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1.发明授权公开(公告)号：US08071161B2
公开(公告)日：2011-12-06
申请号：US12179817
申请日：2008-07-25
IPC分类号： B05D5/12
CPC分类号： H01M4/8867 , C23C16/045 , C23C16/18 , C23C16/4486 , H01M4/8807 , H01M4/92 , H01M8/0234 , H01M2008/1095 , Y02P70/56
摘要： A method for fabricating an electrode for electrochemical reactor is provided, wherein the electrode includes a porous carbon diffusion layer and a catalyst layer. The method includes a step of depositing the catalyst layer on the diffusion layer by a DLI-MOCVD process.
摘要翻译： 提供一种制造电化学反应器用电极的方法，其中电极包括多孔碳扩散层和催化剂层。 该方法包括通过DLI-MOCVD方法将催化剂层沉积在扩散层上的步骤。
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2.发明授权Cathode for electrochemical reactor, electrochemical reactor incorporating such cathodes and method for making said cathode 有权用于电化学反应器的阴极，并入这种阴极的电化学反应器和制造所述阴极的方法公开(公告)号：US08318375B2
公开(公告)日：2012-11-27
申请号：US12179793
申请日：2008-07-25
CPC分类号： C23C16/18 , H01M4/8605 , H01M4/8652 , H01M4/8867 , H01M4/9016 , H01M4/92 , H01M8/0234 , H01M2008/1095 , Y02P70/56
摘要： A cathode for an electrochemical reactor including a diffusion layer and a catalyst layer. The cathode has bimetallic or multimetallic nanoparticles, dispersed in direct contact with the diffusion layer, at least one of the metals being chromium (Cr) wholly or partly in oxidized form. The cathode is fabricated by depositing the bimetallic or multimetallic nanoparticles on the diffusion layer by DLI-MOCVD in the presence of O2.
摘要翻译： 一种用于包括扩散层和催化剂层的电化学反应器的阴极。 阴极具有与扩散层直接接触分散的双金属或多金属纳米颗粒，至少一种金属是全部或部分氧化形式的铬（Cr）。 通过在O2存在下通过DLI-MOCVD在扩散层上沉积双金属或多金属纳米颗粒来制造阴极。
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3.发明授权Process for preparing metal or metal alloy nanoparticles dispersed on a substrate by chemical vapour deposition 有权通过化学气相沉积分散在基体上的金属或金属合金纳米颗粒的制备方法公开(公告)号：US07648942B2
公开(公告)日：2010-01-19
申请号：US11793888
申请日：2005-12-23
申请人： Stéphanie Thollon , Fabien Luc , Joël Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
发明人： Stéphanie Thollon , Fabien Luc , Joël Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
CPC分类号： C23C16/18 , C23C16/40 , Y10T428/256
摘要： Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas.Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy.Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
摘要翻译： 沉积金属或所述金属的合金的纳米颗粒的工艺，所述金属选自由化学气相沉积（CVD）分散在基材上的来自一种或多种前体的元素周期表第VIIIB和IB栏的金属， 其中在包含大于50体积％的活性氧化气体的气体的存在下进行沉积。 包含至少一个表面的基底，其上分散有由金属或金属合金制成的纳米颗粒，例如由银或银合金制成。 使用底物催化化学反应，例如NOx消除反应。
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4.发明授权Device for the synthesis of nanoparticles by fluidized-bed chemical vapor deposition 有权用于通过流化床化学气相沉积合成纳米颗粒的装置公开(公告)号：US09039836B2
公开(公告)日：2015-05-26
申请号：US13123171
申请日：2009-09-10
IPC分类号： C23C16/00 , C23C16/442 , C23C16/44 , B01J23/42 , B01J35/00 , B01J37/02 , C01B3/00 , C23C16/455
CPC分类号： C23C16/442 , B01J23/42 , B01J35/006 , B01J37/0221 , B01J37/0238 , B22F2998/00 , C01B3/0026 , C23C16/4417 , C23C16/45502 , C23C16/45591 , Y02E60/327 , Y10S118/05 , B22F9/24 , B22F1/0018
摘要： A device for vapor deposition of chemical species on support grains of spherical or similar shape disposed in a fluidized bed. The device includes a first chamber including a fluidized bed in which a funnel-shaped fluidizer element is housed to receive support grains of spherical or similar shape; a second chamber in fluid flow connection with the first chamber to deliver precursors in a vapor phase of chemical species to be deposited on the support grains and to convey a fluidizing gas towards the first chamber; and a flute at an inlet to the fluidizer element to control distribution of the vapor phase precursors and the fluidizing gas within the fluidizer element. The distributor flute includes one or more outer grooves, each groove including a first portion oriented along the longitudinal axis of the flute and a second portion winding helically around the axis to generate a fluidizing gas vortex within the first chamber.
