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41 条记录 (耗时 0.046 秒)

    Device for heating fluid control apparatus
    2.
    发明授权
    Device for heating fluid control apparatus 失效
    流体控制装置加热装置

    公开(公告)号：US06014498A

    公开(公告)日：2000-01-11

    申请号：US35345

    申请日：1998-03-05

    申请人： Nobukazu Ikeda ,  Keiji Hirao ,  Yuji Kawano ,  Masayuki Hatano ,  Yukio Minami ,  Hiroshi Morokoshi

    发明人： Nobukazu Ikeda ,  Keiji Hirao ,  Yuji Kawano ,  Masayuki Hatano ,  Yukio Minami ,  Hiroshi Morokoshi

    IPC分类号： F16K27/00 ,  F16K49/00 ,  F24H1/10 ,  H05B3/06

    CPC分类号： F16K49/00

    摘要： A device for heating a fluid control apparatus comprises a tape heater disposed on at least one of opposite lateral sides of the fluid control apparatus, and a plurality of brackets each comprising a bottom wall fastened to a panel with a screw and at least one side wall for holding the tape heater in contact with a fluid controller. The bottom wall of each of the brackets is formed with a screw hole, and each bracket is attached to the panel and adjustable in position.

    摘要翻译： 用于加热流体控制装置的装置包括设置在流体控制装置的相对侧面中的至少一个上的带式加热器，以及多个托架，每个托架包括用螺钉紧固到面板的底壁和至少一个侧壁 用于保持带式加热器与流体控制器接触。 每个托架的底壁形成有一个螺孔，并且每个支架附接到面板上并且可调整的位置。

    Reactor for generating moisture
    3.
    发明授权
    Reactor for generating moisture 有权
    反应器产生水分

    公开(公告)号：US06733732B2

    公开(公告)日：2004-05-11

    申请号：US09783287

    申请日：2001-02-15

    申请人： Tadahiro Ohmi ,  Koji Kawada ,  Yoshikazu Tanabe ,  Takahisa Nitta ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Keiji Hirao ,  Hiroshi Morokoshi ,  Yukio Minami

    发明人： Tadahiro Ohmi ,  Koji Kawada ,  Yoshikazu Tanabe ,  Takahisa Nitta ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Keiji Hirao ,  Hiroshi Morokoshi ,  Yukio Minami

    IPC分类号： B01J802

    CPC分类号： C01B5/00

    摘要： A reactor comprising a body made of a heat-resistant material and having an inlet and an outlet for water/moisture gas, having a gas-diffusing member provided in an internal space of the body, and having a platinum coating on an internal wall surface of the body. Hydrogen and oxygen fed from the inlet are diffused by the gas-diffusing member and then come into contact with the platinum coating to enhance reactivity, thereby producing water. A temperature of the reactor is held to be below an ignition temperature of hydrogen or a hydrogen-containing gas. The platinum-coated catalyst layer on the internal wall of the reactor body is formed by treating the surface of the internal wall of the body, cleaning the treated surface, forming a barrier coating of a nonmetallic material of an oxide or nitride on the wall surface, and forming the platinum coating on the barrier coating.

    摘要翻译： 一种反应器，包括由耐热材料制成并具有用于水/湿气的入口和出口的本体，其具有设置在所述主体的内部空间中的气体扩散构件，并且在内壁表面上具有铂涂层 的身体。 从入口供给的氢气和氧气被气体扩散构件扩散，然后与铂涂层接触以提高反应性，从而产生水。 反应器的温度保持在低于氢气或含氢气体的点火温度。 反应器主体内壁上的铂涂层催化剂层是通过处理体内表面，清洁处理过的表面，在壁表面上形成氧化物或氮化物的非金属材料的阻挡涂层形成的 ，并在阻挡涂层上形成铂涂层。

    Vacuum thermal insulating valve
    7.
    发明授权
    Vacuum thermal insulating valve 失效
    真空保温阀

    公开(公告)号：US07673649B2

    公开(公告)日：2010-03-09

    申请号：US10597303

    申请日：2005-01-13

    申请人： Tadahiro Ohmi ,  Yukio Minami ,  Kenji Tubota ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada ,  Toshio Nariai

    发明人： Tadahiro Ohmi ,  Yukio Minami ,  Kenji Tubota ,  Tsutomu Shinohara ,  Michio Yamaji ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada ,  Toshio Nariai

    IPC分类号： B65D81/20

    CPC分类号： F16K51/02 ,  Y10T137/6606 ,  Y10T137/7043 ,  Y10T137/7062

    摘要： The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S4, which is hermetically fitted to the lower vacuum jacket S5 and with its lower face made open.

