公开(公告)号：US08772128B2

公开(公告)日：2014-07-08

申请号：US12246577

申请日：2008-10-07

申请人： Shunpei Yamazaki ,  Junpei Momo ,  Fumito Isaka ,  Eiji Higa ,  Masaki Koyama ,  Akihisa Shimomura

发明人： Shunpei Yamazaki ,  Junpei Momo ,  Fumito Isaka ,  Eiji Higa ,  Masaki Koyama ,  Akihisa Shimomura

IPC分类号： H01L21/762

CPC分类号： H01L27/1266 ,  B23K26/03 ,  B23K26/083 ,  B23K26/12 ,  B23K26/127 ,  B23K26/14 ,  H01L21/268 ,  H01L21/3247 ,  H01L21/76254 ,  H01L27/1214 ,  H01L27/1218 ,  H01L29/66772

摘要： A single crystal semiconductor substrate is irradiated with ions that are generated by exciting a hydrogen gas and are accelerated with an ion doping apparatus, thereby forming a damaged region that contains a large amount of hydrogen. After the single crystal semiconductor substrate and a supporting substrate are bonded, the single crystal semiconductor substrate is heated to be separated along the damaged region. While a single crystal semiconductor layer separated from the single crystal semiconductor substrate is heated, this single crystal semiconductor layer is irradiated with a laser beam. The single crystal semiconductor layer undergoes re-single-crystallization by being melted through laser beam irradiation, thereby recovering its crystallinity and planarizing the surface of the single crystal semiconductor layer.

摘要翻译： 照射通过激发氢气产生的离子并用离子掺杂装置加速的单晶半导体衬底，从而形成含有大量氢的损伤区域。 在单晶半导体衬底和支撑衬底接合之后，单晶半导体衬底被加热以沿着损伤区域分离。 当与单晶半导体衬底分离的单晶半导体层被加热时，用激光束照射该单晶半导体层。 单晶半导体层通过激光束照射熔融而进行再单晶化，从而回收其结晶性并使单晶半导体层的表面平坦化。

公开(公告)号：US20090117692A1

公开(公告)日：2009-05-07

申请号：US12261832

申请日：2008-10-30

申请人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo ,  Shunpei Yamazaki

发明人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo ,  Shunpei Yamazaki

IPC分类号： H01L21/336

CPC分类号： H01L27/1266 ,  H01L21/2007 ,  H01L21/32115 ,  H01L21/76254 ,  H01L27/1214 ,  H01L27/1218 ,  H01L27/1274 ,  H01L29/66772 ,  H01L29/78603

摘要： A single crystal semiconductor substrate bonded over a supporting substrate with a buffer layer interposed therebetween and having a separation layer is heated to separate the single crystal semiconductor substrate using the separation layer or a region near the separation layer as a separation plane, thereby forming a single crystal semiconductor layer over the supporting substrate. The single crystal semiconductor layer is irradiated with a laser beam to re-single-crystallize the single crystal semiconductor layer through melting. An impurity element is selectively added into the single crystal semiconductor layer to form a pair of impurity regions and a channel formation region between the pair of impurity regions. The single crystal semiconductor layer is heated at temperature which is equal to or higher than 400° C. and equal to or lower than a strain point of the supporting substrate and which does not cause melting of the single crystal semiconductor layer.

摘要翻译： 加热粘合在支撑基板上的缓冲层之间并具有分离层的单晶半导体基板，使用分离层或分离层附近的区域作为分离平面分离单晶半导体基板，从而形成单个半导体基板 晶体半导体层在支撑衬底上。 用激光束照射单晶半导体层，通过熔融使单晶半导体层重新单晶化。 在单晶半导体层中选择性地添加杂质元素，以在一对杂质区之间形成一对杂质区和沟道形成区。 单晶半导体层在等于或高于400℃并等于或低于支撑衬底的应变点的温度下被加热，并且不会引起单晶半导体层的熔化。