摘要翻译： 用于将化学物质蒸发沉积在设置在流化床中的球形或类似形状的载体颗粒上的装置。 该装置包括第一室，其包括流化床，容纳漏斗状流化器元件以容纳球形或类似形状的支撑颗粒; 与所述第一室流体流动连接的第二室，以将待沉积在所述载体颗粒上的化学物质的气相中输送前体并将流化气体输送到所述第一室; 以及在流化器元件的入口处的凹槽，以控制流化器元件内的气相前体和流化气体的分布。 分配器凹槽包括一个或多个外部凹槽，每个凹槽包括沿着凹槽的纵向轴线定向的第一部分和围绕轴线螺旋地缠绕的第二部分，以在第一腔室内产生流化气体涡流。
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5.发明申请Process for Preparing Metal or Metal Alloy Nanoparticles Dispersed on a Substrate by Chemical Vapour Deposition 有权通过化学气相沉积分散在基体上的金属或金属合金纳米颗粒的制备方法公开(公告)号：US20080128656A1
公开(公告)日：2008-06-05
申请号：US11793888
申请日：2005-12-23
申请人： Stéphanie Thollon , Fabien Luc , Joel Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
发明人： Stéphanie Thollon , Fabien Luc , Joel Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
IPC分类号： C23C16/06 , B32B5/16 , C01B3/38 , C07D301/10 , C07B41/00 , C01B31/20 , C01B21/00 , C07C29/00 , B01D53/34 , B01D53/56
CPC分类号： C23C16/18 , C23C16/40 , Y10T428/256
摘要： Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas.Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy.Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
摘要翻译： 沉积金属或所述金属的合金的纳米颗粒的工艺，所述金属选自由化学气相沉积（CVD）分散在基材上的来自一种或多种前体的元素周期表第VIIIB和IB栏的金属， 其中在包含大于50体积％的活性氧化气体的气体的存在下进行沉积。 包含至少一个表面的基板，其上分散有由金属或金属合金制成的纳米颗粒，例如由银或银合金制成。 使用底物来催化化学反应，例如NO x X消除反应。
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6.发明申请DEVICE FOR THE SYNTHESIS OF NANOPARTICLES BY FLUIDIZED-BED CHEMICAL VAPOUR DEPOSITION 有权通过流化床蒸发沉积合成纳米颗粒的装置公开(公告)号：US20110220024A1
公开(公告)日：2011-09-15
申请号：US13123171
申请日：2009-09-10
IPC分类号： C23C16/442 , C23C16/455
CPC分类号： C23C16/442 , B01J23/42 , B01J35/006 , B01J37/0221 , B01J37/0238 , B22F2998/00 , C01B3/0026 , C23C16/4417 , C23C16/45502 , C23C16/45591 , Y02E60/327 , Y10S118/05 , B22F9/24 , B22F1/0018
摘要： A device for vapor deposition of chemical species on support grains of spherical or similar shape disposed in a fluidized bed. The device includes a first chamber including a fluidized bed in which a funnel-shaped fluidizer element is housed to receive support grains of spherical or similar shape; a second chamber in fluid flow connection with the first chamber to deliver precursors in a vapor phase of chemical species to be deposited on the support grains and to convey a fluidizing gas towards the first chamber; and a flute at an inlet to the fluidizer element to control distribution of the vapor phase precursors and the fluidizing gas within the fluidizer element. The distributor flute includes one or more outer grooves, each groove including a first portion oriented along the longitudinal axis of the flute and a second portion winding helically around the axis to generate a fluidizing gas vortex within the first chamber.
摘要翻译： 用于将化学物质蒸发沉积在设置在流化床中的球形或类似形状的载体颗粒上的装置。 该装置包括第一室，其包括流化床，容纳漏斗状流化器元件以容纳球形或类似形状的支撑颗粒; 与所述第一室流体流动连接的第二室，以将待沉积在所述载体颗粒上的化学物质的气相中输送前体并将流化气体输送到所述第一室; 以及在流化器元件的入口处的凹槽，以控制流化器元件内的气相前体和流化气体的分布。 分配器凹槽包括一个或多个外部凹槽，每个凹槽包括沿着凹槽的纵向轴线定向的第一部分和围绕轴线螺旋地缠绕的第二部分，以在第一腔室内产生流化气体涡流。
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7.发明授权Coating for a mechanical part, comprising at least one hydrogenated amorphous carbon, and method of depositing one such coating 失效包含至少一种氢化无定形碳的机械部件的涂层以及沉积一种这样的涂层的方法公开(公告)号：US07488536B2
公开(公告)日：2009-02-10
申请号：US10560776
申请日：2004-06-15
IPC分类号： B32B9/00
CPC分类号： C23C16/0272 , C23C16/26 , Y10T428/30
摘要： A coating for a mechanical part comprises a first layer of hydrogenated amorphous silicon carbide designed to be in contact with the mechanical part, a stack of layers and an external layer of hydrogenated amorphous carbon. The stack is formed by an alternation of layers respectively of hydrogenated amorphous carbon and of hydrogenated amorphous silicon carbide. The coating has a total thickness preferably comprised between 10 and 20 micrometers.
摘要翻译： 用于机械部件的涂层包括设计成与机械部件接触的第一层氢化非晶碳化硅，层叠层和氢化无定形碳外层。 叠层由氢化无定形碳和氢化非晶碳化硅的交替层组成。 涂层的总厚度优选为10至20微米。
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