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公开(公告)号：US20070218577A1
公开(公告)日：2007-09-20
申请号：US11643653
申请日：2006-12-22
IPC分类号： H01L21/00
CPC分类号： G02F1/13458 , G02F1/136286 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/66742
摘要： A liquid crystal display (LCD) panel is fabricated with a reduced number of mask processes and includes a thin film transistor (TFT) array substrate and a color filter array substrate. The TFT array substrate includes gate and data lines insulatively crossing each other to define a pixel area, a TFT provided at the crossing of the gate and data lines, a passivation film protecting the TFT, a pixel electrode partially overlapped by the TFT, a gate pad connected to the gate line, and a data pad connected to the data line. The gate line, the gate and data pads, and the pixel electrode include a transparent conductive material. A gate metal material is on the transparent conductive material where the TFT partially overlaps the pixel electrode. The passivation film over the gate and data pads is removed to expose the transparent conductive material included within the gate and data pads.
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2.发明申请Stripper solution and method for manufacturing liquid crystal display using the same 有权剥离剂溶液及使用其制造液晶显示器的方法公开(公告)号：US20050245010A1
公开(公告)日：2005-11-03
申请号：US11117306
申请日：2005-04-29
CPC分类号： H01L27/1288 , H01L27/1214 , Y10S438/951
摘要： A method for manufacturing a liquid crystal display includes simultaneously forming a gate electrode and a gate bus line on a transparent dielectric substrate, simultaneously forming a channel layer, an ohmic contact layer, and source/drain electrodes by forming a gate insulation film, an amorphous silicon film, a doped amorphous silicon film, and a metal film on the transparent dielectric substrate on which the gate electrode and the gate bus line are formed and etching the metal film, the amorphous silicon film, and the doped amorphous silicon film, and forming a pixel electrode by forming a protective film and a transparent metal film on the transparent dielectric substrate upon which the source/drain electrodes are formed and finely etching the transparent metal film through a lift-off process using a stripper solution.
摘要翻译： 液晶显示器的制造方法包括：在透明电介质基板上同时形成栅极电极和栅极总线，同时形成沟道层，欧姆接触层，源极/漏极，形成栅极绝缘膜， 硅膜，掺杂非晶硅膜和金属膜，在其上形成栅极电极和栅极总线的透明介质基板上蚀刻金属膜，非晶硅膜和掺杂非晶硅膜，并形成 通过在形成源/漏电极的透明电介质基板上形成保护膜和透明金属膜，并通过使用剥离剂溶液的剥离工艺对透明金属膜进行微细蚀刻来形成像素电极。
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公开(公告)号：US20050077524A1
公开(公告)日：2005-04-14
申请号：US10963925
申请日：2004-10-14
IPC分类号： G02F1/136 , G02F1/1362 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04
CPC分类号： G02F1/13458 , G02F1/136286 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/66742
摘要： A liquid crystal display (LCD) panel is fabricated with a reduced number of mask processes and includes a thin film transistor (TFT) array substrate and a color filter array substrate. The TFT array substrate includes gate and data lines insulatively crossing each other to define a pixel area, a TFT provided at the crossing of the gate and data lines, a passivation film protecting the TFT, a pixel electrode partially overlapped by the TFT, a gate pad connected to the gate line, and a data pad connected to the data line. The gate line, the gate and data pads, and the pixel electrode include a transparent conductive material. A gate metal material is on the transparent conductive material where the TFT partially overlaps the pixel electrode. The passivation film over the gate and data pads is removed to expose the transparent conductive material included within the gate and data pads.