公开(公告)号：US08481393B2

公开(公告)日：2013-07-09

申请号：US12844224

申请日：2010-07-27

申请人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

发明人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

IPC分类号： H01L21/331 ,  H01L21/8222

CPC分类号： H01L21/76254 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02675

摘要： A semiconductor substrate is irradiated with accelerated hydrogen ions, thereby forming a damaged region including a large amount of hydrogen. After a single crystal semiconductor substrate and a supporting substrate are bonded to each other, the semiconductor substrate is heated, so that the single crystal semiconductor substrate is separated in the damaged region. A single crystal semiconductor layer which is separated from the single crystal semiconductor substrate is irradiated with a laser beam. The single crystal semiconductor layer is melted by laser beam irradiation, whereby the single crystal semiconductor layer is recrystallized to recover its crystallinity and to planarized a surface of the single crystal semiconductor layer. After the laser beam irradiation, the single crystal semiconductor layer is heated at a temperature at which the single crystal semiconductor layer is not melted, so that the lifetime of the single crystal semiconductor layer is improved.

摘要翻译： 用加速的氢离子照射半导体衬底，从而形成包含大量氢的损伤区域。 在单晶半导体衬底和支撑衬底彼此接合之后，加热半导体衬底，使得单晶半导体衬底在损坏区域中分离。 用激光束照射与单晶半导体衬底分离的单晶半导体层。 通过激光束照射使单晶半导体层熔融，由此使单晶半导体层重结晶，回收其结晶性，并使单晶半导体层的表面平坦化。 在激光束照射之后，在单晶半导体层未熔融的温度下加热单晶半导体层，从而提高单晶半导体层的寿命。

公开(公告)号：US07851318B2

公开(公告)日：2010-12-14

申请号：US12285924

申请日：2008-10-16

申请人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

发明人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

IPC分类号： H01L21/331 ,  H01L21/8222

CPC分类号： H01L21/76254 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02675

摘要： A semiconductor substrate is irradiated with accelerated hydrogen ions, thereby forming a damaged region including a large amount of hydrogen. After a single crystal semiconductor substrate and a supporting substrate are bonded to each other, the semiconductor substrate is heated, so that the single crystal semiconductor substrate is separated in the damaged region. A single crystal semiconductor layer which is separated from the single crystal semiconductor substrate is irradiated with a laser beam. The single crystal semiconductor layer is melted by laser beam irradiation, whereby the single crystal semiconductor layer is recrystallized to recover its crystallinity and to planarized a surface of the single crystal semiconductor layer. After the laser beam irradiation, the single crystal semiconductor layer is heated at a temperature at which the single crystal semiconductor layer is not melted, so that the lifetime of the single crystal semiconductor layer is improved.

摘要翻译： 用加速的氢离子照射半导体衬底，从而形成包含大量氢的损伤区域。 之后的单晶半导体衬底和支撑衬底键合到彼此中，半导体衬底被加热，从而使单晶半导体衬底夹持在损伤区域分离。 用激光束照射与单晶半导体衬底分离的单晶半导体层。 所述单晶半导体层是通过激光束的照射，由此，单晶半导体层被重结晶，回收其结晶度和平坦化，以使单晶半导体层的表面熔化。 在激光束照射后，将单晶半导体层在在该单晶半导体层不熔融的温度下加热，从而使单晶半导体层的寿命得以提高。

公开(公告)号：US20090115029A1

公开(公告)日：2009-05-07

申请号：US12285924

申请日：2008-10-16

申请人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

发明人： Masaki Koyama ,  Fumito Isaka ,  Akihisa Shimomura ,  Junpei Momo

IPC分类号： H01L23/58 ,  H01L21/46 ,  H01L21/84

CPC分类号： H01L21/76254 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02675

摘要： A semiconductor substrate is irradiated with accelerated hydrogen ions, thereby forming a damaged region including a large amount of hydrogen. After a single crystal semiconductor substrate and a supporting substrate are bonded to each other, the semiconductor substrate is heated, so that the single crystal semiconductor substrate is separated in the damaged region. A single crystal semiconductor layer which is separated from the single crystal semiconductor substrate is irradiated with a laser beam. The single crystal semiconductor layer is melted by laser beam irradiation, whereby the single crystal semiconductor layer is recrystallized to recover its crystallinity and to planarized a surface of the single crystal semiconductor layer. After the laser beam irradiation, the single crystal semiconductor layer is heated at a temperature at which the single crystal semiconductor layer is not melted, so that the lifetime of the single crystal semiconductor layer is improved

