公开(公告)号：US5430304A

公开(公告)日：1995-07-04

申请号：US327810

申请日：1994-10-24

申请人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Yoshihisa Oae ,  Tomohiko Abe ,  Shunsuke Fueki

发明人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Yoshihisa Oae ,  Tomohiko Abe ,  Shunsuke Fueki

IPC分类号： H01L21/027 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/31776

摘要： A charged particle beam-exposure method in which a subject is exposed to a pattern via a charged particle beam having an on/off exposure characteristic. A blanking aperture array has n open/close devices which individually/correspond to respective scan positions of the charged particle beam and operate to control the on/off exposure characteristic of the charged particle beam. The method includes: (1) selectively designating bit positions of successive n-bit width data blocks of the pattern, each n-bit width data block stored within a row of the pattern; (2) successively reading each n-bit width data block; (3) forming successive rows of unit pattern data from the successively designated and read n-bit width data block, each successive row corresponding to a successively designated and read n-bit width data block; (4) storing the successive rows of unit pattern data to form unit pattern data in bit matrix form having m columns and n rows; and (5) sequentially supplying the successive rows of unit pattern data to the blanking aperture array to control the on/off exposure characteristic of the charged particle beam.

摘要翻译： 一种带电粒子束曝光方法，其中被摄体经由具有开/关曝光特性的带电粒子束曝光于图案。 消隐孔径阵列具有单独/对应于带电粒子束的相应扫描位置的n个打开/关闭装置，并且用于控制带电粒子束的开/关曝光特性。 该方法包括：（1）有选择地指定图案的连续n位宽度数据块的位位置，每个n位宽数据块存储在该行图案中; （2）连续读取每个n位宽数据块; （3）从连续指定和读取的n位宽度数据块形成连续的单位图形数据行，每个连续行对应于连续指定和读取的n位宽度数据块; （4）存储连续的单位图形数据行以形成具有m列和n行的位矩阵形式的单位图形数据; 并且（5）将连续行的单位图形数据顺序地提供给消隐孔径阵列，以控制带电粒子束的接通/断开曝光特性。

公开(公告)号：US5260579A

公开(公告)日：1993-11-09

申请号：US851400

申请日：1992-03-13

申请人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

发明人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

IPC分类号： H01J37/09 ,  H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0435

摘要： A charged particle beam exposure system is directed to an exposure process of an electron beam for sequentially scanning an electron beam employing a blanking aperture array including a plurality of blanking apertures. The system facilitates re-focusing for compensation of focus error due to Coulumb effect and makes wiring the blanking aperture array easier. The system further allows exposure without an irradiation gap. The blanking aperture array 6 is formed with a plurality of said blanking apertures 62 arranged in a two-dimensional configuration. A control system 24 controls the blanking aperture array 62 to set the blanking aperture to the ON state where the charged particle beams pass through the blanking aperture and reach the object 19 to be exposed or the OFF state where the charged particle beams cannot reach the object 19 to be exposed. The other control system of the control means performs a control so that a plurality of said charged particle beams that have passed through different blanking apertures of said blanking aperture array overlaps and is irradiated a plurality of times onto the specified position or the peripheral position in the vicinity of the specified position of the object to be exposed to the charged particle beams.

公开(公告)号：US5448075A

公开(公告)日：1995-09-05

申请号：US241409

申请日：1994-05-11

申请人： Shunsuke Fueki ,  Hiroshi Yasuda

发明人： Shunsuke Fueki ,  Hiroshi Yasuda

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01J37/302 ,  H01L21/027

CPC分类号： H01J37/3023 ,  H01J2237/30416 ,  H01J2237/31762

摘要： An electron beam exposure system includes a pattern memory for storing bitmap data of a pattern to be exposed, wherein the pattern memory includes a number of latch elements arranged in rows and columns such that the writing of the bitmap data is achieved line by line and such that the reading of the bitmap data is achieved column by column.

摘要翻译： 电子束曝光系统包括用于存储要曝光的图案的位图数据的图案存储器，其中，图案存储器包括排列成行和列的多个锁存元件，使得位图数据的写入被逐行实现 逐位实现位图数据的读取。

公开(公告)号：US5175435A

公开(公告)日：1992-12-29

申请号：US782251

申请日：1991-10-25

申请人： Kiichi Sakamoto ,  Shunsuke Fueki ,  Hiroshi Yasuda

发明人： Kiichi Sakamoto ,  Shunsuke Fueki ,  Hiroshi Yasuda

IPC分类号： H01L21/027 ,  H01J37/302

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/30422 ,  H01J2237/31776

摘要： An electron beam exposure system comprises a pattern data generator for producing first pattern data indicative of a desired pattern of electron beam to be written on a wafer and second pattern data indicative of the number of repetitions of the pattern specified by the first pattern data, as a time sequential mixture of the first and second pattern data. The time sequential mixture of the data is sorted in a data sorting unit into a parallel data of the first pattern data and the second pattern data. Then, a discrimination is made whether the data is the first pattern data or the second pattern data, and when the data is the second pattern data, the data that follows immediately behind the second pattern data is transferred to an output path simultaneously with the second pattern data, which is transferred to another output path. Thereby, the first and second pattern data form a parallel data. The parallel data thus formed is next compressed by deleting the data, that follows immediately behind the data which contains the second pattern data, from both output paths.