摘要翻译： 液晶显示器（LCD）面板以较少数量的掩模工艺制造，并且包括薄膜晶体管（TFT）阵列基板和滤色器阵列基板。 TFT阵列基板包括彼此绝缘交叉以限定像素区域的栅极和数据线，设置在栅极和数据线的交叉处的TFT，保护TFT的钝化膜，与TFT部分重叠的像素电极，栅极 焊盘连接到栅极线，以及连接到数据线的数据焊盘。 栅极线，栅极和数据焊盘以及像素电极包括透明导电材料。 栅极金属材料在透明导电材料上，其中TFT部分地与像素电极重叠。 去除栅极和数据焊盘上的钝化膜以暴露包括在栅极和数据焊盘内的透明导电材料。
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公开(公告)号：US20060290867A1
公开(公告)日：2006-12-28
申请号：US11471653
申请日：2006-06-21
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F1/13439 , G02F1/136213 , G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad is formed on a substrate. An insulating film including a plurality of contact holes and a semiconductor pattern is formed on the first mask pattern group. And a second conductive pattern group including a data line, a source electrode and a drain electrode is formed on an insulating film provided with the semiconductor pattern, and exposes an active layer of the semiconductor pattern
摘要翻译： 公开了一种用于简化处理的液晶显示装置及其制造方法。 在制造液晶显示装置的方法中，在基板上形成包括栅极线和栅电极的第一导电图案组，公共线和公共电极，像素电极和焊盘。 在第一掩模图案组上形成包括多个接触孔和半导体图案的绝缘膜。 并且在设置有半导体图案的绝缘膜上形成包括数据线，源极和漏电极的第二导电图案组，并且暴露半导体图案的有源层
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5.发明申请Apparatus and method for rubbing alignment layer of liquid crystal display device 有权用于摩擦液晶显示装置取向层的装置和方法公开(公告)号：US20060274245A1
公开(公告)日：2006-12-07
申请号：US11410852
申请日：2006-04-26
IPC分类号： G02F1/1337
CPC分类号： G02F1/133784 , G02F1/1303
摘要： An apparatus and method for rubbing an alignment layer of an LCD device is disclosed. The alignment layer is rubbed over an entire surface of a substrate at uniform pressure and dust or particle is not adsorbed into the alignment layer during rubbing process. The apparatus for rubbing an alignment layer of an LCD device includes a rubbing means to rub the alignment layer while the rubbing means is rotated along one direction to contact a surface of the alignment layer formed on a substrate, and a liquid jet to jet liquid when the alignment layer is rubbed by the rubbing means.
摘要翻译： 公开了一种用于摩擦LCD装置的取向层的装置和方法。 取向层在均匀的压力下在基片的整个表面上摩擦，并且在摩擦过程中灰尘或颗粒不被吸附到取向层中。 用于摩擦LCD装置的取向层的装置包括摩擦装置，当摩擦装置沿着一个方向旋转以摩擦取向层时，接触基板上形成的取向层的表面，并且液体喷射到喷射液体时， 对准层被摩擦装置摩擦。
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公开(公告)号：US20060126003A1
公开(公告)日：2006-06-15
申请号：US11289449
申请日：2005-11-30
IPC分类号： G02F1/13
CPC分类号： G02F1/136259
摘要： The present invention relates to an apparatus and method for repairing a liquid crystal display panel, which is capable of improving a yield thereof by darkening a bright point to minimize a defect ratio thereof. An apparatus for repairing a liquid crystal display panel according to the present invention includes: a liquid crystal display panel including a repair film formed on any one of a first substrate and a second substrate, which are facing to each other with a liquid crystal layer therebetween; and a laser irradiating device to irradiate a laser to the repair film to darken a specific area of the repair film, which is corresponded to an area where a bright point appears in the liquid crystal display panel.
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公开(公告)号：US20070002249A1
公开(公告)日：2007-01-04
申请号：US11471648
申请日：2006-06-21
申请人： Soon Yoo , Oh Kwon , Youn Chang , Heung Cho , Seung Nam
发明人： Soon Yoo , Oh Kwon , Youn Chang , Heung Cho , Seung Nam
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F1/136213 , G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad in a multiple conductive layer having a stepwise shape including a transparent conductive layer is formed on a substrate by a first mask process. An insulating film and a semiconductor layer including a plurality of contact holes are formed on the first mask pattern group by a second mask process. A second pattern group including a data line, a source electrode and a drain electrode is formed on the semiconductor layer and the semiconductor layer is patterned, and an active layer is exposed between the source electrode and the drain electrode by a third mask process.
