公开(公告)号：US20070112233A1

公开(公告)日：2007-05-17

申请号：US11559029

申请日：2006-11-13

申请人： Sung Kim ,  Ye Kim ,  DongHyun Jo ,  Jongwook Bae ,  Sang-Seung Oh ,  Soonyeel Lee ,  Gimoon Nam

发明人： Sung Kim ,  Ye Kim ,  DongHyun Jo ,  Jongwook Bae ,  Sang-Seung Oh ,  Soonyeel Lee ,  Gimoon Nam

IPC分类号： C07C17/10

CPC分类号： C07C17/25 ,  C07C21/06

摘要： Provided are an apparatus for preparing vinyl chloride including: a pyrolysis reactor in which 1,2-dichloroethane and inert solid particles are mixed to generate vinyl chloride and hydrochloric acid; a first separator receiving the vinyl chloride, hydrochloric acid, and inert solid particles from the pyrolysis reactor and separating the vinyl chloride and hydrochloric acid from the inert solid particles; and a regeneration reactor receiving the separated inert solid particles from the first separator and regenerating the inert solid particles by burning the inert solid particles in a high temperature to remove coke deposited on the inert solid particles, wherein the restoration reactor is connected to the pyrolysis reactor to resupply the restored inert solid particles to the pyrolysis reactor, and a method of preparing vinyl chloride using the same. According to the apparatus and the method, the conversion rate can be improved, the productivity can be improved by effectively preventing interruption due to coke deposition, and the thermal efficiency can be enhanced by reusing thermal energy of sold particles heat treated at a high temperature in the regeneration reactor in the pyrolysis.

摘要翻译： 本发明提供一种氯乙烯的制备装置，其特征在于，包括热解反应器，其中1,2-二氯乙烷和惰性固体颗粒混合以产生氯乙烯和盐酸; 第一分离器，其接收来自热解反应器的氯乙烯，盐酸和惰性固体颗粒，并将氯乙烯和盐酸与惰性固体颗粒分离; 以及再生反应器，其从第一分离器接收分离的惰性固体颗粒，并通过在高温下燃烧惰性固体颗粒来再生惰性固体颗粒，以除去沉积在惰性固体颗粒上的焦炭，其中恢复反应器连接到热解反应器 将恢复的惰性固体颗粒再补给热解反应器，以及使用其制备氯乙烯的方法。 根据该装置和方法，可以提高转化率，通过有效地防止焦炭沉积导致的中断，能够提高生产率，并且可以通过重新利用在高温下热处理的销售颗粒的热能来提高热效率 热解中的再生反应器。

公开(公告)号：US20050103477A1

公开(公告)日：2005-05-19

申请号：US10965794

申请日：2004-10-18

申请人： Ye Kim ,  Ki Ko

发明人： Ye Kim ,  Ki Ko

IPC分类号： G06F1/20 ,  F28D15/00 ,  F25B13/00

CPC分类号： G06F1/203

摘要： A cooling structure for a portable computer includes a cooling fan creating an air stream to release heat generated in a main body of the computer to the outside through at least one vent. First and second heat pipes transfer heat generated in first and second heat sources on a main board of the computer to a path of the air stream. A portion of the air stream is also directed to the interior of the main body.

摘要翻译： 用于便携式计算机的冷却结构包括冷却风扇，其产生空气流，以通过至少一个排气口将计算机主体中产生的热量释放到外部。 第一和第二热管将计算机主板上的第一和第二热源中产生的热量传递到空气流的路径。 空气流的一部分也被引导到主体的内部。

公开(公告)号：US20070075291A1

公开(公告)日：2007-04-05

申请号：US11421965

申请日：2006-06-02

申请人： Un Paik ,  Jea Park ,  Sang Kim ,  Ye Kim ,  Myoung Suh ,  Dae Kim

发明人： Un Paik ,  Jea Park ,  Sang Kim ,  Ye Kim ,  Myoung Suh ,  Dae Kim

IPC分类号： C09K13/00 ,  C03C15/00 ,  H01L21/461 ,  B44C1/22 ,  C23F1/00

CPC分类号： C23F3/04 ,  C09G1/02 ,  C09K3/1463 ,  C09K3/1472 ,  H01L21/3212

摘要： A CMP slurry is provided comprising polishing particles, the polishing particle comprising organically modified colloidal silica. Also, a method of preparing a CMP slurry is provided, comprising the steps of: preparing polishing particles comprising organically modified silica; converting the polishing particles into an aqueous state; and adding pure water, a hydrophilic additive and a dispersing agent to the polishing particles. The polishing particles can be synthesized using a sol-gel process. According to the invention, a slurry having excellent polishing properties can be prepared, in which the surface properties of colloidal silica are changed to control the physical properties of the polishing particles and which can ensure a desired CMP removal rate while minimizing the occurrence of scratches.

摘要翻译： 提供包括抛光颗粒的CMP浆料，抛光颗粒包含有机改性的胶体二氧化硅。 另外，提供了制备CMP浆料的方法，包括以下步骤：制备包含有机改性二氧化硅的抛光颗粒; 将抛光颗粒转化成水状态; 并向抛光颗粒中加入纯水，亲水性添加剂和分散剂。 抛光颗粒可以使用溶胶 - 凝胶法合成。 根据本发明，可以制备具有优异抛光性能的浆料，其中改变胶体二氧化硅的表面性能以控制抛光颗粒的物理性质，并且可以确保所需的CMP去除速率同时最小化划痕的发生。