    摘要翻译： 本发明提供一种真空绝热阀，其可以在气体供给系统或排气系统中在高温下使用，并且由于其绝热性能优异，也可以制成大小小型的真空绝热阀。 使用包括阀体和致动器的阀的真空隔热阀和容纳阀的真空保温箱，上述真空保温箱S由方形的下部真空夹套S5形成， 圆筒形真空绝热管接收部分J的侧面并且其上表面打开，方形的上部真空夹套S4气密地装配到下部真空套筒S5上并且其下表面打开。

    Fluid supply apparatus
    10.
    发明授权
    Fluid supply apparatus 有权
    流体供应装置

    公开(公告)号：US06178995B2

    公开(公告)日：2001-01-30

    申请号：US09355872

    申请日：1999-08-05

    申请人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Ryousuke Dohi ,  Yukio Minami ,  Kouji Nishino ,  Kouji Kawata ,  Nobukazu Ikeda ,  Michio Yamaji

    发明人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Ryousuke Dohi ,  Yukio Minami ,  Kouji Nishino ,  Kouji Kawata ,  Nobukazu Ikeda ,  Michio Yamaji

    IPC分类号： G05D706

    CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： A fluid feeding apparatus includes parallel flow passages connected at their downstream side, each parallel passage including a pressure flow controller (C) for regulating the flow of fluid and a fluid changeover valve (D) for opening and closing the passage on the downstream side of the pressure flow controller. A fluid feeding control unit (B) controls the pressure flow controllers and changeover valves so that when a changeover valve is closed a control valve (1) upstream of the changeover valve is also closed to prevent a pressure buildup at the changeover valve. In addition to the control valve (1), each pressure flow controller includes an orifice (5) downstream from the control valve, a pressure detector (3) for sensing pressure (P1) in the passage at a point between the control valve and the orifice, and a calculation control unit (6) for producing a control signal Qy for controlling the drive (2) for the control valve. The calculation control unit first calculates a flow rate signal Qc=KP1, where K is a constant and P1 is the pressure sensed by the pressure detector. The calculation control unit then calculates Qy as the difference between a set point or flow rate specifying signal Qs and the calculated value Qc. Thus, the flow rate on the downstream side of the orifice is controlled by regulating the pressure P1 on the upstream side of the orifice via the control valve. The fluid feeding apparatus avoids transient overshooting at the start of fluid feeding and at fluid changeover time and is suitable for use in semiconductor manufacturing facilities and other gas supply systems where high precision is required.

    摘要翻译： 流体供给装置包括在其下游侧连接的平行流路，每个平行通道包括用于调节流体流动的压力流量控制器（C）和用于打开和关闭流体的下游侧的通道的流体切换阀（D） 压力流量控制器。 流体供给控制单元（B）控制压力流量控制器和切换阀，使得当切换阀关闭时，转换阀上游的控制阀（1）也被关闭以防止在转换阀处产生压力。 除了控制阀（1）之外，每个压力流量控制器包括在控制阀下游的孔口（5），压力检测器（3），用于感测通道中压力（P1）在控制阀和控制阀 孔，以及用于产生用于控制用于控制阀的驱动器（2）的控制信号Qy的计算控制单元（6）。 计算控制单元首先计算流量信号Qc = KP1，其中K是常数，P1是由压力检测器感测的压力。 计算控制单元然后计算Qy作为设定点或流量指定信号Qs与计算值Qc之间的差。 因此，通过控制阀调节孔口上游侧的压力P1来控制孔口下游侧的流量。 流体供给装置在流体供给开始时和流体切换时间期间避免瞬时过冲，并且适用于需要高精度的半导体制造设备和其它气体供应系统。