摘要翻译： 用加速的氢离子照射半导体衬底，从而形成包含大量氢的损伤区域。 在单晶半导体衬底和支撑衬底彼此接合之后，加热半导体衬底，使得单晶半导体衬底在损坏区域中分离。 用激光束照射与单晶半导体衬底分离的单晶半导体层。 通过激光束照射使单晶半导体层熔融，由此使单晶半导体层重结晶，回收其结晶性，并使单晶半导体层的表面平坦化。 在激光束照射之后，单晶半导体层在单晶半导体层未熔融的温度下被加热，使得单晶半导体层的寿命得到改善

公开(公告)号：US08343847B2

公开(公告)日：2013-01-01

申请号：US12575555

申请日：2009-10-08

申请人： Masaki Koyama ,  Junpei Momo ,  Eiji Higa ,  Hiroaki Honda ,  Tamae Moriwaka ,  Akihisa Shimomura

发明人： Masaki Koyama ,  Junpei Momo ,  Eiji Higa ,  Hiroaki Honda ,  Tamae Moriwaka ,  Akihisa Shimomura

IPC分类号： H01L21/76

CPC分类号： H01L27/1266 ,  H01L21/02381 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02683 ,  H01L21/02686 ,  H01L21/76254 ,  H01L27/1214 ,  H01L27/1274 ,  H01L29/66772

摘要： To prevent, in the case of irradiating a single crystal semiconductor layer with a laser beam, an impurity element from being taken into the single crystal semiconductor layer at the time of laser irradiation. In a manufacturing method of an SOI substrate, a single crystal semiconductor substrate and a base substrate are prepared; an embrittlement region is formed in a region at a predetermined depth from a surface of the single crystal semiconductor substrate by irradiating the single crystal semiconductor substrate with accelerated ions; the single crystal semiconductor substrate and a base substrate are bonded to each other with an insulating layer interposed therebetween; a single crystal semiconductor layer is formed over the base substrate with the insulating layer interposed therebetween by heating the single crystal semiconductor substrate to cause separation using the embrittlement region as a boundary; an oxide film formed on the single crystal semiconductor layer is removed; and at least a surface of the single crystal semiconductor layer is melted by irradiating the surface of the single crystal semiconductor layer with a laser beam after the removal of the oxide film. The number of times the single crystal semiconductor layer is melted by the irradiation with the laser beam is one.

摘要翻译： 为了防止在用激光束照射单晶半导体层的情况下，在激光照射时将杂质元素摄入单晶半导体层。 在SOI衬底的制造方法中，制备单晶半导体衬底和基底衬底; 通过用加速的离子照射单晶半导体衬底，在单晶半导体衬底的表面的预定深度的区域中形成脆化区域; 单晶半导体衬底和基底衬底之间具有绝缘层而彼此接合; 通过加热单晶半导体衬底以使脆化区域作为边界进行分离，在基底衬底上形成绝缘层，形成单晶半导体层; 去除形成在单晶半导体层上的氧化膜; 并且在除去氧化膜之后，通过用激光束照射单晶半导体层的表面，使单晶半导体层的至少一个表面熔融。 单晶半导体层通过激光束的照射而熔化的次数是1。

公开(公告)号：US20100093153A1

公开(公告)日：2010-04-15

申请号：US12575555

申请日：2009-10-08

申请人： Masaki Koyama ,  Junpei Momo ,  Eiji Higa ,  Hiroaki Honda ,  Tamae Moriwaka ,  Akihisa Shimomura

