Defect inspection method and apparatus therefor
    4.
    发明授权
    Defect inspection method and apparatus therefor 失效
    缺陷检查方法及其设备

    公开(公告)号:US06819416B2

    公开(公告)日:2004-11-16

    申请号:US10295909

    申请日:2002-11-18

    IPC分类号: G01N2100

    CPC分类号: G01N21/956

    摘要: A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.

    摘要翻译: 一种检查形成在基板上的图案的方法,包括以下步骤:从光源发射紫外激光束,使紫外激光束偏振,扫描物镜的光瞳上的偏振紫外激光束,照射样品 在偏光紫外光束通过物镜之后,偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光,检测由所述物镜形成的样品的图像 用时间延迟积分传感器对光进行分析,并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号,对从时间延迟积分传感器输出的并行信号进行处理,检测样本上的图案缺陷 。

    Method and apparatus for inspecting defects in a patterned specimen
    5.
    发明授权
    Method and apparatus for inspecting defects in a patterned specimen 有权
    用于检查图案样品中的缺陷的方法和装置

    公开(公告)号:US06621571B1

    公开(公告)日:2003-09-16

    申请号:US09698167

    申请日:2000-10-30

    IPC分类号: G01N2188

    摘要: In a method and apparatus for detecting pattern defects, a UV laser is focused on a pupil of an objective lens and scanned; the focused and scanned UV lens illuminates a specimen on which patterns are formed; the specimen illuminated by the UV laser is imaged: and the resulting image of the specimen is compared with a previously stored reference image. The specimen illuminated by UV light is imaged using an anti-blooming time delay integration image sensor or a back-illumination time delay integration image sensor; and the resulting specimen image is compared with a previously stored reference image.

    摘要翻译: 在用于检测图案缺陷的方法和装置中,UV激光聚焦在物镜的光瞳上并进行扫描; 聚焦和扫描的UV透镜照亮形成图案的样本; 对由UV激光照射的样品进行成像:将样品的所得图像与先前存储的参考图像进行比较。 使用抗起霜时间延迟积分图像传感器或反照明时间延迟积分图像传感器对由UV光照射的样本进行成像; 并将所得样品图像与先前存储的参考图像进行比较。

    Method and equipment for detecting pattern defect
    10.
    发明授权
    Method and equipment for detecting pattern defect 失效
    检测图案缺陷的方法和设备

    公开(公告)号:US06800859B1

    公开(公告)日:2004-10-05

    申请号:US09473296

    申请日:1999-12-28

    IPC分类号: G01N21956

    摘要: With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.

    摘要翻译: 为了提供用于检测具有高分辨率的微小电路图案的方法和设备,提供了图案缺陷检测设备,包括:紫外激光源; 相干减少装置,用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置,用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置,用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置,用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置,用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。