公开(公告)号：US20230411127A1

公开(公告)日：2023-12-21

申请号：US17842565

申请日：2022-06-16

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Tai-Jung CHUANG ,  Chiao-Yuan HSIAO ,  Yung-Chan CHEN ,  Wei Kang CHUNG ,  Yu-Li LIN ,  Jui Fu HSIEH ,  Chih-Teng LIAO

IPC: H01J37/32 ,  H01L21/66 ,  H01L21/311

CPC classification number: H01J37/32807 ,  H01J37/32449 ,  H01L22/26 ,  H01L21/31116 ,  H01J2237/334 ,  H01J2237/24585

Abstract: Embodiments are directed to a method of operating a plasma processing system by retrofitting one or more components thereof. The method includes removing a holder from a gas supply mechanism of the plasma processing system. The holder includes a gas injector that is configured to provide gas received from a gas source to a plasma chamber of the plasma processing system. The method further includes reducing a size of a guide pin of the holder, installing the holder including the guide pin having the reduced size in the gas supply mechanism, and rotating the gas injector to change a flow of gas through the gas injector.