器，其包括包括由导电材料构成的线圈的磁路，所述磁路被布置成使得所述带电液滴绕过所述磁路;以及电流检测单元，用于检测在所述线圈中流动的电流并输出 检测信号; 以及信号处理电路，用于根据检测信号检测带电液滴。

公开(公告)号：US08937256B2

公开(公告)日：2015-01-20

申请号：US13353965

申请日：2012-01-19

申请人： Masahiro Inoue ,  Hajime Saiki ,  Atsuhiko Sugimoto

发明人： Masahiro Inoue ,  Hajime Saiki ,  Atsuhiko Sugimoto

IPC分类号： H01K1/02 ,  H05K13/04 ,  H05K3/34 ,  H01L23/00

CPC分类号： H05K3/3478 ,  H01L24/81 ,  H01L2224/10126 ,  H01L2224/16225 ,  H01L2924/14 ,  H05K3/3436 ,  H05K3/3484 ,  H05K2201/10977 ,  H01L2924/00

摘要： A method for manufacturing a wiring board for mounting an electronic component, a wiring board for mounting an electronic component, and a method for manufacturing an electronic-component-mounted wiring board are provided. A bonding material paste, which can include solder and an electric insulation material made of a resin, can be placed on chip mount terminal pads and heated to fuse the solder and soften the electric insulation material. Subsequently, the solder is solidified to form solder bumps. Further, the electric insulation material is cured on a surface of each of the solder bumps and a surface of a multilayer board around each of the solder bumps to form an electric insulation surface layer. Accordingly, when a chip is mounted to such wiring boards, the electric insulation surface layer minimizes or eliminates the connection between adjacent solder bumps during re-fusing of the solder.

摘要翻译： 本发明提供一种电子部件安装用布线基板的制造方法，电子部件的安装用布线基板以及电子元件搭载布线基板的制造方法。 可以将包括焊料和由树脂制成的电绝缘材料的接合材料糊料放置在芯片安装端子焊盘上并加热以熔化焊料并软化电绝缘材料。 随后，焊料固化形成焊料凸块。 此外，电绝缘材料在每个焊料凸块的表面和每个焊料凸块周围的多层板的表面上固化，以形成电绝缘表面层。 因此，当芯片安装到这种布线板时，电绝缘表面层在焊料的再熔合期间使相邻焊料凸块之间的连接最小化或消除。

公开(公告)号：US08253313B2

公开(公告)日：2012-08-28

申请号：US13234212

申请日：2011-09-16

申请人： Masahiro Inoue ,  Hiroyuki Kameda

发明人： Masahiro Inoue ,  Hiroyuki Kameda

IPC分类号： H01T13/20

CPC分类号： H01T13/32 ,  H01T21/02

摘要： A spark plug having improved durability having a ground electrode comprised of a ground electrode base member and a noble metal tip. A center axis of the noble metal tip slants in relation to the center axis of the ground electrode base member at angle θ which satisfies a relation 2°≦θ≦25°.

摘要翻译： 一种具有改进的耐久性的火花塞，具有由接地电极基体和贵金属电极构成的接地电极。 贵金属端头的中心轴相对于接地电极基体的中心轴线以角度θ倾斜; 满足关系2°＆nlE;＆thetas;＆nlE; 25°。