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公开(公告)号:US4363953A
公开(公告)日:1982-12-14
申请号:US145742
申请日:1980-05-01
申请人: Teiji Katsuta , Koji Nishiwaki , Shinjiro Katagiri
发明人: Teiji Katsuta , Koji Nishiwaki , Shinjiro Katagiri
IPC分类号: G03F7/20 , B23K15/00 , B41M5/26 , G03F7/039 , G11B9/10 , H01J37/30 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/30
CPC分类号: B82Y10/00 , B23K15/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01L21/30 , H01J2237/30483 , H01J2237/31776
摘要: A plurality of band-shaped regions on a specimen are successively scanned by an electron beam having a ribbon-shaped rectangular cross-section. This scanning is effected by deflecting the electron beam electrostatically in the direction of the shorter side of the beam cross-section and electromagnetically in the direction of the longer side of the beam cross-section.
摘要翻译: 通过具有带状矩形横截面的电子束连续地扫描样本上的多个带状区域。 该扫描是通过使光束横截面的短边方向静电偏转电子束,并且在光束横截面的长边方向上以电磁方式进行扫描。
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公开(公告)号:US4189641A
公开(公告)日:1980-02-19
申请号:US829916
申请日:1977-09-01
CPC分类号: H01J37/265
摘要: An electron beam emitted from an electron beam source is applied to a sample and when it produces an magnified image of the sample on a fluorescent plate, the amount of the electron beam is detected. When the accumulation of the electron beam radiation reaches a predetermined value with lapse of the time, the beam density on the surface of the sample is so controlled as to be reduced to zero or below a certain preset level, whereby the sample is prevented from damage due to excessive exposure to the electron beam.
摘要翻译: 从电子束源发射的电子束被施加到样品上,并且当其在荧光板上产生样品的放大图像时,检测电子束的量。 当电子束辐射的累积随着时间的推移达到预定值时,样品表面上的光束密度被控制为降低到零或低于某一预设水平,从而防止样品损坏 由于过度暴露于电子束。
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公开(公告)号:US4433228A
公开(公告)日:1984-02-21
申请号:US319987
申请日:1981-11-10
申请人: Shigeru Nishimatsu , Keizo Suzuki , Noriyuki Sakudo , Ken Ninomiya , Hidemi Koike , Osami Okada , Shinjiro Katagiri , Sadayuki Okudaira
发明人: Shigeru Nishimatsu , Keizo Suzuki , Noriyuki Sakudo , Ken Ninomiya , Hidemi Koike , Osami Okada , Shinjiro Katagiri , Sadayuki Okudaira
IPC分类号: H01J25/50 , H01J27/16 , H01J37/08 , H01J37/317 , H01J37/32 , H01L21/265 , H01L21/302 , H01L21/3065 , H05H1/46
CPC分类号: H01J37/32211 , H01J37/32192 , H01J37/32293
摘要: The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.
摘要翻译: 本发明的微波等离子体源包括形成放电空间的真空室,其中引入有放电气体,用于将微波传导到放电空间的装置,使得微波电场设置在放电空间中,以及用于提供 位于微波传播路径上的放电空间中的磁场,并由实际上传播微波的永磁体组成。
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公开(公告)号:US4139774A
公开(公告)日:1979-02-13
申请号:US872762
申请日:1978-01-27
申请人: Shinjiro Katagiri
发明人: Shinjiro Katagiri
CPC分类号: H01J37/18
摘要: A specimen chamber is which a specimen to be irradiated by an electron beam is arranged is evacuated by an evacuation device. The evacuation device includes a nonvaporative bulk getter vacuum pump and an oil rotary pump. The oil rotary pump is used for evacuating the specimen chamber from the atmospheric pressure to 10.sup.-1 - 10.sup.-2 Torr, while the nonvaporative bulk getter vacuum pump is used for continuously evacuating the specimen chamber to 10.sup.-5 - 10.sup.-6 Torr. The steady vacuum of 10.sup.-5 - 10.sup.-6 Torr is maintained by only the nonvaporative bulk getter vacuum pump.
摘要翻译: 将通过电子束照射的试样的试样室由排气装置抽真空。 排气装置包括非蒸发性大块吸气真空泵和油旋转泵。 油旋转泵用于将样品室从大气压力抽真空至10-1-10-2 Torr,而非蒸发式吸气真空泵用于将样品室连续抽空至10-5-10-6 Torr。 10-5-10-6乇的稳定真空度仅由非蒸发式吸气真空泵保持。
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公开(公告)号:US4121100A
公开(公告)日:1978-10-17
申请号:US788538
申请日:1977-04-18
CPC分类号: H01J37/04
摘要: An electron beam from an electron gun is made to focus on a first position by a focussing lens system. The focussed beam is then magnified and projected on a screen through a magnification lens system having an objective lens, an intermediate lens and a projection lens.The excitation is so variable that the electron beam may be focussed also on a second position behind the projection lens.A specimen is positioned at the first position for normal electron microscope analysis, while, for a scanning electron microscope analysis, another specimen is put at the second position.
摘要翻译: 通过聚焦透镜系统使来自电子枪的电子束聚焦在第一位置上。 然后通过具有物镜,中间透镜和投影透镜的放大透镜系统将聚焦光束放大并投影在屏幕上。
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