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1.发明申请RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND 有权抗蚀剂组合物，形成耐火图案，酸发生器和化合物的方法公开(公告)号：US20160274458A1
公开(公告)日：2016-09-22
申请号：US15072004
申请日：2016-03-16
发明人： Takashi NAGAMINE , Hideto NITO , Daichi TAKAKI
IPC分类号： G03F7/004 , G03F7/20 , C07C321/30 , C07J31/00 , C07C211/05 , G03F7/038 , G03F7/32
CPC分类号： G03F7/0045 , C07J31/006 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/20 , G03F7/325
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B0-1) represented by general formula (b0) shown below (in the formula, Yx01 represents a divalent linking group; n represents an integer of 1 to 3; and M′m+ represents an organic cation having a valency of m.
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2.发明申请公开(公告)号：US20170097564A1
公开(公告)日：2017-04-06
申请号：US15284721
申请日：2016-10-04
发明人： Takashi NAGAMINE , Kotaro ENDO , Hideto NITO
CPC分类号： G03F7/0045 , C07C63/08 , C07C65/05 , C07C65/10 , C07C321/28 , C07C381/12 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/162 , G03F7/168 , G03F7/2006 , G03F7/2041 , G03F7/325 , G03F7/38 , G03F7/40
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z− represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m. Z−(Mm+)1/m (d1)
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3.发明申请公开(公告)号：US20190219920A1
公开(公告)日：2019-07-18
申请号：US16334302
申请日：2017-10-04
发明人： Takashi NAGAMINE , Hideto NITO , Masafumi FUJISAKI , Tatsuya FUJII , Yuki FUKUMURA , Takahiro KOJIMA , Issei SUZUKI , Takuya IKEDA , KhanhTin NGUYEN
CPC分类号： G03F7/039 , C08F20/26 , G03F7/0045 , G03F7/038 , G03F7/20 , G03F7/2002 , G03F7/2059
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
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4.发明申请公开(公告)号：US20200209741A1
公开(公告)日：2020-07-02
申请号：US16642825
申请日：2018-09-21
发明人： Junichi TSUCHIYA , Kotaro ENDO , Masafumi FUJISAKI , Hideto NITO
IPC分类号： G03F7/039 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , C08F220/18 , C07D327/04 , C08F220/38
摘要： A resist composition including a resin component (A1) which exhibits changed solubility in a developing solution under action of acid, the resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below (wherein Ya01 and Ya02 each independently represents a single bond or an alkylene group of 1 to 3 carbon atoms, provided that the total number of carbon atoms of Ya01 and Ya02 is 3 or less; Ra01 and Ra02 each independently represents a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, provided that the total number of carbon atoms of Ra01 and Ra02 is 2 to 6; A′ represents an alkylene group of 1 to 5 carbon atoms).
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5.发明申请公开(公告)号：US20170293223A1
公开(公告)日：2017-10-12
申请号：US15634941
申请日：2017-06-27
发明人： Takashi NAGAMINE , Kotaro ENDO , Hideto NITO
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/38 , C07C65/05 , G03F7/038
CPC分类号： G03F7/0045 , C07C63/08 , C07C65/05 , C07C65/10 , C07C321/28 , C07C381/12 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/162 , G03F7/168 , G03F7/2006 , G03F7/2041 , G03F7/325 , G03F7/38 , G03F7/40
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z− represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m. Z−(Mm+)1,m (d1)
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