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62 条记录 (耗时 0.051 秒)

    BLOOD PRESSURE ESTIMATION APPARATUS AND METHOD
    1.
    发明申请
    BLOOD PRESSURE ESTIMATION APPARATUS AND METHOD 审中-公开
    血压估计装置及方法

    公开(公告)号：US20150080673A1

    公开(公告)日：2015-03-19

    申请号：US14394921

    申请日：2012-04-20

    申请人： Shinya Hashimoto ,  Kiyoshi Tateishi ,  Atsuya Ito ,  Hiroyuki Ishihara ,  Masaki Goma

    发明人： Shinya Hashimoto ,  Kiyoshi Tateishi ,  Atsuya Ito ,  Hiroyuki Ishihara ,  Masaki Goma

    IPC分类号： A61B5/021 ,  A61B5/00 ,  A61B5/026

    CPC分类号： A61B5/021 ,  A61B5/026 ,  A61B5/0261 ,  A61B5/7221 ,  A61B5/7278

    摘要： A blood pressure estimation apparatus (1) is provided with: a blood pressure measuring device (11) which measures a blood pressure (BPm) of a living body every first period; a blood flow measuring device (12) which measures a blood flow volume (BF) of the living body every second period which is shorter than the first period; and a blood pressure estimating device (13) which estimates the blood pressure (BPc) every third period which is shorter than the first period, on the basis of the blood pressure which is measured by the blood pressure measuring device and the blood flow volume which is measured by the blood flow measuring device.

    摘要翻译： 血压估计装置（1）具备：测量第一期间的生物体的血压（BPm）的血压测定装置（11） 血流计测装置，其每隔第一期间比第一期间短的情况下测量生物体的血流量（BF）; 和血压估计装置（13），其基于由血压测定装置测定的血压和血液流量来估计比第一期间短的第三期间的血压（BPc）， 由血流测量装置测量。

    Piezoelectric resonator plate and piezoelectric resonator device
    3.
    发明授权
    Piezoelectric resonator plate and piezoelectric resonator device 有权
    压电谐振板和压电谐振器装置

    公开(公告)号：US08004157B2

    公开(公告)日：2011-08-23

    申请号：US11885260

    申请日：2006-03-02

    申请人： Minoru Iizuka ,  Tatsuya Murakami ,  Syunsuke Satoh ,  Takashi Shirai ,  Hiroyuki Ishihara ,  Tomo Fujii

    发明人： Minoru Iizuka ,  Tatsuya Murakami ,  Syunsuke Satoh ,  Takashi Shirai ,  Hiroyuki Ishihara ,  Tomo Fujii

    IPC分类号： H01L41/08

    CPC分类号： H03H9/1021 ,  H03H9/215

    摘要： An electrode forming region for providing lead electrodes (65a, 65b) is provided on a crystal resonator plate (2). Opposed side surfaces (67a, 67b) of a substrate (6) are formed and inclined in the same direction with respect to a front major surface (63). Also, an adhesion reinforcing portion (7) for reinforcing adhesion to a conductive adhesive (5) is provided in the electrode forming region for the lead electrodes (65a, 65b). For example, the adhesion reinforcing portion (7) is a notch portion which is cut and formed in the opposed side surfaces (67a, 67b). Thereby, an adhesion strength of the crystal resonator plate (2) and the conductive adhesive (5) is increased.

    摘要翻译： 在晶体谐振器板（2）上设置用于提供引线电极（65a，65b）的电极形成区域。 形成基板（6）的相对的侧面（67a，67b）并相对于前主表面（63）沿相同的方向倾斜。 此外，在用于引线电极（65a，65b）的电极形成区域中设置有用于增强与导电粘合剂（5）的粘附的粘合增强部分（7）。 例如，粘合强化部（7）是在相对的侧面（67a，67b）上切断并形成的切口部。 由此，增加了晶体谐振器板（2）和导电粘合剂（5）的粘附强度。

    Piezoelectric Resonator Plate and Piezoelectric Resonator Device
    6.
    发明申请
    Piezoelectric Resonator Plate and Piezoelectric Resonator Device 有权
    压电谐振器板和压电谐振器器件

    公开(公告)号：US20080265717A1

    公开(公告)日：2008-10-30

    申请号：US11885260

    申请日：2006-03-02

    申请人： Minoru Iizuka ,  Tatsuya Murakami ,  Syunsuke Satoh ,  Takashi Shirai ,  Hiroyuki Ishihara ,  Tomo Fujii

    发明人： Minoru Iizuka ,  Tatsuya Murakami ,  Syunsuke Satoh ,  Takashi Shirai ,  Hiroyuki Ishihara ,  Tomo Fujii

    IPC分类号： H03H9/10

    CPC分类号： H03H9/1021 ,  H03H9/215

    摘要： An electrode forming region for providing lead electrodes (65a, 65b) is provided on a crystal resonator plate (2). Opposed side surfaces (67a, 67b) of a substrate (6) are formed and inclined in the same direction with respect to a front major surface (63). Also, an adhesion reinforcing portion (7) for reinforcing adhesion to a conductive adhesive (5) is provided in the electrode forming region for the lead electrodes (65a, 65b). For example, the adhesion reinforcing portion (7) is a notch portion which is cut and formed in the opposed side surfaces (67a, 67b). Thereby, an adhesion strength of the crystal resonator plate (2) and the conductive adhesive (5) is increased.