摘要翻译： 公开了一种用于简化处理的液晶显示装置及其制造方法。 在制造液晶显示装置的方法中，包括栅极线和栅电极，公共线和公共电极的第一导电图案组，具有逐层形状的多导电层中的像素电极和焊盘，包括 通过第一掩模工艺在衬底上形成透明导电层。 通过第二掩模处理在第一掩模图案组上形成包括多个接触孔的绝缘膜和半导体层。 在半导体层上形成包括数据线，源电极和漏电极的第二图案组，对半导体层进行构图，通过第三掩模工艺在源电极和漏电极之间露出有源层。
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8.发明申请Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof 有权形成精细图案的方法，具有精细图案的液晶显示装置及其制造方法公开(公告)号：US20070001979A1
公开(公告)日：2007-01-04
申请号：US11473590
申请日：2006-06-23
IPC分类号： G09G3/36
CPC分类号： G02F1/13439 , G02F1/134363 , G02F1/136286 , G02F2201/123
摘要： This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.
摘要翻译： 本发明涉及一种形成精细图案的方法，该方法适于形成无限制的曝光分辨率的精细图案，液晶显示装置和制造方法。 形成精细图案的方法包括在透明导电层上形成光刻胶图案。 具有对应于曝光装置的曝光分辨率的最小线宽的光刻胶图案。 该方法还包括通过使用光致抗蚀剂图案作为掩模的蚀刻工艺来过度蚀刻透明导电层，以形成具有比曝光装置的曝光分辨率窄的线宽的电极图案。
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公开(公告)号：US20070001577A1
公开(公告)日：2007-01-04
申请号：US11475110
申请日：2006-06-27
IPC分类号： H01J29/07
CPC分类号： H05B33/10
摘要： Disclosed is a shadow mask having a fine slit that can improve precision and resolution of a pattern by reducing side etching during an etching process of a mask substrate, and a manufacturing method thereof. The shadow mask includes a mask substrate, a slit region formed by penetrating through the mask substrate, the slit region having a plurality of undercut portions at respective sides thereof, each undercut portion having a unit thickness, and a shadow region provided in the mask substrate, the shadow region corresponding to a region other than the slit region.
摘要翻译： 公开了一种荫罩，其具有能够通过在掩模基板的蚀刻处理期间减少侧蚀刻而提高图案的精度和分辨率的细小狭缝及其制造方法。 荫罩包括掩模基板，穿过掩模基板形成的狭缝区域，狭缝区域各自具有多个底切部分，每个底切部分具有单位厚度，以及设置在掩模基板中的阴影区域 ，对应于除狭缝区域以外的区域的阴影区域。
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10.发明申请Thin film transistor substrate using a horizontal electric field and fabricating method thereof 有权使用水平电场的薄膜晶体管基板及其制造方法公开(公告)号：US20050092990A1
公开(公告)日：2005-05-05
申请号：US10978522
申请日：2004-11-02
IPC分类号： H01L29/786 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04
CPC分类号： G02F1/13458 , G02F1/134363 , H01L27/124 , H01L27/1288 , H01L29/66765
摘要： A thin film transistor substrate structure for using a horizontal electric field includes a substrate; a gate line and a first common line formed on the substrate parallel to each other from a first conductive layer; a gate insulating film formed on the substrate, the gate line, and the first common line; a data line formed from a second conductive layer on the gate insulating film crossing the gate line and the common line with the gate insulating film therebetween to define a pixel area; a thin film transistor connected to the gate line and the data line; a protective film covering the data line and the thin film transistor; a common electrode formed from a third conductive layer connected to the common line through a hole passing through the protective film and the gate insulating film; and a pixel electrode formed from the second conductive layer connected to the thin film transistor to define a horizontal electric field between the pixel electrode and the common electrode.
摘要翻译： 用于使用水平电场的薄膜晶体管衬底结构包括：衬底; 形成在所述基板上的栅极线和第一公共线从第一导电层彼此平行; 形成在基板上的栅极绝缘膜，栅极线和第一公共线; 由栅极绝缘膜上的与栅极线交叉的第二导电层和与其间的栅极绝缘膜的公共线形成的数据线，以限定像素区域; 连接到栅极线和数据线的薄膜晶体管; 覆盖数据线和薄膜晶体管的保护膜; 由通过穿过保护膜的孔和栅极绝缘膜连接到公共线的第三导电层形成的公共电极; 以及由连接到薄膜晶体管的第二导电层形成的像素电极，以在像素电极和公共电极之间限定水平电场。
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