公开(公告)号：US6060836A

公开(公告)日：2000-05-09

申请号：US23719

申请日：1998-02-13

Applicant: Shuichi Maeno ,  Yasunori Ando ,  Yasuhiro Matsuda

Inventor： Shuichi Maeno ,  Yasunori Ando ,  Yasuhiro Matsuda

IPC: C23C14/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J27/16 ,  H01J27/18 ,  H01J37/08 ,  H01L21/205 ,  H01L21/265 ,  H05H1/46 ,  H05B37/02

CPC classification number: H05H1/46 ,  H01J27/18 ,  H01J2237/0817

Abstract: A plasma generating apparatus has a plasma-generating vessel into which a gas is introduced. A coaxial line is inserted into the plasma-generating vessel. The coaxial line is insulated from the vessel with an insulator. The coaxial line has a central conductor and an outer conductor, to both of which microwave is supplied from a magnetron. That part of the central conductor which is located inside the plasma-generating vessel has, disposed therein, permanent magnets which form a cusp field. A seed plasma is formed around the permanent magnets by microwave discharge. A direct-current voltage is applied from a direct-voltage source between the outer conductor 24 and the plasma-generating vessel. Upon this application, electrons in the seed plasma move toward the inner wall of the plasma-generating vessel and are accelerated to ionize the gas. The ionized gas serves as seeds to cause arc discharge between the outer conductor and the plasma-generating vessel to generate a main plasma. By disposing an extracting electrode at the opening of the plasma-generating vessel, ion beams can be extracted from the main plasma.

Abstract translation: 等离子体发生装置具有引入气体的等离子体产生容器。 同轴线插入等离子体发生容器中。 同轴线与具有绝缘体的容器绝缘。 同轴线具有中心导体和外导体，两者均由磁控管提供微波。 位于等离子体发生容器内部的中心导体的部分在其中设置有形成尖点场的永磁体。 通过微波放电在永磁体周围形成种子等离子体。 从外部导体24和等离子体发生容器之间的直流电压源施加直流电压。 在这种应用中，种子等离子体中的电子朝向等离子体发生容器的内壁移动并被加速以使气体离子化。 电离气体用作种子以在外导体和等离子体发生容器之间产生电弧放电以产生主等离子体。 通过在等离子体发生容器的开口处设置提取电极，可以从主等离子体中提取离子束。

公开(公告)号：US06555831B1

公开(公告)日：2003-04-29

申请号：US09559728

申请日：2000-04-28

Applicant: Masashi Konishi ,  Shuichi Maeno ,  Yasunori Ando

Inventor： Masashi Konishi ,  Shuichi Maeno ,  Yasunori Ando

IPC: H01J3700

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/0822

Abstract: An ion implanting apparatus is provided with a control apparatus 22 for controlling the filament current passing to the respective filaments 6 in accordance with the beam current IB measured by a plurality of beam current measuring instruments 18. The control apparatus 22 performs, at least once respectively, {circle around (1)} the current value control routine which calculates average values of all beam current measured by the beam current measuring instruments 18, and increases and decreases the respective filament current IF such that the average value comes near to the set value, and {circle around (2)} the uniformity control routine which groups the beam current measuring instruments 17 into the number of the filaments, seeks for a maximum value and the minimum value from all the measured values of the beam current IB, decides groups to which the maximum value and the minimum value belong, decreases the filament current IF passing to the filaments 6 corresponding to the maximum value, and increases the filament current IF passing to the filaments 6 corresponding to the minimum value.

Abstract translation: 离子注入装置设置有控制装置22，用于根据由多个射束电流测量仪器18测量的射束电流IB来控制通过各细丝6的细丝电流。控制装置22至少分别执行一次 ，{圆周（1）计算由束电流测量仪18测量的所有束电流的平均值的当前值控制程序，并使各灯丝电流IF增加和减小使得平均值接近设定值，以及 {圆周（2）将束电流测量仪器17组合成长丝数的均匀性控制程序寻求最大值，并从束电流IB的全部测量值求最小值，决定最大值 值和最小值属于的情况，减少对应于最大值的细丝6的细丝电流IF ，并且增加对应于最小值的细丝6的细丝电流IF。

公开(公告)号：US20050162175A1

公开(公告)日：2005-07-28

申请号：US11089984

申请日：2005-03-25

Applicant: Shuichi Maeno

Inventor： Shuichi Maeno

IPC: H01L21/26 ,  G01R29/24 ,  H01J37/317 ,  G01R31/26

CPC classification number: G01R29/24

Abstract: The charging voltage measuring device includes a measuring electrode for forming an electrostatic capacity Cs with a substrate disposed on a substrate holding unit, a measuring capacitor, which has an electrostatic capacity Cm, being connected between the measuring electrode and a ground potential portion, and, a voltage measuring unit for measuring a measuring voltage Vm across the measuring capacitor, and a calculating unit. The calculating unit 22 calculates the charging voltage Vs on the surface of the substrate at time t1 in accordance with the following numerical expression on the basis of the measuring voltage Vm(t1) at time t1, an inverse K of a voltage dividing ratio and a resistance value Rm of a resistor disposed in parallel to the measuring capacitor 18, when the measurement time is t1. Vs=K[Vm(t1)+{1/(Cm·Rm)}∫0t1Vm(t)dt]where K=(Cs+Cm)/Cs or K=Cm/Cs (if Cm>>Cs)

