公开(公告)号：US20170114242A1

公开(公告)日：2017-04-27

申请号：US15315697

申请日：2015-05-26

Applicant: THE CHEMOURS COMPANY FC, LLC

Inventor： RALPH BIRCHARD LLOYD ,  JAMES F RYLEY ,  ROBERT CLAYTON WHELAND ,  DANIEL CHUNG

IPC: C09D127/18 ,  C09D127/22 ,  C08F114/26 ,  C08F114/18 ,  C09D127/12 ,  B05D1/18 ,  C09D127/20 ,  C08J3/28 ,  C08J3/24 ,  B05D1/02 ,  B05D1/30 ,  B05D1/28 ,  C09D5/24 ,  C08F114/28

CPC classification number: C09D127/18 ,  B05D1/02 ,  B05D1/18 ,  B05D1/28 ,  B05D1/305 ,  C08F114/185 ,  C08F114/26 ,  C08F114/28 ,  C08F2810/20 ,  C08J3/24 ,  C08J3/28 ,  C08J2327/12 ,  C08J2327/18 ,  C08J2327/20 ,  C08J2327/22 ,  C09D5/24 ,  C09D127/12 ,  C09D127/20 ,  C09D127/22 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: The present disclosure relates to a passivation layer comprising a photocrosslinked fluoropolymer and a process for forming the layer. Passivation layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorptivity and are able to be photoimaged so as to provide the very fine features needed for modern electronic equipment.