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公开(公告)号:US11114300B2
公开(公告)日:2021-09-07
申请号:US16320455
申请日:2017-07-14
发明人: Kenichi Ohmori , Suk-Hwan Chung , Ryosuke Sato , Masashi Machida
IPC分类号: H01L21/20 , H01L21/02 , H01L29/786 , H01L21/268
摘要: A laser annealing apparatus (1) according to the embodiment includes: a laser beam source (11) configured to emit a laser beam (L1) to crystallize an amorphous silicon film (101a) on a substrate (100) and to form a poly-silicon film (101b); a projection lens (13) configured to condense the laser beam to irradiate a silicon film (101); a probe beam source configured to emit a probe beam (L2); a photodetector (25) configured to detect the probe beam (L3) transmitted through the silicon film (101); a processing apparatus (26) configured to calculate a standard deviation of detection values of a detection signal output from the photodetector, and to determine a crystalline state of the crystallized film based on the standard deviation.
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公开(公告)号:US10658185B2
公开(公告)日:2020-05-19
申请号:US16330759
申请日:2017-06-02
发明人: Ryo Shimizu , Ryosuke Sato , Teruaki Shimoji
IPC分类号: H01L21/268 , H01L21/677 , B23K26/073 , G01J1/42 , H01L21/02 , H01L29/786 , B23K26/00 , B23K26/70 , B23K26/352 , G09F9/00 , B23K26/12 , H01L21/67 , B23K26/08 , B23K103/00 , B23K101/40
摘要: A laser annealing apparatus (1) according to an embodiment includes a laser oscillator (4) configured to generate a laser beam (L), a floating-type conveying stage (3) configured to float and convey a workpiece (W) to be irradiated with the laser beam (L), and a beam profiler (7) configured to measure a beam profile of the laser beam (L). The floating-type conveying stage (3) includes a conveying surface (3a) opposed to the workpiece (W), and a bottom surface (3b) on the side opposite to the conveying surface (3a). The beam profiler (7) is positioned below the bottom surface (3b) of the floating-type conveying stage (3). The floating-type conveying stage (3) includes a detachable part (12) in a part of it. An opening (S) is formed by detaching the detachable part (12) from the floating-type conveying stage (3), the opening (3) extending from the conveying surface (3a) to the bottom surface (3b). The beam profiler (7) is configured to measure the beam profile of the laser beam (L) through the opening (S).
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公开(公告)号:US10350710B2
公开(公告)日:2019-07-16
申请号:US15569062
申请日:2015-04-08
发明人: Yasuhiro Yamashita , Ryosuke Sato , Toshio Inami
IPC分类号: B23K26/00 , B23K26/402 , B23K26/082 , B23K26/073 , B23K26/50 , B23K26/08 , B23K26/0622 , B23K26/53 , H01L51/00 , B23K103/00 , B23K103/16
摘要: A laser irradiation method sets scan lines in an x direction in parallel, and in a y direction to be separate by an inter-scan-line distance Py corresponding to laser irradiation areas of a processing target object, orients a length direction of a linear laser spot with length Wy and width Wx in the y direction, and irradiates target object with the laser spot in each of irradiation positions arranged at width direction intervals Λ while moving the laser spot relative to the target object along the scan lines. The method includes determining the inter-scan-line distance Py, the width direction interval Λ, and a position shift quantity Δx (where, 0
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