发明人： Masaki Koyama ,  Junpei Momo ,  Eiji Higa ,  Hiroaki Honda ,  Tamae Moriwaka ,  Akihisa Shimomura

IPC分类号： H01L21/762

CPC分类号： H01L27/1266 ,  H01L21/02381 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02683 ,  H01L21/02686 ,  H01L21/76254 ,  H01L27/1214 ,  H01L27/1274 ,  H01L29/66772

摘要： To prevent, in the case of irradiating a single crystal semiconductor layer with a laser beam, an impurity element from being taken into the single crystal semiconductor layer at the time of laser irradiation. In a manufacturing method of an SOI substrate, a single crystal semiconductor substrate and a base substrate are prepared; an embrittlement region is formed in a region at a predetermined depth from a surface of the single crystal semiconductor substrate by irradiating the single crystal semiconductor substrate with accelerated ions; the single crystal semiconductor substrate and a base substrate are bonded to each other with an insulating layer interposed therebetween; a single crystal semiconductor layer is formed over the base substrate with the insulating layer interposed therebetween by heating the single crystal semiconductor substrate to cause separation using the embrittlement region as a boundary; an oxide film formed on the single crystal semiconductor layer is removed; and at least a surface of the single crystal semiconductor layer is melted by irradiating the surface of the single crystal semiconductor layer with a laser beam after the removal of the oxide film. The number of times the single crystal semiconductor layer is melted by the irradiation with the laser beam is one.

摘要翻译： 为了防止在用激光束照射单晶半导体层的情况下，在激光照射时将杂质元素摄入单晶半导体层。 在SOI衬底的制造方法中，制备单晶半导体衬底和基底衬底; 通过用加速的离子照射单晶半导体衬底，在单晶半导体衬底的表面的预定深度的区域中形成脆化区域; 单晶半导体衬底和基底衬底之间具有绝缘层而彼此接合; 通过加热单晶半导体衬底以使脆化区域作为边界进行分离，在基底衬底上形成绝缘层，形成单晶半导体层; 去除形成在单晶半导体层上的氧化膜; 并且在除去氧化膜之后，通过用激光束照射单晶半导体层的表面，使单晶半导体层的至少一个表面熔融。 单晶半导体层通过激光束的照射而熔化的次数是1。

公开(公告)号：US20090117716A1

公开(公告)日：2009-05-07

申请号：US12259241

申请日：2008-10-27

申请人： Akihisa SHIMOMURA ,  Junpei Momo ,  Fumito Isaka

发明人： Akihisa SHIMOMURA ,  Junpei Momo ,  Fumito Isaka

IPC分类号： H01L21/62

CPC分类号： H01L21/76254

摘要： To provide a high-performance semiconductor device using an SOI substrate in which a substrate having low heat resistance is used as a base substrate, to provide a high-performance semiconductor device without performing mechanical polishing, and to provide an electronic device using the semiconductor device, planarity of a semiconductor layer is improved and defects in the semiconductor layer are reduced by laser beam irradiation. Accordingly, a high-performance semiconductor device can be provided without performing mechanical polishing. In addition, a semiconductor device is manufactured using a region having the most excellent characteristics in a region irradiated with the laser beam. Specifically, instead of the semiconductor layer in a region which is irradiated with the edge portion of the laser beam, the semiconductor layer in a region which is irradiated with portions of the laser beam except the edge portion is used as a semiconductor element. Accordingly, performance of the semiconductor device can be greatly improved. Moreover, an excellent electronic device can be provided.

