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    Defect inspection method and apparatus therefor
    2.
    发明授权
    Defect inspection method and apparatus therefor 失效
    缺陷检查方法及其设备

    公开(公告)号：US06819416B2

    公开(公告)日：2004-11-16

    申请号：US10295909

    申请日：2002-11-18

    申请人： Shunji Maeda ,  Atsushi Yoshida ,  Yukihiro Shibata ,  Minoru Yoshida ,  Sachio Uto ,  Hiroaki Shishido ,  Toshihiko Nakata

    发明人： Shunji Maeda ,  Atsushi Yoshida ,  Yukihiro Shibata ,  Minoru Yoshida ,  Sachio Uto ,  Hiroaki Shishido ,  Toshihiko Nakata

    IPC分类号： G01N2100

    CPC分类号： G01N21/956

    摘要： A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.

    摘要翻译： 一种检查形成在基板上的图案的方法，包括以下步骤：从光源发射紫外激光束，使紫外激光束偏振，扫描物镜的光瞳上的偏振紫外激光束，照射样品 在偏光紫外光束通过物镜之后，偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光，检测由所述物镜形成的样品的图像 用时间延迟积分传感器对光进行分析，并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号，对从时间延迟积分传感器输出的并行信号进行处理，检测样本上的图案缺陷 。

    Method and apparatus for inspecting defects in a patterned specimen
    3.
    发明授权
    Method and apparatus for inspecting defects in a patterned specimen 有权
    用于检查图案样品中的缺陷的方法和装置

    公开(公告)号：US06621571B1

    公开(公告)日：2003-09-16

    申请号：US09698167

    申请日：2000-10-30

    申请人： Shunji Maeda ,  Atsushi Yoshida ,  Yukihiro Shibata ,  Toshihiko Nakata ,  Hiroaki Shishido ,  Minoru Yoshida ,  Sachio Uto

    发明人： Shunji Maeda ,  Atsushi Yoshida ,  Yukihiro Shibata ,  Toshihiko Nakata ,  Hiroaki Shishido ,  Minoru Yoshida ,  Sachio Uto

    IPC分类号： G01N2188

    CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N2021/95615

    摘要： In a method and apparatus for detecting pattern defects, a UV laser is focused on a pupil of an objective lens and scanned; the focused and scanned UV lens illuminates a specimen on which patterns are formed; the specimen illuminated by the UV laser is imaged: and the resulting image of the specimen is compared with a previously stored reference image. The specimen illuminated by UV light is imaged using an anti-blooming time delay integration image sensor or a back-illumination time delay integration image sensor; and the resulting specimen image is compared with a previously stored reference image.

    摘要翻译： 在用于检测图案缺陷的方法和装置中，UV激光聚焦在物镜的光瞳上并进行扫描; 聚焦和扫描的UV透镜照亮形成图案的样本; 对由UV激光照射的样品进行成像：将样品的所得图像与先前存储的参考图像进行比较。 使用抗起霜时间延迟积分图像传感器或反照明时间延迟积分图像传感器对由UV光照射的样本进行成像; 并将所得样品图像与先前存储的参考图像进行比较。

    Method and apparatus for observing and inspecting defects
    6.
    发明申请
    Method and apparatus for observing and inspecting defects 有权
    观察和检查缺陷的方法和装置

    公开(公告)号：US20060238760A1

    公开(公告)日：2006-10-26

    申请号：US11475667

    申请日：2006-06-26

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    IPC分类号： G01J4/00

    CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

    摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

    摘要翻译： 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

    Method and apparatus for observing and inspecting defects
    7.
    发明授权
    Method and apparatus for observing and inspecting defects 失效
    观察和检查缺陷的方法和装置

    公开(公告)号：US06690469B1

    公开(公告)日：2004-02-10

    申请号：US09397334

    申请日：1999-09-14

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    IPC分类号： G01J400

    CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

    摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

    摘要翻译： 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

    DEFECT INSPECTION METHOD AND APPARATUS
    8.
    发明申请
    DEFECT INSPECTION METHOD AND APPARATUS 审中-公开
    缺陷检查方法和装置

    公开(公告)号：US20120128230A1

    公开(公告)日：2012-05-24

    申请号：US13362151

    申请日：2012-01-31

    申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

    发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

    摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.

    摘要翻译： 一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是 通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

    Method and Apparatus for Observing and Inspecting Defects
    9.
    发明申请
    Method and Apparatus for Observing and Inspecting Defects 审中-公开
    观察和检查缺陷的方法和装置

    公开(公告)号：US20090141264A1

    公开(公告)日：2009-06-04

    申请号：US12363856

    申请日：2009-02-02

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    IPC分类号： G01N21/21 ,  G01J4/00

    CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

    摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

    摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

    Method and apparatus for observing and inspecting defects
    10.
    发明授权
    Method and apparatus for observing and inspecting defects 有权
    观察和检查缺陷的方法和装置

    公开(公告)号：US07499162B2

    公开(公告)日：2009-03-03

    申请号：US11475667

    申请日：2006-06-26

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

    IPC分类号： G01J4/00

    CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

    摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

    摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。