公开(公告)号：US20180005854A1

公开(公告)日：2018-01-04

申请号：US15708171

申请日：2017-09-19

Applicant: TOSHIBA MEMORY CORPORATION

Inventor： Hiroaki YAMADA ,  Yoshihiro OGAWA ,  Takeshi HIZAWA

IPC: H01L21/67 ,  C23F1/26 ,  B08B3/14 ,  H01L21/66 ,  H01L21/311

CPC classification number: H01L21/67086 ,  B08B3/14 ,  B81C2201/0138 ,  C23F1/26 ,  H01L21/31111 ,  H01L22/10 ,  Y10T137/0318

Abstract: A chemical liquid treatment apparatus includes processing chambers; a chemical liquid feeding unit configured to cyclically feed a chemical liquid into the processing chambers; and a modifying unit. The modifying unit, when using a chemical liquid in which an effect thereof varies with a chemical liquid discharge time, is configured to calculate a variation of the effect of the chemical liquid based on the chemical liquid discharge time and is configured to modify the chemical liquid discharge time for each of the processing chambers based on the calculated variation of the effect of the chemical liquid and a cumulative time of the chemical liquid discharge time.