Abstract:
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
Abstract:
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
Abstract:
A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.
Abstract:
An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.
Abstract:
A MEMS-based swept laser source is formed from two coupled cavities. The first cavity includes a first mirror and a fully reflective moveable minor and operates to tune the output wavelength of the laser. The second cavity is optically coupled to the first cavity and includes an active gain medium, the first mirror and a second mirror. The second cavity further has a length substantially greater than the first cavity such that there are multiple longitudinal modes of the second cavity within a transmission bandwidth of the first cavity output.
Abstract:
An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.
Abstract:
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
Abstract:
A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.