摘要:
A focus monitoring mask includes a transparent substrate, e.g., a quartz layer. A light blocking film, e.g., a chromium-containing film, is disposed on the transparent substrate and has an opening therein. A transparent unit is disposed in a portion of the substrate exposed by the opening. The transparent unit includes a first phase shifter, a second phase shifter and a third phase shifter arranged adjacently in order of amount of phase shift. The second phase shifter is configured to provide an about 180° phase difference with respect to the first phase shifter. The third phase shifter is configured to provide a phase difference other than about 0° and about 180° with respect to the first phase shifter. The transparent unit may further include a fourth phase shifter having a fourth phase difference with respect to the first phase shifter that differs from about 0°, about 180° and the phase difference provided by the third phase shifter.
摘要:
A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by preparing a reference pattern and a measuring pattern on a reticle. The reference pattern includes a light shielding region having first open regions for transmitting light to a center of an active region of the image sensor. The measuring pattern includes a light shielding region having second open regions for transmitting light to a periphery of the active region. A first intensity of light reaching the active region after being filtered by the reference pattern and a second intensity of light reaching the image sensor after being filtered by the measuring pattern are measured. The intensity of the stray light is evaluated by a difference between the first and second light intensities.
摘要:
A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by preparing a reference pattern and a measuring pattern on a reticle. The reference pattern includes a light shielding region having first open regions for transmitting light to a center of an active region of the image sensor. The measuring pattern includes a light shielding region having second open regions for transmitting light to a periphery of the active region. A first intensity of light reaching the active region after being filtered by the reference pattern and a second intensity of light reaching the image sensor after being filtered by the measuring pattern are measured. The intensity of the stray light is evaluated by a difference between the first and second light intensities.
摘要:
A performance inspection system for an array ultrasound transducer includes: a driver for selectively applying an electric signal to all or some parts of constituent channels of the array ultrasound transducer; an acoustic power measurement unit for measuring an ultrasound acoustic power emitted from individual channels receiving the same voltage from the driver; a radiation conductance conversion unit for measuring a voltage signal applied to each channel although the driver applies different voltages to the individual channels, and converting the measured voltage into an ultrasound acoustic power acquired when the same voltage is applied to the channels; and a channel uniformity estimation unit for estimating uniformity of the acoustic power value acquired by the radiation conductance conversion unit or uniformity of acoustic power values of the individual channels measured under the same voltage.
摘要:
A performance inspection system for an array ultrasound transducer includes: a driver for selectively applying an electric signal to all or some parts of constituent channels of the array ultrasound transducer; an acoustic power measurement unit for measuring an ultrasound acoustic power emitted from individual channels receiving the same voltage from the driver; a radiation conductance conversion unit for measuring a voltage signal applied to each channel although the driver applies different voltages to the individual channels, and converting the measured voltage into an ultrasound acoustic power acquired when the same voltage is applied to the channels; and a channel uniformity estimation unit for estimating uniformity of the acoustic power value acquired by the radiation conductance conversion unit or uniformity of acoustic power values of the individual channels measured under the same voltage.