Electron beam source for use in electron gun
    1.
    发明申请
    Electron beam source for use in electron gun 有权
    用于电子枪的电子束源

    公开(公告)号:US20070057617A1

    公开(公告)日:2007-03-15

    申请号:US11286802

    申请日:2005-11-22

    IPC分类号: H01J29/46 H01J29/50

    摘要: An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the emitter such that the tip of the emitter protrudes through the suppressor electrode and an extractor electrode disposed adjacent the tip of the emitter. The extractor electrode comprises a magnetic disk whose magnetic field is aligned with an axis of the electron beam.

    摘要翻译: 一种用于电子枪的电子束源。 电子束源包括终端在尖端中的发射器。 发射极被配置为产生电子束。 电子束源还包括横向围绕发射器的抑制电极,使得发射极的尖端突出通过抑制电极和与发射极的顶端相邻设置的提取电极。 提取器电极包括其磁场与电子束的轴线对齐的磁盘。

    Device and method for milling of material using ions
    3.
    发明申请
    Device and method for milling of material using ions 有权
    使用离子研磨材料的装置和方法

    公开(公告)号:US20070023701A1

    公开(公告)日:2007-02-01

    申请号:US11523979

    申请日:2006-09-20

    IPC分类号: H01J37/08

    摘要: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

    摘要翻译: 公开了用于通过使用离子轰击制备显微镜试样或其它表面科学应用的研磨装置。 该设备提供了通过使用高能量和低能量离子源来利用样品表面的粗略和细微改性的能力。 由离子源产生的冲击波束内的样本位置的精确控制提供了使样本相对于其倾斜和旋转的能力。 位置控制还允许在程序化控制下和在一致的真空条件下在各种来源之间移动样品。 还提供了一种装载锁定机构,以允许将样品引入装置中而不会损失真空,并且能够在这种加载和卸载操作期间将样品返回到环境温度。 可以在所有活动期间观察和成像样本。