摘要翻译： 电子束曝光系统包括图形数据发生器，用于产生指示要写入晶片的电子束的期望图案的第一图案数据和指示由第一图案数据指定的图案的重复次数的第二图案数据， 第一和第二图案数据的时间顺序混合。 将数据的时间序列混合在数据排序单元中排列成第一图案数据和第二图案数据的并行数据。 然后，判断数据是第一图案数据还是第二图案数据，并且当数据是第二图案数据时，紧接在第二图案数据之后的数据与第二图案数据同时被传送到输出路径 模式数据，传输到另一个输出路径。 由此，第一和第二图案数据形成并行数据。 这样形成的并行数据接下来通过从两个输出路径中删除紧跟在包含第二模式数据的数据之后的数据来进行压缩。

公开(公告)号：US5262341A

公开(公告)日：1993-11-16

申请号：US991718

申请日：1992-12-16

申请人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

发明人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

IPC分类号： H01J37/04 ,  H01J37/302 ,  H01L21/268

CPC分类号： H01J37/045 ,  H01J37/3026

摘要： A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers provided on the substrate for applying voltages dependent on pattern data to m pairs of the blanking electrodes of the apertures in the ith column, where i=1, 2, . . . , n. The pattern data is related to a pattern which is to be exposed using the blanking aperture array.

摘要翻译： 用于带电粒子束曝光的消隐孔径阵列具有衬底，至少m行×n列的孔在衬底中二维布置，其中每个孔具有一对消隐电极，m和n是整数 大于1和n个m位移位寄存器，其设置在基板上，用于将第n列中的孔的m对对的图案数据施加电压，其中i = 1,2。 。 。 ，n。 图案数据与使用消隐孔径阵列曝光的图案有关。

公开(公告)号：US5144142A

公开(公告)日：1992-09-01

申请号：US525062

申请日：1990-05-18

申请人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

发明人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

IPC分类号： H01J37/04 ,  H01J37/302

CPC分类号： H01J37/045 ,  H01J37/3026

摘要： A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers provided on the substrate for applying voltages dependent on pattern data to m pairs of the blanking electrodes of the apertures in the ith column, where i=1, 2, . . . , n. The pattern data is relates to a pattern which is to be exposed using the blanking aperture array.

公开(公告)号：US5130547A

公开(公告)日：1992-07-14

申请号：US616870

申请日：1990-11-21

申请人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Shunsuke Fueki ,  Akio Yamada ,  Hiroshi Yasuda

发明人： Kiichi Sakamoto ,  Yoshihisa Oae ,  Shunsuke Fueki ,  Akio Yamada ,  Hiroshi Yasuda

IPC分类号： G05B19/408 ,  H01J37/302

CPC分类号： H01J37/3026 ,  G05B19/408 ,  G05B2219/35567

摘要： A charged-particle beam exposure method which has a stencil mask formed with a several mask patterns, deflects a beam of charged particles to a mask pattern selected from among the several mask patterns and shapes the beam, and performs wafer exposure by deflecting the shaped beam and illuminating the same onto a wafer. The improvement comprises the steps of (a) holding mask information data, which are information for deflecting the charged particle beam to the selected mask pattern and in which an index is provided every mask pattern of the stencil mask, in a mask memory, (b) holding pattern exposure data, which are information for designating a mask pattern by the use of the index of each mask pattern held in the mask memory and for deflecting the charged particle beam shaped with the designated mask pattern to a predetermined region on the wafer, in a data memory; and (c) deflecting the charged particle beam of the stencil mask and shaping the beam by the use of the mask information data outputted from the mask memory in response to the index designated in the pattern exposure data.

