-
1.发明申请公开(公告)号：US20160138903A1
公开(公告)日：2016-05-19
申请号：US14900121
申请日：2014-06-05
申请人： TSINGHUA UNIVERSITY
发明人： Ming ZHANG , Yu ZHU , Leijie WANG , Kaiming YANG , Zhao LIU , Rong CHENG , Hao LIU , Dengfeng XU , Weinan YE , Li ZHANG , Yanpo ZHAO , Li TIAN , Jin ZHANG , Jinchun HU , Haihua MU , Wensheng YIN , Huichao QIN
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02021 , G01B9/02022 , G01B9/02027 , G01B11/14 , G01B2290/70
摘要： A two-DOF heterodyne grating interferometer displacement measurement system, comprising a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component, wherein the grating interferometer comprises a polarizing spectroscope, a reference grating and dioptric elements. The measurement system achieves the displacement measurement on the basis of the grating diffraction, the optical Doppler effect and the optical beat frequency principle. When the grating interferometer and the measurement grating conduct two-DOF linear relative motion, the system can output two linear displacements. The measurement system can achieve sub-nanometer or even higher resolution and accuracy, and can simultaneously measure two linear displacements. The measurement system has the advantages of insensitivity to the environment, high measurement accuracy, a small volume and light weight, and can improve the comprehensive performance of a workpiece stage as a position measurement system for an ultra-precise workpiece stage of a photoetching machine.
摘要翻译： 一种双自由度外差光栅干涉仪位移测量系统，包括双频激光器，光栅干涉仪，测量光栅，接收器和电子信号处理部件，其中光栅干涉仪包括偏振光谱仪，参考光栅和折射元件。 测量系统基于光栅衍射，光学多普勒效应和光拍频率原理实现位移测量。 当光栅干涉仪和测量光栅进行双DOF线性相对运动时，系统可以输出两个线性位移。 测量系统可以达到亚纳米甚至更高的分辨率和精度，并可以同时测量两个线性位移。 测量系统具有对环境不敏感，测量精度高，体积小，重量轻的优点，可以提高工件台的综合性能，作为光刻机超精密工件台的位置测量系统。
-
公开(公告)号：US20150369331A1
公开(公告)日：2015-12-24
申请号：US14652055
申请日：2013-12-06
发明人： Yu ZHU , Ming ZHANG , Zhao LIU , Rong CHENG , Jing WANG , Li TIAN , Dengfeng XU , Kaiming YANG , Jinchun HU , Wensheng YIN , Haihua MU , Hao LIU , Chuxiong HU
IPC分类号： F16F15/067
CPC分类号： F16F15/067 , F16F2228/063 , G03F7/70 , G03F7/70716 , G03F7/70816 , G03F7/709
摘要： A negative stiffness system for gravity compensation of a micropositioner of wafer table in lithography machine, characterized in that, the negative stiffness system includes at least three sets of quasi-zero stiffness units, each of the sets of quasi-zero stiffness units comprises a pair of negative stiffness springs and a positive stiffness spring, the positive stiffness spring is vertically positioned, the pair of negative stiffness springs are obliquely and symmetrically positioned at two sides of the positive stiffness spring, upper ends 20 of the negative stiffness springs and the positive stiffness spring are connected together and fixed to the bottom surface of a rotor of the micropositioner, and lower ends of the negative stiffness springs and the positive stiffness spring are connected to a base, respectively. The system reduces the stiffness in vertical direction and prevents the influence of permanent magnet on its surroundings, while improving the bearing capacity.
摘要翻译： 一种用于光刻机中的晶片台的微定位器的重力补偿的负刚度系统，其特征在于，所述负刚度系统包括至少三组准零刚度单元，所述准零刚度单元中的每一组包括一对 负刚度弹簧和正刚度弹簧，正刚度弹簧垂直定位，一对负刚度弹簧倾斜对称地定位在正刚度弹簧的两侧，负刚度弹簧的上端20和正刚度 弹簧连接在一起并固定在微定位器的转子的底表面上，负刚度弹簧和正刚度弹簧的下端分别连接到基座。 该系统降低了垂直方向的刚度，并防止永久磁铁对周围环境的影响，同时提高了承载能力。
-
公开(公告)号：US20150326150A1
公开(公告)日：2015-11-12
申请号：US14652072
申请日：2013-12-06
申请人： TSINGHUA UNIVERSITY
发明人： Yu ZHU , Ming ZHANG , Yujing SONG , Rong CHENG , Hao LIU , Zhao LIU , Kaiming YANG , Jinchun HU , Dengfeng XU , Wensheng YIN , Haihua MU
CPC分类号： H02N15/00 , B23Q3/15 , H02K7/09 , H02K41/031
摘要： A maglev working table with six degrees of freedom comprises a pedestal (800), a rotation drive apparatus, a planar-motion apparatus, an angle measuring apparatus (500), and a displacement measuring apparatus. The displacement measuring apparatus comprises four direct-current motors (600) and four displacement measuring apparatus PSD assemblies. Under the effect of the rotation drive apparatus, a planar-motion apparatus coil array stator (200) axially connected to a rotation drive apparatus circular permanent-magnet array mover (300) rotates, so that a phase difference is formed between a planar-motion apparatus permanent-magnet array mover (100) and the planar-motion apparatus coil array stator, and then the maglev working table mover, namely, the planar-motion apparatus permanent-magnet array mover rotates at 360° in the horizontal plane. Moreover, the planar-motion apparatus permanent-magnet array mover moves horizontally within a large scope under the effect of the lorentz force, and can further move around the X axis, the Y axis, and the Z axis within a small scope, so that the maglev working table can move at six degrees of freedom.