摘要翻译： 为了提供使用其中使用耐热性低的衬底的SOI衬底的高性能半导体器件用作基底衬底，以提供不执行机械抛光的高性能半导体器件，并且提供使用该半导体器件的电子器件 通过激光束照射改善了半导体层的平坦度，减小了半导体层的缺陷。 因此，可以提供高性能半导体器件而不进行机械抛光。 此外，使用在激光束照射的区域中具有最优异特性的区域来制造半导体器件。 具体地，代替在激光束的边缘部分照射的区域中的半导体层，将被照射到除了边缘部分之外的部分激光束的区域中的半导体层用作半导体元件。 因此，可以大大提高半导体器件的性能。 此外，可以提供优良的电子装置。

公开(公告)号：US08435871B2

公开(公告)日：2013-05-07

申请号：US12259241

申请日：2008-10-27

申请人： Akihisa Shimomura ,  Junpei Momo ,  Fumito Isaka

发明人： Akihisa Shimomura ,  Junpei Momo ,  Fumito Isaka

IPC分类号： H01L21/20 ,  H01L21/36

CPC分类号： H01L21/76254

摘要： To provide a high-performance semiconductor device using an SOI substrate in which a substrate having low heat resistance is used as a base substrate, to provide a high-performance semiconductor device without performing mechanical polishing, and to provide an electronic device using the semiconductor device, planarity of a semiconductor layer is improved and defects in the semiconductor layer are reduced by laser beam irradiation. Accordingly, a high-performance semiconductor device can be provided without performing mechanical polishing. In addition, a semiconductor device is manufactured using a region having the most excellent characteristics in a region irradiated with the laser beam. Specifically, instead of the semiconductor layer in a region which is irradiated with the edge portion of the laser beam, the semiconductor layer in a region which is irradiated with portions of the laser beam except the edge portion is used as a semiconductor element. Accordingly, performance of the semiconductor device can be greatly improved. Moreover, an excellent electronic device can be provided.

摘要翻译： 为了提供使用其中使用耐热性低的衬底的SOI衬底的高性能半导体器件用作基底衬底，以提供不执行机械抛光的高性能半导体器件，并且提供使用该半导体器件的电子器件 通过激光束照射改善了半导体层的平坦度，减小了半导体层的缺陷。 因此，可以提供高性能半导体器件而不进行机械抛光。 此外，使用在激光束照射的区域中具有最优异特性的区域来制造半导体器件。 具体地，代替在激光束的边缘部分照射的区域中的半导体层，将被照射到除边缘部分之外的激光束的部分的区域中的半导体层用作半导体元件。 因此，可以大大提高半导体器件的性能。 此外，可以提供优良的电子装置。

公开(公告)号：US08216914B2

公开(公告)日：2012-07-10

申请号：US12872222

申请日：2010-08-31

申请人： Masaki Koyama ,  Kosei Nei ,  Toru Hasegawa ,  Junpei Momo ,  Eiji Higa

发明人： Masaki Koyama ,  Kosei Nei ,  Toru Hasegawa ,  Junpei Momo ,  Eiji Higa

IPC分类号： H01L21/46 ,  H01L21/30 ,  H01L21/84 ,  H01L21/00

CPC分类号： H01L21/76254 ,  H01L21/02052 ,  H01L21/268

摘要： An object is to provide a method for manufacturing an SOI substrate including a semiconductor film with high planarity and high crystallinity. After a single crystal semiconductor film is formed over an insulating film by a separation step, a natural oxide film existing on a surface of the semiconductor film is removed and the semiconductor film is irradiated with first laser light and second laser light under an inert gas atmosphere or a reduced-pressure atmosphere. The number of shots of the first laser light that is emitted to an arbitrary point in the semiconductor film is greater than or equal to 7, preferably greater than or equal to 10 and less than or equal to 100. The number of shots of the second laser light that is emitted to an arbitrary point in the semiconductor film is greater than 0 and less than or equal to 2.

摘要翻译： 本发明的目的是提供一种制造包括具有高平坦度和高结晶度的半导体膜的SOI衬底的方法。 在通过分离步骤在绝缘膜上形成单晶半导体膜之后，去除存在于半导体膜表面上的自然氧化膜，并在惰性气体气氛下用第一激光和第二激光照射半导体膜 或减压气氛。 发射到半导体膜中的任意点的第一激光的照射次数大于或等于7，优选大于或等于10并且小于或等于100.第二次的照射次数 发射到半导体膜中的任意点的激光大于0且小于或等于2。