公开(公告)号：US6009483A

公开(公告)日：1999-12-28

申请号：US995154

申请日：1997-12-19

申请人： Shunsuke Fueki

发明人： Shunsuke Fueki

IPC分类号： G06F7/00 ,  G06F9/318 ,  G06F13/10 ,  G06F9/44 ,  G06F13/14

CPC分类号： G06F9/3879

摘要： A device capable of externally setting and modifying internal functions and a data processing apparatus using such a device are provided, outside the data processing apparatus, with a function data setting unit for reading and writing data for use in setting, modifying, and storing the internal functions; and an execution state stack unit for storing data indicating the state of the internal functions being executed. The data processing apparatus includes an internal resource management unit for setting and modifying the internal functions, and saving and restoring, through the execution state stack unit, the data indicating the state of the functions being executed. This system allows the processes to be freely performed by the device and the data processing apparatus at a high speed.

摘要翻译： 在数据处理装置外部，设置有能够外部设定和修改内部功能的装置以及使用这种装置的数据处理装置，该功能数据设定单元用于读取和写入用于设置，修改和存储内部的数据 功能; 以及执行状态堆栈单元，用于存储指示正在执行的内部功能的状态的数据。 数据处理装置包括用于设置和修改内部功能的内部资源管理单元，并且通过执行状态堆栈单元保存和恢复指示正在执行的功能的状态的数据。 该系统允许设备和数据处理设备以高速度自由地执行处理。

公开(公告)号：US5500930A

公开(公告)日：1996-03-19

申请号：US194802

申请日：1994-02-14

申请人： Shunsuke Fueki

发明人： Shunsuke Fueki

IPC分类号： G06F9/30 ,  G06T11/20 ,  G06F3/00 ,  G06F9/312 ,  G06F19/00

CPC分类号： G06T11/203

摘要： A decoder to decode input data which includes an instruction code. The decoder includes a high-order address generator which uses the instruction code in the generation of the high-order address, and a storage circuit which stores control codes that corresponded to the instruction code. Indication data is stored in the beginning or end of the storage area to indicate the number of control codes present in the storage area. The address generated by the high-order address generator locates the desired control codes. A low-order address generator uses the indication data to count the number of control codes and derive a low-order address offset from the high order address. An internal address generator generates an internal address from a combination of the high-order and low-order addresses. The internal address is supplied to the storage circuit serially read out the control codes as the internal address is continuously incremented. The decoded input data is used in the generation of a pattern and to control an electron beam which exposes a wafer.

摘要翻译： 解码器，用于解码包括指令码的输入数据。 解码器包括使用生成高阶地址的指令代码的高阶地址发生器和存储对应于指令代码的控制代码的存储电路。 指示数据存储在存储区域的开始或结尾，以指示存储区域中存在的控制代码的数量。 由高阶地址生成器生成的地址定位所需的控制代码。 低位地址发生器使用指示数据来计数控制码的数量，并导出与高位地址的低阶地址偏移。 内部地址生成器从高阶和低位地址的组合生成内部地址。 随着内部地址不断递增，内部地址被提供给存储电路串行读取控制代码。 解码的输入数据用于产生图案并且控制暴露晶片的电子束。

公开(公告)号：US06970690B2

公开(公告)日：2005-11-29

申请号：US10133322

申请日：2002-04-29

申请人： Shinji Yajima ,  Shunsuke Fueki ,  Masao Nakajima

发明人： Shinji Yajima ,  Shunsuke Fueki ,  Masao Nakajima

IPC分类号： G06F1/26 ,  G06K19/07 ,  H04B1/16

CPC分类号： H04B1/1607 ,  G06F1/26 ,  G06K19/0701 ,  G06K19/0723

摘要： A data processing apparatus and card-sized data processing device that consume less power and operate more reliably. An antenna captures a radio wave sent from an external reader/writer device, and a receiver converts it into an electrical signal. From this electrical signal, a first power supply circuit produces a first supply voltage for use in analog circuits. A second power supply circuit produces a second supply voltage that is different from the first supply voltage, for use in memory circuits. A third power supply circuit produces a third supply voltage that is different from the other voltages, for use in digital circuits. The memory and digital circuits thus operate with different supply voltages optimized for their individual requirements. Total power consumption of the device is reduced by lowering the voltage for the digital circuits, including MPU, while giving a higher voltage to the memory circuits.

摘要翻译： 一种数据处理装置和卡尺寸的数据处理装置，其消耗更少的功率并且更可靠地操作。 天线捕获从外部读/写器设备发送的无线电波，并且接收器将其转换为电信号。 从该电信号，第一电源电路产生用于模拟电路的第一电源电压。 第二电源电路产生与第一电源电压不同的第二电源电压，用于存储器电路。 第三电源电路产生与其它电压不同的第三电源电压，用于数字电路。 因此，存储器和数字电路以针对其个人需求而优化的不同电源电压运行。 通过降低包括MPU在内的数字电路的电压来降低器件的总功耗，同时向存储器电路提供更高的电压。