公开(公告)号：US12063734B2

公开(公告)日：2024-08-13

申请号：US17483298

申请日：2021-09-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Ming-Hsun Tsai ,  Wei-Shin Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Jou-Hsuan Lu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/00 ,  G05D23/19

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G05D23/19 ,  H05G2/005

Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.

公开(公告)号：US11809083B2

公开(公告)日：2023-11-07

申请号：US17494558

申请日：2021-10-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Cheng-Hao Lai ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Wei-Shin Cheng ,  Yu-Kuang Sun ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shih-Yu Tu ,  Jou-Hsuan Lu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70033

Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

公开(公告)号：US11442365B1

公开(公告)日：2022-09-13

申请号：US17459836

申请日：2021-08-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Ming-Hsun Tsai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: G03F7/20 ,  H05G2/00

Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.

公开(公告)号：US12235586B2

公开(公告)日：2025-02-25

申请号：US18366092

申请日：2023-08-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Cheng-Hao Lai ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Wei-Shin Cheng ,  Yu-Kuang Sun ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shih-Yu Tu ,  Jou-Hsuan Lu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: G03F7/00

Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

公开(公告)号：US12167526B2

公开(公告)日：2024-12-10

申请号：US18064858

申请日：2022-12-12

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Cheng-Hao Lai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/00

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.

公开(公告)号：US11134558B2

公开(公告)日：2021-09-28

申请号：US16508596

申请日：2019-07-11

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Shih-Yu Tu ,  Yu-Kuang Sun ,  Shao-Hua Wang ,  Han-Lung Chang ,  Hsiao-Lun Chang ,  Li-Jui Chen ,  Po-Chung Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Wei-Shin Cheng ,  Ming-Hsun Tsai ,  Yen-Hsun Chen

IPC: H05G2/00

Abstract: A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.

公开(公告)号：US11528797B2

公开(公告)日：2022-12-13

申请号：US17233220

申请日：2021-04-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Kuang Sun ,  Cheng-Hao Lai ,  Yu-Huan Chen ,  Wei-Shin Cheng ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.