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公开(公告)号：US20190155139A1
公开(公告)日：2019-05-23
申请号：US15884801
申请日：2018-01-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hsiao-Lun CHANG , Chueh-Chi KUO , Tsung-Yen LEE , Tzung-Chi FU , Li-Jui CHEN , Po-Chung CHENG , Che-Chang HSU
Abstract: A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.
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公开(公告)号：US20200350194A1
公开(公告)日：2020-11-05
申请号：US16926935
申请日：2020-07-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chueh-Chi KUO , Tsung-Yen LEE , Chia-Hsin CHOU , Tzung-Chi FU , Li-Jui CHEN , Po-Chung CHENG , Che-Chang HSU
IPC: H01L21/683 , G03F1/24 , G03F7/20
Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
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公开(公告)号：US20200310259A1
公开(公告)日：2020-10-01
申请号：US16901506
申请日：2020-06-15
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Hao-Yu LAN , Po-Chung CHENG , Ching-Juinn HUANG , Tzung-Chi FU , Tsung-Yen LEE
IPC: G03F9/00
Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.
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Patent Agency Ranking
公开(公告)号：US20230266682A1
公开(公告)日：2023-08-24
申请号：US18310483
申请日：2023-05-01
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Hao-Yu LAN , Po-Chung CHENG , Ching-Juinn HUANG , Tzung-Chi FU , Tsung-Yen LEE
IPC: G03F9/00
CPC classification number: G03F9/7019
Abstract: A system is provided. The system includes an exposing device configured to generate a real-time image, including multiple first align marks, of a mask and an adjusting device configured to adjust an off-set of the mask from a pre-determined position to be smaller than a minimum aligning distance according to the first align marks and multiple align marks on a substrate, and further to move the mask closer to the pre-determined position to have a displacement, less than a minimum mapping distance, from the pre-determined position according to the real-time image and a reference image of the mask.
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公开(公告)号：US20200133143A1
公开(公告)日：2020-04-30
申请号：US16516452
申请日：2019-07-19
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Hao-Yu LAN , Po-Chung CHENG , Ching-Juinn HUANG , Tzung-Chi FU , Tsung-Yen LEE
IPC: G03F9/00
Abstract: A method includes the following operations. A reference image of a mask having a plurality of mapping marks is acquired. A lithography exposing process is performed by a scanner with the mask to a photoresist layer which is formed on a substrate. Performing the lithography exposing process includes mapping a real-time image of the mask with the reference image of the mask.
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公开(公告)号：US20200035483A1
公开(公告)日：2020-01-30
申请号：US16182771
申请日：2018-11-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Siao-Chian HUANG , Po-Chung CHENG , Ching-Juinn HUANG , Tzung-Chi FU , Tsung-Yen LEE
Abstract: A particle removal apparatus is provided. The particle removal apparatus includes a reticle holder configured to hold a reticle. The particle removal apparatus further includes a robotic arm. The particle removal apparatus also includes a particle removal device disposed on the robotic arm, and the particle removal device includes a solution spraying module. In addition, the robotic arm and the particle removal device are configured to align with a particle on a backside of the reticle, and the solution spraying module is configured to spray a solution onto the particle to remove the particle.
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公开(公告)号：US20210389685A1
公开(公告)日：2021-12-16
申请号：US17459357
申请日：2021-08-27
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Hao-Yu LAN , Po-Chung CHENG , Ching-Juinn HUANG , Tzung-Chi FU , Tsung-Yen LEE
IPC: G03F9/00
Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.
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公开(公告)号：US20190148203A1
公开(公告)日：2019-05-16
申请号：US16044765
申请日：2018-07-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chueh-Chi KUO , Tsung-Yen LEE , Chia-Hsin CHOU , Tzung-Chi FU , Li-Jui CHEN , Po-Chung CHENG , Che-Chang HSU
IPC: H01L21/683 , G03F1/24 , G03F7/20
Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing including a top housing member and a lateral housing member. The lateral housing member extends from the top housing member and terminates at a lower edge. The reticle holding tool further includes a reticle chuck. The reticle chuck is positioned in the housing and configured to secure a reticle. The reticle holding tool also includes a gas delivery assembly. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
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