公开(公告)号：US20150109716A1

公开(公告)日：2015-04-23

申请号：US14519903

申请日：2014-10-21

申请人： TOKYO ELECTRON LIMITED

发明人： Masahiko KONNO ,  Masayuki SHINTAKU ,  Takashi SUZUKI ,  Michitaka AITA ,  Taizo OKADA ,  Naohiko OKUNISHI ,  Hideo KATO ,  Naoki MATSUMOTO

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  H01J37/32192 ,  H01J37/32311 ,  H01J37/32577 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/67103

摘要： A plasma processing apparatus includes a mounting table including a lower electrode and an electrostatic chuck, a high frequency power supply electrically connected to the lower electrode, a heater provided in the electrostatic chuck, a heater power supply for supplying a power to the heater, a filter unit including a filter connected to the heater power supply, a rod-shaped power feeder connecting the heater power supply and the heater via the filter, an insulating tubular portion having an inner hole through which the power feeder extends, and a conductive choke portion serving to suppress a microwave propagating through the tubular portion. The choke portion includes a first portion extending from the power feeder in a direction intersecting with a longitudinal direction of the power feeder and a cylindrical second portion extending, between the tubular portion and the power feeder, from a peripheral portion of the first portion.

摘要翻译： 等离子体处理装置包括：安装台，包括下电极和静电卡盘;电连接到下电极的高频电源;设置在静电卡盘中的加热器;向加热器供电的加热器电源; 过滤器单元，包括连接到加热器电源的过滤器，经由过滤器连接加热器电源和加热器的棒状供电器，具有供电器延伸穿过的内孔的绝缘管状部分和导电阻塞部分 用于抑制通过管状部分传播的微波。 扼流部包括从与馈电装置的长度方向交叉的方向从电力馈送器延伸的第一部分，以及在第一部分的周边部分之间延伸的管状部分和供电线之间的圆柱形第二部分。

公开(公告)号：US20210351012A1

公开(公告)日：2021-11-11

申请号：US17241755

申请日：2021-04-27

申请人： Tokyo Electron Limited

发明人： Yuji ONUMA ,  Hideo KATO

IPC分类号： H01J37/32

摘要： A controller of a plasma processing apparatus stores a frequency spectrum related to a first timing into a storage unit, controls a microwave generator to generate a microwave in correspondence to a setting frequency, setting power, and a setting bandwidth at a second timing, controls a demodulator to measure travelling wave power and reflected wave power of the microwave for each frequency, calculates the frequency spectrum related to the second timing on the basis of a measurement result from the demodulator, calculates a correction value for correcting a waveform of the travelling wave power for each frequency such that a difference for each frequency between the frequency spectrum related to the second timing and the frequency spectrum related to the first timing, stored in the storage unit, is small, and controls the microwave generator on the basis of the calculated correction value for each frequency.

公开(公告)号：US20160268101A1

公开(公告)日：2016-09-15

申请号：US15064698

申请日：2016-03-09

申请人： TOKYO ELECTRON LIMITED

发明人： Kazushi KANEKO ,  Hideo KATO ,  Kazunori FUNAZAKI ,  Yuji OTSUKA ,  Shinji KAWADA

IPC分类号： H01J37/32

CPC分类号： H01J37/32311 ,  H01J37/32229 ,  H01J37/32917

摘要： A microwave automatic matcher includes a movable body, a driving unit, a matching control unit, a reflection coefficient measuring unit, and a setting unit. The matching control unit consecutively moves the movable body from a start position in one direction by a distance of a difference between the start position and the target position in a matching operation carried out for the plasma process and then variably controls the position of the movable body until the measurement of the reflection coefficient obtained by the reflection coefficient measuring unit falls within the first neighboring range by monitoring the measurement of the reflection coefficient.

摘要翻译： 微波自动匹配器包括可移动体，驱动单元，匹配控制单元，反射系数测量单元和设置单元。 匹配控制单元在对于等离子体处理进行的匹配操作中，使可移动体从一个方向的起始位置连续地移动开始位置和目标位置之间的差的距离，然后可变地控制可移动体的位置 直到通过监视反射系数的测量，由反射系数测量单元获得的反射系数的测量落入第一相邻范围内。

公开(公告)号：US20150107773A1

公开(公告)日：2015-04-23

申请号：US14519688

申请日：2014-10-21

申请人： TOKYO ELECTRON LIMITED

发明人： Masayuki SHINTAKU ,  Takashi SUZUKI ,  Masahiko KONNO ,  Michitaka AITA ,  Taizo OKADA ,  Hideo KATO

IPC分类号： H01J37/32

CPC分类号： H01J37/32642 ,  H01J37/32192 ,  H01J37/32275

摘要： A plasma processing apparatus for exciting a processing gas by a microwave, includes a focus ring extending in an annular shape, a first tubular member being wrapped around a central axis to extend along an outer periphery of the lower electrode below the focus ring, an annular member made of a dielectric material provided between the focus ring and the first tubular member a second tubular member extending along an outer periphery of the first tubular member and a choke portion suppressing a microwave propagating through the first tubular member via the focus ring and the annular member. And the choke portion protrudes outward in a diametrical direction of the first tubular from the outer periphery of the first tubular member and extends in an annular shape along the periphery of the first tubular member, the choke portion is covered by the second tubular member.

摘要翻译： 一种用于通过微波激发处理气体的等离子体处理装置，包括以环形形状延伸的聚焦环，围绕中心轴缠绕的第一管状部件沿着聚焦环下方的下部电极的外周延伸，环状 由设置在聚焦环和第一管状构件之间的介电材料制成的构件，沿着第一管状构件的外周延伸的第二管状构件和抑制经由聚焦环传播通过第一管状构件的微波的扼流圈， 会员。 并且所述扼流部从所述第一管状部件的外周沿所述第一管状体的直径方向向外突出，并且沿着所述第一管状部件的周缘呈环状延伸，所述扼流部被所述第二管状部件覆盖。

公开(公告)号：US20200294766A1

公开(公告)日：2020-09-17

申请号：US16807436

申请日：2020-03-03

申请人： Tokyo Electron Limited

发明人： Ryou SON ,  Yuichi KUWAHARA ,  Syuntaro TAWARAYA ,  Hideo KATO

IPC分类号： H01J37/32

摘要： A plasma generation unit according to an exemplary embodiment includes a dielectric window, a slot plate, and a probe group. The slot plate is provided on the dielectric window. The probe group includes a plurality of probes that are electric conductors, is provided in the dielectric window, and is used for detection of a physical quantity around the dielectric window. The dielectric window extends along the slot plate. Each of the plurality of probes is disposed on a circumference of a first circle centered on a reference position of the dielectric window, when viewed from above the dielectric window.