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    Process for preparing diketone compounds
    4.
    发明授权
    Process for preparing diketone compounds 有权
    制备二酮化合物的方法

    公开(公告)号：US06235942B1

    公开(公告)日：2001-05-22

    申请号：US09117372

    申请日：1998-10-28

    申请人： Virginie Pevere ,  Alain Gadras ,  Susan Mary Cramp ,  Charles Walter Ellwood

    发明人： Virginie Pevere ,  Alain Gadras ,  Susan Mary Cramp ,  Charles Walter Ellwood

    IPC分类号： C07C31914

    CPC分类号： C07C205/11 ,  C07C205/45 ,  C07C319/20 ,  C07C2601/02 ,  C07C323/22

    摘要： A process for preparing compounds of the formula: wherein R2 is lower alkyl; or phenyl optionally substituted by from one to five groups, the same or different, which are lower alkyl, lower haloalkyl, halogen or —SR4; R3 is halogen, lower alkyl, lower haloalkyl, lower alkoxy, lower haloalkoxy, —S-alkyl, cycloalkyl having from 3 to 7 carbon atoms in the ring, alkenyl or alkynyl having from 3 to 7 carbon atoms, or -(CR5R6)—SR2 wherein q is one or two; R4 is lower alkyl; R5 and R6 independently represent hydrogen, lower alkyl or lower haloalkyl; and n is zero or an integer from one to three; intermediate compounds of the formula: and processes for preparing them.

    摘要翻译： 一种制备下式化合物的方法：其中R2是低级烷基; 或任选被一至五个相同或不同的基团取代的苯基，它们是低级烷基，低级卤代烷基，卤素或-SR 4; 或R 3为卤素，低级烷基，低级卤代烷基，低级烷氧基，低级卤代烷氧基，-S-烷基，环中具有3-7个碳原子的环烷基，具有3-7个碳原子的烯基或炔基，或 - （CR5R6） - 其中q是1或2; R4是低级烷基; R5和R6独立地表示氢，低级烷基或低级卤代烷基; 并且n为0或1至3的整数; 下式的中间体化合物及其制备方法。