SEMICONDUCTOR DEVICE
    1.
    发明申请
    SEMICONDUCTOR DEVICE 审中-公开
    半导体器件

    公开(公告)号:US20070205423A1

    公开(公告)日:2007-09-06

    申请号:US11680287

    申请日:2007-02-28

    IPC分类号: H01L27/32

    摘要: It is an object to provide a thin-type full-color display device with the long lifetime, inexpensively, in which desired emission luminance and desired color purity can be obtained at a low voltage. In a light-emitting device capable of full-color display, among a plurality of light-emitting elements emitting different emission colors (for example, colors of red (R), green (G), and blue (B)), at least one of the light-emitting elements of an emission color is a light-emitting element including an organic compound (an organic EL element), and the other light-emitting element of an emission color is a light-emitting element using an inorganic material as a light-emitting layer or a fluorescent layer (an inorganic EL element). It is to be noted that the organic EL element and the inorganic EL element are formed over the same substrate.

    摘要翻译: 本发明的目的是提供一种寿命长,成本低廉的薄型全色显示装置,其中可以在低电压下获得期望的发光亮度和期望的色纯度。 在能够进行全色显示的发光装置中,在发射不同发光颜色(例如,红色(R),绿色(G)和蓝色(B)的颜色)的多个发光元件中至少 发光颜色的发光元件之一是包含有机化合物(有机EL元件)的发光元件,发光颜色的其他发光元件是使用无机材料的发光元件作为 发光层或荧光层(无机EL元件)。 应注意,有机EL元件和无机EL元件形成在相同的基板上。

    Semiconductor device and manufacturing method thereof
    2.
    发明授权
    Semiconductor device and manufacturing method thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US09112067B2

    公开(公告)日:2015-08-18

    申请号:US12766389

    申请日:2010-04-23

    摘要: An object relates to an electrode of a semiconductor device or a method for manufacturing a semiconductor device, which includes a bonding step, and problems are: (1) high resistance of a semiconductor device due to the use of an Al electrode, (2) formation of an alloy by Al and Si, (3) high resistance of a film formed by a sputtering method, and (4) defective bonding in a bonding step which is caused if a bonding surface has a large unevenness. A semiconductor device includes a metal substrate or a substrate provided with a metal film, a copper (Cu) plating film over and bonded to the metal substrate or the metal film by employing a thermocompression bonding method, a barrier film over the Cu plating film, a single crystal silicon film over the barrier film, and an electrode layer over the single crystal silicon film.

    摘要翻译: 本发明涉及一种半导体器件的电极或半导体器件的制造方法,其包括接合工序,其问题是:(1)由于使用Al电极而导致的半导体器件的高电阻,(2) 通过Al和Si形成合金,(3)通过溅射法形成的膜的高电阻,以及(4)如果接合表面具有大的不平坦度时引起的接合步骤中的不良接合。 半导体装置包括金属基板或具有金属膜的金属基板,通过使用热压接法在金属基板或金属膜上结合的铜(Cu)电镀膜,在Cu镀膜上的阻挡膜, 阻挡膜上的单晶硅膜,以及单晶硅膜上的电极层。