公开(公告)号：US20050225248A1

公开(公告)日：2005-10-13

申请号：US10811912

申请日：2004-03-30

申请人： Steven Fink ,  Andrej Mitrovic ,  Paula Calabrese

发明人： Steven Fink ,  Andrej Mitrovic ,  Paula Calabrese

IPC分类号： C23C14/00 ,  H01J7/24 ,  H01J17/26 ,  H01J37/32 ,  H01L21/00

CPC分类号： H01L21/67069 ,  H01J37/32458 ,  H01J37/32972

摘要： An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.

摘要翻译： 一种光学窗口沉积屏蔽，包括具有通孔的背板，以及具有多个相邻单元的蜂窝结构，所述多个相邻单元被配置为允许通过蜂窝结构进行光学观察。 蜂窝结构体的每个单元具有足以阻碍加工等离子体行进通过电池整个长度的长度与直径的纵横比。 耦合装置，其被配置为将蜂窝芯结构耦合到背板，使得蜂窝结构与背板中的通孔的至少一部分对齐。 光学窗口沉积屏蔽屏蔽了等离子体处理设备的光学观察窗口与等离子体的接触。

公开(公告)号：US20050171702A1

公开(公告)日：2005-08-04

申请号：US10767346

申请日：2004-01-30

申请人： Paula Calabrese ,  Andrej Mitrovic

发明人： Paula Calabrese ,  Andrej Mitrovic

IPC分类号： H01L21/00 ,  G06F19/00

CPC分类号： H01L21/67253

摘要： An electronic monitoring device that archives chemical exposures of a consumable part inside a semiconductor processing tool. The monitoring device includes a memory unit dedicated to the consumable part and which stores a history of the chemical exposures of the consumable part, a processor in communication with the memory unit, and a power supply circuit that supplies power to the processor and the memory unit.

摘要翻译： 一种电子监控装置，其将半导体处理工具内的消耗部件的化学暴露归档。 监视装置包括专用于消耗部件的存储单元，其存储消耗部件的化学曝光的历史，与存储器单元通信的处理器以及向处理器和存储器单元供电的电源电路 。

公开(公告)号：US07020583B2

公开(公告)日：2006-03-28

申请号：US10767346

申请日：2004-01-30

申请人： Paula Calabrese ,  Andrej Mitrovic

发明人： Paula Calabrese ,  Andrej Mitrovic

IPC分类号： H01L21/66

CPC分类号： H01L21/67253

摘要： An electronic monitoring device that archives chemical exposures of a consumable part inside a semiconductor processing tool. The monitoring device includes a memory unit dedicated to the consumable part and which stores a history of the chemical exposures of the consumable part, a processor in communication with the memory unit, and a power supply circuit that supplies power to the processor and the memory unit.

摘要翻译： 一种电子监控装置，其将半导体处理工具内的消耗部件的化学暴露归档。 监视装置包括专用于消耗部件的存储单元，其存储消耗部件的化学曝光的历史，与存储器单元通信的处理器以及向处理器和存储器单元供电的电源电路 。

公开(公告)号：US20070113976A1

公开(公告)日：2007-05-24

申请号：US11654568

申请日：2007-01-18

申请人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

发明人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

IPC分类号： C23F1/00 ,  H01L21/306

CPC分类号： H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

摘要： A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

公开(公告)号：US20060191484A1

公开(公告)日：2006-08-31

申请号：US11065065

申请日：2005-02-25

申请人： Andrej Mitrovic ,  Steven Fink

发明人： Andrej Mitrovic ,  Steven Fink

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： H01L21/67069 ,  C23F4/00 ,  H01J37/32477

摘要： An apparatus for processing semiconductors includes a processing chamber including a plurality of chamber walls, a substrate holder, positioned within the processing chamber and configured to support the substrate, and a linear displacement device, coupled between a base wall of the plurality of walls and the substrate holder and configured to move the substrate holder relative to the base wall. A shielding part extending from the substrate holder to be in close parallel relation with at least one of the plurality of walls such that a first area of the processing chamber is substantially shielded from a processing environment to which the substrate is exposed.

摘要翻译： 一种用于处理半导体的设备包括处理室，其包括多个室壁，位于处理室内并被配置为支撑衬底的衬底保持器，以及线性位移装置，其连接在多个壁的底壁和 衬底保持器并且构造成相对于底壁移动衬底保持器。 从衬底保持器延伸成与多个壁中的至少一个紧密平行的屏蔽部分，使得处理室的第一区域基本上与衬底暴露于的处理环境屏蔽。

