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公开(公告)号：US12130556B2
公开(公告)日：2024-10-29
申请号：US18304778
申请日：2023-04-21
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Ssu-Yu Chen , Hsin-Feng Chen , Chi Yang , Li-Jui Chen
IPC: G03F7/00
CPC classification number: G03F7/70033
Abstract: A method includes dispensing a droplet into a vacuum chamber; firing a pre-pulse laser to the droplet; sensing a first image of a return beam of the pre-pulse laser from the droplet; after firing the pre-pulse laser, firing a main-pulse laser to the droplet, wherein when the main-pulse laser hits the droplet, the droplet is vaporized into a plasma that emits extreme ultraviolet radiation; after sensing the first image and firing the main-pulse laser, sensing a second image of a return beam of the main-pulse laser from the droplet; and adjusting a plasma position in the vacuum chamber according to at least the second image.
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公开(公告)号：US11809083B2
公开(公告)日：2023-11-07
申请号：US17494558
申请日：2021-10-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Shih-Yu Tu , Jou-Hsuan Lu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: G03F7/70033
Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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公开(公告)号：US11442365B1
公开(公告)日：2022-09-13
申请号：US17459836
申请日：2021-08-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang Sun , Ming-Hsun Tsai , Yu-Huan Chen , Wei-Shin Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.
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公开(公告)号：US10527926B1
公开(公告)日：2020-01-07
申请号：US16289492
申请日：2019-02-28
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chi Yang , Hsin-Feng Chen , Li-Jui Chen
Abstract: A droplet collection bucket includes a droplet collection tube, a level sensor positioned on the droplet collection tube, a gate valve configured to close a rear portion of the droplet collection tube, a gas supply configured to supply a gas into the rear portion of the droplet collection tube, a heating element wrapping around the droplet collection tube, and a drain tube connecting an interior of the droplet collection tube with an outside of the droplet collection tube.
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公开(公告)号：US20250070064A1
公开(公告)日：2025-02-27
申请号：US18403064
申请日：2024-01-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Ke-Gang Wen , Yu-Bey Wu , Liang-Wei Wang , Hsin-Feng Chen , Tsung-Chieh Hsiao , Chih Chuan Su , Dian-Hau Chen
IPC: H01L23/00 , H01L23/48 , H01L23/498 , H01L25/00 , H01L25/065
Abstract: An embodiment is a device including a first die and a substrate including a first surface and a second surface opposite the first surface. The device also includes an active device on the first surface of the substrate. The device also includes a first interconnect structure on the first surface of the substrate. The device also includes a through substrate via extending through the first interconnect structure and the substrate to the second surface of the substrate, the through substrate via being electrically coupled to metallization patterns in the first interconnect structure. The device also includes one or more material-filled trench structures extending from the second surface of the substrate into the substrate, the one or more material-filled trench structures being electrically isolated from the through substrate via.
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Patent Agency Ranking
公开(公告)号：US20250046667A1
公开(公告)日：2025-02-06
申请号：US18482217
申请日：2023-10-06
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsung-Chieh Hsiao , Ke-Gang Wen , Chih-Pin Chiu , Hsin-Feng Chen , Yu-Bey Wu , Liang-Wei Wang , Dian-Hau Chen
IPC: H01L23/367 , H01L23/00 , H01L25/065
Abstract: A method includes forming a device die including forming integrated circuits on a semiconductor substrate; and forming a thermally conductive pillar extending into the semiconductor substrate. A cooling medium is attached over and contacting the semiconductor substrate to form a package, wherein the cooling medium is thermally coupled to the thermally conductive pillar.
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公开(公告)号：US12063734B2
公开(公告)日：2024-08-13
申请号：US17483298
申请日：2021-09-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang Sun , Ming-Hsun Tsai , Wei-Shin Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Jou-Hsuan Lu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC classification number: H05G2/006 , G03F7/70033 , G05D23/19 , H05G2/005
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US10795264B2
公开(公告)日：2020-10-06
申请号：US16715808
申请日：2019-12-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hsin-Feng Chen , Han-Lung Chang , Li-Jui Chen , Bo-Tsun Liu
Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
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公开(公告)号：US10670970B1
公开(公告)日：2020-06-02
申请号：US16257232
申请日：2019-01-25
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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公开(公告)号：US10338475B2
公开(公告)日：2019-07-02
申请号：US16045811
申请日：2018-07-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hsin-Feng Chen , Han-Lung Chang , Li-Jui Chen , Bo-Tsun Liu
Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
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