公开(公告)号：US20210175109A1

公开(公告)日：2021-06-10

申请号：US17179994

申请日：2021-02-19

Applicant: TOTO LTD.

Inventor： Masaki SATO ,  Ikuo ITAKURA ,  Shuichiro SAIGAN ,  Jun SHIRAISHI ,  Yutaka MOMIYAMA ,  Kouta KOBAYASHI

IPC: H01L21/683

Abstract: An electrostatic chuck includes: an electrically-conductive base plate including a first part, a second part at an outer circumference of the first part, and a gas inlet path for introducing a cooling gas; a first electrostatic chuck part configured to clamp a wafer on the first part, including a ceramic dielectric substrate that includes an embedded first clamping electrode and at least one through-hole communicating with the gas inlet path; and a second electrostatic chuck part configured to clamp a focus ring on the second part, including a ceramic layer that includes at least one through-hole for introducing a cooling gas and that includes at least a first layer contacting the focus ring when the second electrostatic chuck part clamps the focus ring, in which the first layer is less dense than the ceramic dielectric substrate. Thereby, the electrostatic chuck can increase the device yield.

公开(公告)号：US20190287839A1

公开(公告)日：2019-09-19

申请号：US16352899

申请日：2019-03-14

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Jun SHIRAISHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Shuichiro SAIGAN

IPC: H01L21/683

Abstract: According to the embodiment, the electrostatic chuck includes a ceramic dielectric substrate having a first major surface and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. At least one of the ceramic dielectric substrate or the first porous part includes a second hole part positioned between the first hole part and the first porous part, and a dimension of the second hole part is smaller than a dimension of the first porous part and larger than a dimension of the first hole part.

公开(公告)号：US20220199452A1

公开(公告)日：2022-06-23

申请号：US17690337

申请日：2022-03-09

Applicant: TOTO LTD.

Inventor： Jun SHIRAISHI ,  Shuichiro SAIGAN ,  Tatsuya MORI ,  Masahiro WATANABE

IPC: H01L21/683

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the base plate and the first major surface. The ceramic dielectric substrate includes a first hole part. The first porous part includes a porous section, and a first compact section being more compact than the porous section. The porous section including a plurality of sparse portions including a plurality of pores including a first pore and a second pore, and a dense portion having a higher density than the sparse portion.

公开(公告)号：US20190287840A1

公开(公告)日：2019-09-19

申请号：US16352904

申请日：2019-03-14

Applicant: TOTO LTD.

Inventor： Takara KATAYAMA ,  Kosuke YAMAGUCHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Jun SHIRAISHI ,  Shuichiro SAIGAN

IPC: H01L21/683

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface of the ceramic dielectric substrate and being opposite to the gas introduction path. The first porous part includes a first region positioned on the ceramic dielectric substrate side. The ceramic dielectric substrate includes a first substrate region positioned on the first region side. The first region and the first substrate region are provided in contact with each other, and an average particle diameter in the first region is different from an average particle diameter in the first substrate region.

公开(公告)号：US20200286769A1

公开(公告)日：2020-09-10

申请号：US16810482

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Jun SHIRAISHI ,  Shuichiro SAIGAN ,  Tatsuya MORI ,  Masahiro WATANABE ,  Yuki SASAKI

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  C23C16/458 ,  C23C16/455 ,  H01J37/32

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second porous parts. The ceramic dielectric substrate includes first and second major surfaces. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided in the ceramic dielectric substrate and is opposite to the gas feed channel. The second porous part is provided in the base plate and is opposite to the gas feed channel. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. The first porous part includes a first porous region including pores and a first dense region. The second porous part includes a second porous region including pores and a second dense region.

公开(公告)号：US20200286768A1

公开(公告)日：2020-09-10

申请号：US16810404

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Jun SHIRAISHI ,  Shuichiro SAIGAN ,  Tatsuya MORI ,  Masahiro WATANABE ,  Yuki SASAKI

IPC: H01L21/683 ,  H01L21/67 ,  H01J37/32

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate includes first and second major surfaces, and at least one groove. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the groove and the gas feed channel. The ceramic dielectric substrate includes holes communicating with the groove and the gas feed channel and piercing the ceramic dielectric substrate in a first direction from the base plate toward the ceramic dielectric substrate. The first porous part includes at least one porous region including pores, and at least one dense region denser than the porous region. The porous region further includes at least one dense part.

公开(公告)号：US20220319898A1

公开(公告)日：2022-10-06

申请号：US17837115

申请日：2022-06-10

Applicant: TOTO LTD.

Inventor： Masafumi IKEGUCHI ,  Tetsuro ITOYAMA ,  Shuichiro SAIGAN ,  Jun SHIRAISHI

IPC: H01L21/683 ,  H01L21/67

Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole connected to at least one of multiple first grooves. The first grooves include a first boundary groove, and at least one first in-region groove. Multiple second grooves and at least one second gas introduction hole are provided in the second region. The second grooves are include a second boundary groove extending along the first boundary and are provided to be most proximal to the first boundary. A groove end portion-end portion distance between the first boundary groove and the second boundary groove is smaller than a groove end portion-end portion distance between the first boundary groove and the first in-region groove.

公开(公告)号：US20200286767A1

公开(公告)日：2020-09-10

申请号：US16810272

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Jun SHIRAISHI ,  Shuichiro SAIGAN ,  Tatsuya MORI ,  Yuki SASAKI ,  Masahiro WATANABE

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  C23C16/458 ,  C23C16/455 ,  H01J37/32

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate includes first and second major surfaces. The second major surface is opposite to the first major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided in the ceramic dielectric substrate and is opposite to the gas feed channel. The first porous part includes a first porous region, and a first dense region denser than the first porous region. The first porous region includes first sparse portions, and a first dense portion. The first sparse portions include pores. The first dense portion has a higher than the first sparse portions. The first dense portion is positioned between the first sparse portions. The first sparse portions include a first wall part provided between the pores.

公开(公告)号：US20190287838A1

公开(公告)日：2019-09-19

申请号：US16352565

申请日：2019-03-13

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Jun SHIRAISHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Shuichiro SAIGAN

IPC: H01L21/683 ,  H01L21/67

Abstract: According to the embodiment, the first invention relates to an electrostatic chuck. The electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing a suction object and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The first porous part includes sparse portions including pores and a dense portion having a density higher than a density of the sparse portions. Each of the sparse portions extends from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include a wall portion provided between the pores and the pores.