    摘要翻译： 在晶体谐振器板（2）上设置用于提供引线电极（65a，65b）的电极形成区域。 形成基板（6）的相对的侧面（67a，67b）并相对于前主表面（63）沿相同的方向倾斜。 此外，在用于引线电极（65a，65b）的电极形成区域中设置用于增强与导电粘合剂（5）的粘附的粘附强化部分（7）。 例如，粘合强化部（7）是在相对的侧面（67a，67b）中被切割并形成的切口部。 由此，增加了晶体谐振器板（2）和导电粘合剂（5）的粘附强度。

    Method of plasma processing
    8.
    发明授权
    Method of plasma processing 有权
    等离子体处理方法

    公开(公告)号：US07183219B1

    公开(公告)日：2007-02-27

    申请号：US09869277

    申请日：1999-12-21

    申请人： Kiichi Hama ,  Hiroyuki Ishihara ,  Akinori Kitamura

    发明人： Kiichi Hama ,  Hiroyuki Ishihara ,  Akinori Kitamura

    IPC分类号： H01L21/302 ,  H01L21/3065

    CPC分类号： H01J37/3299 ,  H01L21/31116

    摘要： An SiO2 film layer formed at a wafer placed inside a process chamber of an etching device is etched by generating plasma from a process gas containing fluorocarbon which has been introduced into the process chamber. The contents of an etchant and the byproducts are measured through infrared laser absorption analysis. The individual contents thus measured are compared with the contents of the etchant and the byproducts in the plasma corresponding to the increase in the aspect ratio of a contact hole set in advance. The quantity of O2 added into the process gas is adjusted to match the measured contents with the predetermined contents. The quantity of O2 added into the process gas is continuously increased as the aspect ratio becomes higher. As a result, a contact hole is formed at the SiO2 film layer without damaging the photoresist film layer or inducing an etch stop.

    摘要翻译： 在放置在蚀刻装置的处理室内的晶片上形成的SiO 2膜层通过从已经被引入到处理室中的含有碳氟化合物的工艺气体产生等离子体来蚀刻。 通过红外激光吸收分析测量蚀刻剂和副产物的含量。 将如此测量的各个内容与预先设定的接触孔的纵横比的增加相对应的等离子体中的蚀刻剂和副产物的含量进行比较。 调整添加到处理气体中的O 2 2的量以使测量的内容与预定内容相匹配。 加入到工艺气体中的O 2 2的量随着纵横比变高而不断增加。 结果，在SiO 2膜层处形成接触孔，而不损害光致抗蚀剂膜层或引起蚀刻停止。

    Carrying vehicle, manufacturing apparatus, and carrying system
    9.
    发明授权
    Carrying vehicle, manufacturing apparatus, and carrying system 失效
    携带车辆，制造设备和搬运系统

    公开(公告)号：US07014672B2

    公开(公告)日：2006-03-21

    申请号：US10462732

    申请日：2003-06-17

    申请人： Hiroyuki Ishihara ,  Takao Shimizu ,  Takashi Nakao ,  Ryosuke Tahara ,  Hidetoshi Takeuchi

    发明人： Hiroyuki Ishihara ,  Takao Shimizu ,  Takashi Nakao ,  Ryosuke Tahara ,  Hidetoshi Takeuchi

    IPC分类号： B01D46/10 ,  B65B1/04

    CPC分类号： H01L21/67724 ,  B01D50/00 ,  H01L21/67017 ,  H01L21/67736 ,  Y10S55/18 ,  Y10S55/29 ,  Y10S55/46

    摘要： According to the present invention, in a carrying system comprising a carrying vehicle and a manufacturing apparatus the interior of which is kept cleaner than a surrounding environment, manufactured articles to be transferred are prevented from being contaminated by foreign matter or the like attached to transfer ports. A carrying vehicle includes a running unit 14 that runs along a predetermined carrying path, a cleaning unit 12 that supplies cleaned air, a housing section 13 to which the cleaned air is supplied and in which manufactured articles are housed, a transfer port 11 which is formed in a side of a housing and through which a manufactured article is loaded into or unloaded from the housing section 13, and an air injecting section 19A that blows out air toward the transfer port 11.

    摘要翻译： 根据本发明，在包括运载车辆和制造装置的承载系统中，其内部保持比周围环境更清洁，防止被转移的制品被附着到输送口的异物等被污染 。 运送车辆包括沿着预定运送路径延伸的运行单元14，提供净化空气的清洁单元12，供应清洁空气的容纳部分13，容纳有制成品的传送口11， 形成在壳体的一侧，并且制造品从壳体部分13装载或卸载;以及空气喷射部分19A，其向输送口11吹出空气。