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公开(公告)号:US20200266003A1
公开(公告)日:2020-08-20
申请号:US16790347
申请日:2020-02-13
Applicant: TDK Corporation
Inventor: Toshio ASAHI , Hitoshi SAITA
Abstract: Disclosed herein is a thin film capacitor embedded substrate that includes a substrate and a plurality of thin film capacitors including at least first and second thin film capacitors embedded in the substrate. The first and second thin film capacitors are connected in parallel and have mutually different self-resonant frequencies.
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公开(公告)号:US20210130187A1
公开(公告)日:2021-05-06
申请号:US17071474
申请日:2020-10-15
Applicant: TDK CORPORATION
Inventor: Toshio ASAHI , Masamitsu HAEMORI , Hitoshi SAITA
Abstract: A dielectric film includes a main component of a complex oxide represented by a general formula of (Sr1-xCax)yTiO3. 0.40≤x≤0.90 and 0.90≤y≤1.10 are satisfied. A ratio of a diffraction peak intensity on (1, 1, 2) plane of the complex oxide to a diffraction peak intensity on (0, 0, 4) plane of the complex oxide in an X-ray diffraction chart of the dielectric film is 3.00 or more. Instead, a ratio of an intensity of a diffraction peak appearing at a diffraction angle 2θ of 32° or more and 34° or less to an intensity of a diffraction peak appearing at a diffraction angle 2θ of 46° or more and 48° or less in an X-ray diffraction chart of the dielectric film obtained by an X-ray diffraction measurement with Cu-Kα ray as an X-ray source is 3.00 or more.
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公开(公告)号:US20210292244A1
公开(公告)日:2021-09-23
申请号:US17189859
申请日:2021-03-02
Applicant: TDK CORPORATION
Inventor: Toshio ASAHI , Masamitsu HAEMORI , Hitoshi SAITA , Masahito FURUKAWA
Abstract: A dielectric thin film contains Ca, Sr, Ti, Hf, O and N, wherein among crystal grains existing in a plane field of view of 1 μm square perpendicular to a film thickness direction of the dielectric thin film, a number ratio of crystal grains having a grain size of 19 nm or more and less than 140 nm is 95% or more, among the crystal grains existing in the plane field of view, a number ratio of first crystal grains having a grain size of 65 nm or more and less than 77 nm is 20% or more, and among the crystal grains existing in the plane field of view, a number ratio of second crystal grains having a grain size of 19 nm or more and less than 54 nm is 40% or less.
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4.
公开(公告)号:US20210110974A1
公开(公告)日:2021-04-15
申请号:US17034507
申请日:2020-09-28
Applicant: TDK CORPORATION
Inventor: Masamitsu HAEMORI , Toshio ASAHI , Hitoshi SAITA
Abstract: The present invention provides a dielectric composition having high relative permittivity and insulation resistance at high temperature. The dielectric composition includes a main component expressed by a compositional formula (Sr1-x, Cax)m(Ti1-yHfy)O3-δNδ, in which 0
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公开(公告)号:US20250059095A1
公开(公告)日:2025-02-20
申请号:US18761881
申请日:2024-07-02
Applicant: TDK CORPORATION
Inventor: Toshihiro IGUCHI , Kenichiro MASUDA , Tetsuya YOSHIYAMA , Takuma ARIIZUMI , Toshio ASAHI
IPC: C04B35/468 , H01G4/12 , H01G4/30
Abstract: A dielectric composition includes main phase grains and segregation grains. The segregation grains at least partly include Ba—Mg—Si—O segregation grains including Ba, Mg, Si, and O. Ba, Mg, and Si in the Ba—Mg—Si—O segregation grains constitute 70 parts by mol or more in total out of 100 parts by mol of a total of metal elements and Si in the Ba—Mg—Si—O segregation grains.
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6.
公开(公告)号:US20210276868A1
公开(公告)日:2021-09-09
申请号:US17190045
申请日:2021-03-02
Applicant: TDK CORPORATION
Inventor: Toshio ASAHI , Masamitsu HAEMORI , Masahito FURUKAWA , Hitoshi SAITA
IPC: C01B21/082 , H05K1/03
Abstract: To provide a dielectric composition having excellent reliability. The dielectric composition contains a main component represented by a composition formula (Sr1-xCax)m(Ti1-yHfy)O3-δNδ, in which 0.15
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