公开(公告)号：US20230152703A1

公开(公告)日：2023-05-18

申请号：US18098572

申请日：2023-01-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi YAMAUCHI ,  Daiki SHIBATA ,  Kohei KAWAKAMI

IPC: G03F7/16 ,  B05B9/00 ,  H01L21/67 ,  B05C11/10 ,  H01L21/687

CPC classification number: G03F7/162 ,  B05B9/002 ,  B05C11/1042 ,  H01L21/6715 ,  H01L21/67017 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/0273

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

公开(公告)号：US20210078035A1

公开(公告)日：2021-03-18

申请号：US17017799

申请日：2020-09-11

Applicant: Tokyo Electron Limited

Inventor： Yusaku HASHIMOTO ,  Masatoshi KAWAKITA ,  Daiki SHIBATA

IPC: B05D1/00 ,  B05C9/14 ,  B05C5/00 ,  G03F7/16 ,  H01L21/027

Abstract: A coating method, includes: rotating a substrate at a first rotation speed while supplying a film-forming liquid to a center of a front surface of the substrate; stopping the supply of the film-forming liquid before the film-forming liquid supplied to the front surface of the substrate reaches an outer periphery of the substrate; continuing to rotate the substrate at a second rotation speed after the supply of the film-forming liquid is stopped; and supplying a cooling fluid, which is a gas-liquid mixture, to an outer peripheral portion of a rear surface of the substrate during a supply period for the substrate including at least a part of a period from a time when the supply of the film-forming liquid is stopped to a time when the rotation of the substrate at the second rotation speed is completed.

公开(公告)号：US20210181638A1

公开(公告)日：2021-06-17

申请号：US17113591

申请日：2020-12-07

Applicant: Tokyo Electron Limited

Inventor： Takashi YAMAUCHI ,  Daiki SHIBATA ,  Kohei KAWAKAMI

IPC: G03F7/16 ,  B05B9/00

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

公开(公告)号：US20150159642A1

公开(公告)日：2015-06-11

申请号：US14559950

申请日：2014-12-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi SASA ,  Daiki SHIBATA

IPC: F04B43/12 ,  F04B43/08 ,  H01L21/033 ,  G05D7/06 ,  H01L21/67 ,  F04B49/24 ,  F04B49/06

CPC classification number: F04B43/1238 ,  A61M5/14232 ,  B05C17/0333 ,  F04B43/08 ,  F04B43/1246 ,  F04B43/1253 ,  F04B43/1261 ,  F04B43/1276 ,  F04B43/1284 ,  F04B49/06 ,  F04B49/065 ,  F04B49/24 ,  G03F7/16 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/794 ,  Y10T137/86027

Abstract: In one embodiment, a feed pump (6) of a tube pump type is used for supplying a processing liquid. The tube pump has a squeezing member (65) that moves from a first axial position of a tube (62) at which the squeezing member starts pinching of the tube, to a second axial position at which the squeezing member leaves the tube after feeding the processing liquid toward an ejecting part such as a nozzle (51). Only one pinched part pinched between the squeezing member and a guide member (61) is formed between the first axial position and the second axial position of the tube, and the only one pinched part moves along the axial direction of the tube, during feeding of a dose of the processing liquid toward the ejecting part.

Abstract translation: 在一个实施例中，管式泵的供给泵（6）用于供应处理液体。 管式泵具有挤压构件（65），挤压构件（65）从挤压构件开始挤压管的管（62）的第一轴向位置移动到第二轴向位置，在第二轴向位置，挤压构件在进给之后离开管 将处理液体朝向诸如喷嘴（51）的喷射部分。 在挤压构件和引导构件（61）之间夹紧的仅一个夹紧部分形成在管的第一轴向位置和第二轴向位置之间，并且仅一个夹紧部分沿着管的轴向方向移动， 处理液朝向喷射部的剂量。