公开(公告)号：US09368383B2

公开(公告)日：2016-06-14

申请号：US14447409

申请日：2014-07-30

申请人： SOKUDO Co., Ltd.

发明人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67745 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67754 ,  H01L21/6776

摘要： A treating section has substrate treatment lines arranged one over the other for treating substrates while transporting the substrates substantially horizontally. An IF section transports the substrates fed from each substrate treatment line to an exposing machine provided separately from this apparatus. The substrates are transported to the exposing machine in the order in which the substrates are loaded into the treating section. The throughput of this apparatus can be improved greatly, without increasing the footprint, since the substrate treatment lines are arranged one over the other. Each substrate can be controlled easily since the order of the substrates transported to the exposing machine is in agreement with the order of the substrates loaded into the treating section.

摘要翻译： 一个处理部分具有一个相互排列的衬底处理线，用于处理衬底，同时基本上水平地传送衬底。 IF部分将从每个基板处理线馈送的基板输送到与该装置分开设置的曝光机。 将基板按照将基板装入处理部的顺序输送到曝光机。 由于基板处理线彼此排列，因此能够大大提高该装置的生产量，而不增加占用面积。 可以容易地控制每个基板，因为输送到曝光机的基板的顺序与装载到处理部中的基板的顺序一致。

公开(公告)号：US20140000514A1

公开(公告)日：2014-01-02

申请号：US14011993

申请日：2013-08-28

申请人： Sokudo Co., Ltd.

发明人： Hiroyuki Ogura ,  Kenya Morinishi ,  Tsuyoshi Mitsuhashi ,  Yasuo Kawamatsu ,  Yoshiteru Fukutomi ,  Hiromichi Nagashima

IPC分类号： B05C13/00

CPC分类号： B05C13/00 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225

摘要： The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.

摘要翻译： 本发明提供涂覆单元，热处理单元和用于将基底输送到这些处理单元中的每一个的第一主输送机构。 基板通过接收器从第一主输送机构传送到第二主输送机构。 当基板不能放置在接收器上时，将该基板放置在缓冲器上。 因此，第一主输送机构可以继续输送其它基板。 处理单元中的其它基材在处理单元之间没有延迟地输送，以接收包括涂覆处理和热处理的一系列处理。 这防止了在基板上形成膜的处理质量的降低。

公开(公告)号：US08708587B2

公开(公告)日：2014-04-29

申请号：US14011993

申请日：2013-08-28

申请人： Sokudo, Co., Ltd.

发明人： Hiroyuki Ogura ,  Kenya Morinishi ,  Tsuyoshi Mitsuhashi ,  Yasuo Kawamatsu ,  Yoshiteru Fukutomi ,  Hiromichi Nagashima

IPC分类号： G03D5/00

CPC分类号： B05C13/00 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225

摘要： The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.

摘要翻译： 本发明提供涂覆单元，热处理单元和用于将基底输送到这些处理单元中的每一个的第一主输送机构。 基板通过接收器从第一主输送机构传送到第二主输送机构。 当基板不能放置在接收器上时，将该基板放置在缓冲器上。 因此，第一主输送机构可以继续输送其它基板。 处理单元中的其它基材在处理单元之间没有延迟地输送，以接收包括涂覆处理和热处理的一系列处理。 这防止了在基板上形成膜的处理质量的降低。