摘要翻译： 具有六个自由度的磁浮工作台包括基座（800），旋转驱动装置，平面运动装置，角度测量装置（500）和位移测量装置。 位移测量装置包括四个直流电机（600）和四个位移测量装置PSD组件。 在旋转驱动装置的作用下，轴向连接到旋转驱动装置的圆形永久磁铁阵列移动器（300）的平面运动装置线圈阵列定子（200）旋转，从而在平面运动 设备永磁体阵列移动器（100）和平面运动装置线圈阵列定子，然后磁悬浮工作台移动器即平面运动装置永磁体阵列移动器在水平面360°旋转。 此外，平面运动装置永久磁铁阵列移动器在大范围内在力量的作用下水平移动，并且可以在较小的范围内进一步围绕X轴，Y轴和Z轴移动，使得 磁浮工作台可以六自由度移动。
-
公开(公告)号：US20170115580A1
公开(公告)日：2017-04-27
申请号：US15307752
申请日：2015-04-17
发明人： Yu ZHU , Ming ZHANG , Fan ZHI , Zhao LIU , Rong CHENG , Kaiming YANG , Li ZHANG , Huichao QIN , Yanpo ZHAO , Li TIAN , Weinan YE , Jin ZHANG , Wensheng YIN , Haihua MU , Jinchun HU
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70766 , G03F7/70775
摘要： A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
-
5.发明申请公开(公告)号：US20170052461A1
公开(公告)日：2017-02-23
申请号：US15307797
申请日：2015-04-17
发明人： Ming ZHANG , Yu ZHU , Fan ZHI , Rong CHENG , Kaiming YANG , Zhao LIU , Li ZHANG , Huichao QIN , Yanpo ZHAO , Li TIAN , Weinan YE , Jin ZHANG , Wensheng YIN , Haihua MU , Jinchun HU
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/20 , G03F7/70716 , G03F7/70766 , G03F7/70775
摘要： A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
摘要翻译： 由平面电动机驱动的磁悬浮的粗略运动和精细运动的集成标线片台包括可移动平台（100），平衡块（200），驱动马达，掩模板（101），基座（001），振动 隔离系统（500）和测量系统，其中，隔振系统位于平衡块和基座之间，并且掩模板安装在可移动平台上。 可移动平台的驱动马达是移动式平面马达（300）。 标线台可以降低可移动平台的驱动电机的设计复杂性。 与线性电动机相比，平面电机可以在更多方向上提供推力，减少电机数量，可移动平台的结构更紧凑，提高了可移动平台的固有频率和控制带宽，从而 控制精度提高。
-
6.发明申请公开(公告)号：US20160153764A1
公开(公告)日：2016-06-02
申请号：US14900111
申请日：2014-06-05
申请人： TSINGHUA UNIVERSITY
发明人： Yu ZHU , Leijie WANG , Ming ZHANG , Zhao LIU , Rong CHENG , Kaiming YANG , Dengfeng XU , Weinan YE , Li ZHANG , Yanpo ZHAO , Huichao QIN , Li TIAN , Jin ZHANG , Wensheng YIN , Haihua MU , Jinchun HU
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02021 , G01B9/02022 , G01B9/02027 , G01B11/14 , G01B2290/70
摘要： A three-DOF (Degree of Freedom) heterodyne grating interferometer displacement measurement system comprises a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component; the grating interferometer comprises a polarizing spectroscope, a reference grating and dioptric elements; the measurement system realizes displacement measurement on the basis of grating diffraction, the optical Doppler Effect and the optical beat frequency principle. Three linear displacements can be output by the system when the grating interferometer and the measurement grating perform a three-DOF linear relative motion. The measurement system can reach sub-nanometer and even higher resolution and precision, and can simultaneously measure three linear displacements. The measurement system has the advantages of being environmentally insensitive, high in measurement precision, small in size, light in weight, etc., and is capable of improving the overall performances of an ultra-precision stage of a lithography machine as a position measurement system for this stage.
摘要翻译： 三自由度（自由度）外差光栅干涉仪位移测量系统包括双频激光器，光栅干涉仪，测量光栅，接收器和电子信号处理部件; 光栅干涉仪包括偏振光谱仪，参考光栅和折射元件; 测量系统基于光栅衍射，光学多普勒效应和光拍频率原理实现位移测量。 当光栅干涉仪和测量光栅执行三自由度线性相对运动时，系统可以输出三个线性位移。 测量系统可以达到亚纳米，甚至更高的分辨率和精度，并可同时测量三个线性位移。 该测量系统具有环境不敏感，测量精度高，体积小，重量轻等优点，能够提高作为位置测量系统的光刻机的超精密级的整体性能 在这个阶段
-
-
-
-
-
搜索结果
6 条记录 (耗时 0.011 秒)
