METHOD OF MANUFACTURING GAS BARRIER FILM AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT
    10.
    发明申请
    METHOD OF MANUFACTURING GAS BARRIER FILM AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT 审中-公开
    气体阻隔膜和有机光电转换元件的制造方法

    公开(公告)号:US20130146860A1

    公开(公告)日:2013-06-13

    申请号:US13818277

    申请日:2011-08-16

    申请人: Takahide Toyama

    发明人: Takahide Toyama

    IPC分类号: H01L51/52 B05D3/06

    摘要: The present invention provides: a method of manufacturing a gas barrier film, which is manufactured at high productivity, and has extremely high gas barrier performance and stability thereof with time, excellent surface smoothness and bending resistance, and high durability; a gas barrier film obtained using the method; and an organic photoelectric conversion element using the gas barrier film. In the method, after forming a coated layer by applying a coating liquid containing polysilazane to a substrate, a gas barrier layer is formed by applying vacuum ultraviolet light to the coated layer surface thus formed. The method is characterized in that the coated layer is irradiated with the vacuum ultraviolet light, while drying the solvent in the e coated layer.

    摘要翻译: 本发明提供一种以高生产率制造的阻气膜的制造方法,具有极高的阻气性能及其随时间的稳定性,优异的表面平滑性和耐弯曲性,以及高的耐久性; 使用该方法获得的阻气膜; 以及使用阻气膜的有机光电转换元件。 在该方法中,通过将含有聚硅氮烷的涂布液涂布到基板上而形成涂布层后,通过对形成的涂布层表面施加真空紫外光而形成阻气层。 该方法的特征在于,用真空紫外线照射涂层,同时干燥e涂层中的溶剂。