公开(公告)号：US20190148203A1

公开(公告)日：2019-05-16

申请号：US16044765

申请日：2018-07-25

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chueh-Chi KUO ,  Tsung-Yen LEE ,  Chia-Hsin CHOU ,  Tzung-Chi FU ,  Li-Jui CHEN ,  Po-Chung CHENG ,  Che-Chang HSU

IPC: H01L21/683 ,  G03F1/24 ,  G03F7/20

Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing including a top housing member and a lateral housing member. The lateral housing member extends from the top housing member and terminates at a lower edge. The reticle holding tool further includes a reticle chuck. The reticle chuck is positioned in the housing and configured to secure a reticle. The reticle holding tool also includes a gas delivery assembly. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.

公开(公告)号：US20250102927A1

公开(公告)日：2025-03-27

申请号：US18472779

申请日：2023-09-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Hua FU ,  Che-Chang HSU ,  Kai-Fa HO ,  Li-Jui CHEN

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01M8/04029 ,  H01M8/0662 ,  H01M8/24 ,  H01M10/44 ,  H01M16/00

Abstract: A method includes: forming a mask layer on a semiconductor wafer; generating light by a tin droplet by a lithography exposure system; exposing the mask layer by the light; cleaning tin debris accumulated in the lithography exposure system by hydrogen gas; pumping the hydrogen gas from the lithography exposure system to a fuel cell; and generating electric power by the fuel cell.

公开(公告)号：US20200314990A1

公开(公告)日：2020-10-01

申请号：US16365905

申请日：2019-03-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Ssu-Yu CHEN ,  Chi YANG ,  Che-Chang HSU ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: H05G2/00 ,  G03F1/58 ,  G03F7/20 ,  G03F1/24

Abstract: A radiation source apparatus includes a vessel, a laser, a collector, a container, and a cone structure. The vessel has an exit aperture. The laser is at one end of the vessel and configured to excite a target material to form a plasma. The collector is in the vessel and configured to collect at least radiation of a desired wavelength emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The container is configured to receive a residue of the plasma. The cone structure is between the collector and the exit aperture and located besides the container. The cone structure includes a first inner sidewall, and a second inner sidewall adjoining the first inner sidewall and closer to the container than the first inner sidewall, and a first baffle assembly on the first inner sidewall.

公开(公告)号：US20190155139A1

公开(公告)日：2019-05-23

申请号：US15884801

申请日：2018-01-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsiao-Lun CHANG ,  Chueh-Chi KUO ,  Tsung-Yen LEE ,  Tzung-Chi FU ,  Li-Jui CHEN ,  Po-Chung CHENG ,  Che-Chang HSU

IPC: G03F1/24 ,  G03F1/66

Abstract: A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.

公开(公告)号：US20200379357A1

公开(公告)日：2020-12-03

申请号：US16995759

申请日：2020-08-17

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Chih HUANG ,  Chi YANG ,  Che-Chang HSU ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: G03F7/20

Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.

公开(公告)号：US20200350194A1

公开(公告)日：2020-11-05

申请号：US16926935

申请日：2020-07-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chueh-Chi KUO ,  Tsung-Yen LEE ,  Chia-Hsin CHOU ,  Tzung-Chi FU ,  Li-Jui CHEN ,  Po-Chung CHENG ,  Che-Chang HSU

IPC: H01L21/683 ,  G03F1/24 ,  G03F7/20

Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.

公开(公告)号：US20200103746A1

公开(公告)日：2020-04-02

申请号：US16568044

申请日：2019-09-11

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Chih HUANG ,  Chi YANG ,  Che-Chang HSU ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: G03F1/24 ,  G03F7/20

Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.