公开(公告)号：US12063734B2

公开(公告)日：2024-08-13

申请号：US17483298

申请日：2021-09-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Ming-Hsun Tsai ,  Wei-Shin Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Jou-Hsuan Lu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/00 ,  G05D23/19

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G05D23/19 ,  H05G2/005

Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.

公开(公告)号：US11442365B1

公开(公告)日：2022-09-13

申请号：US17459836

申请日：2021-08-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Ming-Hsun Tsai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: G03F7/20 ,  H05G2/00

Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.

公开(公告)号：US12167526B2

公开(公告)日：2024-12-10

申请号：US18064858

申请日：2022-12-12

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Cheng-Hao Lai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/00

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.

公开(公告)号：US11528797B2

公开(公告)日：2022-12-13

申请号：US17233220

申请日：2021-04-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Cheng-Hao Lai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.