Abstract translation: 充电电压测量装置包括：测量电极，用于形成具有设置在基板保持单元上的基板的静电电容Cs;测量电容器，其具有连接在测量电极和接地电位部分之间的静电电容Cm; 用于测量测量电容器两端的测量电压Vm的电压测量单元和计算单元。 计算单元22基于在时刻t 1的测量电压Vm（t 1），电压分压的倒数K，根据下面的数值计算时刻t 1的基板表面的充电电压Vs 比率和与测量电容器18并联设置的电阻器的电阻值Rm，当测量时间为t时。<？in-line-formula description =“In-line Formulas”end =“lead”？> Vs = K [Vm（t 1）+ {1 /（Cm.Rm）0 t1 Vm（t）dt] <？in-line-formula description =“In- 其中K =（Cs + Cm）/ Cs或K = Cm / Cs（如果Cm >> Cs）

公开(公告)号：US06943568B2

公开(公告)日：2005-09-13

申请号：US10665262

申请日：2003-09-22

Applicant: Shuichi Maeno

Inventor： Shuichi Maeno

IPC: H01L21/26 ,  G01R29/24 ,  H01J37/317 ,  G01R19/00 ,  G01R31/303 ,  H05H1/00

CPC classification number: G01R29/24

Abstract: The charging voltage measuring device includes a measuring electrode for forming an electrostatic capacity Cs with a substrate disposed on a substrate holding unit, a measuring capacitor, which has an electrostatic capacity Cm, being connected between the measuring electrode and a ground potential portion, and, a voltage measuring unit for measuring a measuring voltage Vm across the measuring capacitor, and a calculating unit. The calculating unit 22 calculates the charging voltage Vs on the surface of the substrate at time t1 in accordance with the following numerical expression on the basis of the measuring voltage Vm(t1) at time t1, an inverse K of a voltage dividing ratio and a resistance value Rm of a resistor disposed in parallel to the measuring capacitor 18, when the measurement time is t1. Vs=K[Vm(t1)+{1/(Cm·Rm)}∫0t1Vm(t)dt] where K=(Cs+Cm)/Cs or K=Cm/Cs (if Cm>>Cs).

Abstract translation: 充电电压测量装置包括：测量电极，用于形成具有设置在基板保持单元上的基板的静电电容Cs;测量电容器，其具有连接在测量电极和接地电位部分之间的静电电容Cm; 用于测量测量电容器两端的测量电压Vm的电压测量单元和计算单元。 计算单元22基于在时刻t 1的测量电压Vm（t 1），电压分压的倒数K，根据下面的数值计算时刻t 1的基板表面的充电电压Vs 比率和与测量电容器18并联设置的电阻器的电阻值Rm，当测量时间为t时。<？in-line-formula description =“In-line Formulas”end =“lead”？> Vs = K [Vm（t 1）+ {1/(Cm.Rm)}∫₀^t1Vm(t)dt]> Cs）的直线公式“end =”tail“？>

公开(公告)号：US07148705B2

公开(公告)日：2006-12-12

申请号：US11089984

申请日：2005-03-25

Applicant: Shuichi Maeno

Inventor： Shuichi Maeno

IPC: G01R19/00 ,  G01R31/303 ,  H05H1/00

CPC classification number: G01R29/24

Abstract: The charging voltage measuring device includes a measuring electrode for forming an electrostatic capacity Cs with a substrate disposed on a substrate holding unit, a measuring capacitor, which has an electrostatic capacity Cm, being connected between the measuring electrode and a ground potential portion, and, a voltage measuring unit for measuring a measuring voltage Vm across the measuring capacitor, and a calculating unit. The calculating unit 22 calculates the charging voltage Vs on the surface of the substrate at time t1 in accordance with the following numerical expression on the basis of the measuring voltage Vm(t1) at time t1, an inverse K of a voltage dividing ratio and a resistance value Rm of a resistor disposed in parallel to the measuring capacitor 18, when the measurement time is t1 Vs=K[Vm(t1)+{1/(Cm·Rm)}∫0t1Vm(t)dt] where K=(Cs+Cm)/Cs or K=Cm/Cs (if Cm>>Cs).

Abstract translation: 充电电压测量装置包括：测量电极，用于形成具有设置在基板保持单元上的基板的静电电容Cs;测量电容器，其具有连接在测量电极和接地电位部分之间的静电电容Cm; 用于测量测量电容器两端的测量电压Vm的电压测量单元和计算单元。 计算单元22基于在时刻t 1的测量电压Vm（t 1），电压分压的倒数K，根据下面的数值计算时刻t 1的基板表面的充电电压Vs 比率和与测量电容器18并联设置的电阻器的电阻值Rm，当测量时间为t 1 <？in-line-formula description =“In-line Formulas”end =“lead”？> Vs = K [Vm（t1）+ {1 /（Cm.Rm）0 t1 Vm（t）dt] <？in-line-formula description =“在线公式 “end =”tail“？>其中K =（Cs + Cm）/ Cs或K = Cm / Cs（如果Cm >> Cs）。