公开(公告)号：US20070114206A1

公开(公告)日：2007-05-24

申请号：US11654669

申请日：2007-01-18

申请人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

发明人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

IPC分类号： G01L21/30

CPC分类号： H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

摘要： A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

公开(公告)号：US20070131650A1

公开(公告)日：2007-06-14

申请号：US11654564

申请日：2007-01-18

申请人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

发明人： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

IPC分类号： B44C1/22

CPC分类号： H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

摘要： A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

摘要翻译： 一种用于通过多个温度控制系统控制暴露于等离子体的壁内或其他表面内的等离子体室的温度的装置和方法。 可以通过独立地控制壁或其它表面的段的温度来控制等离子体室内的等离子体处理。

公开(公告)号：US20060060303A1

公开(公告)日：2006-03-23

申请号：US11236535

申请日：2005-09-28

申请人： Steven Fink ,  Paul Moroz ,  Eric Strang ,  Andrej Mitrovic

发明人： Steven Fink ,  Paul Moroz ,  Eric Strang ,  Andrej Mitrovic

IPC分类号： B08B6/00 ,  H01L21/306 ,  C23C16/00

CPC分类号： H01J37/3244 ,  H01J2237/022

摘要： A plasma processing system includes a chamber containing a plasma processing region and a chuck constructed and arranged to support a substrate within the chamber in the processing region. The plasma processing system further includes at least one gas injection passage in communication with the chamber and configured to facilitate removal of particles from the chamber by passing purge gas therethrough. In one embodiment, the plasma processing system can include an electrode configured to attract or repel particles in the chamber by electrostatic force when the electrode is biased with DC or RF power. A method of processing a substrate in a plasma processing system includes removing particles in a chamber of the plasma processing system by supplying purge gas through at least one gas injection passage in communication with the chamber.

摘要翻译： 等离子体处理系统包括容纳等离子体处理区域的腔室和构造和布置成在处理区域内的腔室内支撑衬底的卡盘。 等离子体处理系统还包括至少一个与室连通的气体注入通道，并且构造成便于通过吹扫气体从腔室中除去颗粒。 在一个实施例中，等离子体处理系统可以包括电极，其被配置为当电极用DC或RF功率偏置时通过静电力吸引或排斥腔室中的颗粒。 一种在等离子体处理系统中处理衬底的方法，包括通过与室连通的至少一个气体注入通道供应净化气体来去除等离子体处理系统的腔室中的颗粒。

公开(公告)号：US08036869B2

公开(公告)日：2011-10-11

申请号：US10673467

申请日：2003-09-30

申请人： Eric J. Strang ,  Andrej Mitrovic

发明人： Eric J. Strang ,  Andrej Mitrovic

IPC分类号： G06F17/50 ,  G06F19/00 ,  G06G7/48 ,  H01L21/00

CPC分类号： G05B19/41885 ,  Y02P90/26 ,  Y02P90/86

摘要： A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool, inputting a first principles physical model relating to the semiconductor processing tool, performing first principles simulation using the input data and the physical model to provide a first principles simulation result. The first principles simulation result is used to build an empirical model, and at least one of the first principles simulation result and the empirical model is selected to control the process performed by the semiconductor processing tool.

摘要翻译： 一种用于控制由半导体处理工具执行的处理的方法，系统和计算机可读介质。 该方法包括输入与半导体处理工具执行的处理有关的数据，输入与半导体处理工具相关的第一原理物理模型，使用输入数据和物理模型执行第一原理模拟以提供第一原理模拟结果。 第一原理模拟结果用于建立经验模型，并选择第一原理模拟结果和经验模型中的至少一个来控​​制半导体处理工具执行的过程。

公开(公告)号：US07230204B2

公开(公告)日：2007-06-12

申请号：US10551236

申请日：2004-03-17

申请人： Andrej Mitrovic ,  Yuji Tsukamoto

发明人： Andrej Mitrovic ,  Yuji Tsukamoto

IPC分类号： B23K10/00

CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/67109

摘要： A substrate holder for supporting a substrate in a processing system and controlling the temperature thereof is described. The substrate holder comprises a first heating element positioned in a first region for elevating the temperature of the first region. A second heating element positioned in a second region is configured to elevate the temperature in the second region. Furthermore, a first controllably insulating element is positioned below the first heating element, and is configured to control the transfer of heat between the substrate and at least one cooling element positioned therebelow in the first region. A second controllably insulating element is positioned below the second heating element and is configured to control the transfer of heat between the substrate and at least one cooling element positioned therebelow in the second region.

摘要翻译： 描述了用于在处理系统中支撑衬底并控制其温度的衬底保持器。 衬底保持器包括位于第一区域中的第一加热元件，用于升高第一区域的温度。 定位在第二区域中的第二加热元件构造成升高第二区域中的温度。 此外，第一可控绝缘元件位于第一加热元件的下方，并且被配置为控制基板与位于第一区域中的至少一个冷却元件之间的热传递。 第二可控绝缘元件位于第二加热元件的下方，并且被配置为控制基板与位于第二区域中的至少一个冷却元件之间的热传递。